Closed hole edge lift pin and susceptor for wafer process chambers

• US 20030178145A1
• Filed: 03/25/2002
• Published: 09/25/2003
• Est. Priority Date: 03/25/2002
• Status: Abandoned Application

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Trujillo, Robert T., Anderson, Roger N.
• Application Number:
  US10/106,666
• Publication Number:
  US 20030178145A1
• Time in Patent Office: Days
• US Class Current: 156/345.51
• CPC Class Codes: C23C 16/4586 Elements in the interior of the support, e.g. electrodes, heating or cooling devices
• CPC Class Codes: H01L 21/68728 characterised by a plurality of separate clamping members, e.g. clamping fingers
• CPC Class Codes: H01L 21/68735 characterised by edge profile or support profile
• CPC Class Codes: H01L 21/68742 characterised by a lifting arrangement, e.g. lift pins

Abstract

An apparatus that includes a susceptor having a number of through holes, a number of lift pins positioned within the through holes, each lift pin having a lift pin head able to translate a wafer by contacting the wafer at an outer diameter edge, the lift pins capable of extending to lift the wafer off the susceptor; and the lift pins capable of retracting to place the wafer onto the susceptor, and upon placing the wafer onto the susceptor, each of the lift pin heads are capable of contacting a floor of the susceptor for restricting flow of a gas through the through holes.

Claims

1. An apparatus, comprising:

a susceptor having a plurality of through holes;

a plurality of lift pins each positioned within one of the plurality of through holes, each lift pin having a lift pin head capable of translating a wafer by contacting the wafer at the wafer outer diameter edge,

the plurality of lift pins capable of extending to lift the wafer off the susceptor; and

the plurality of lift pins capable of lowering to place the wafer onto the susceptor, wherein upon placing the wafer onto the susceptor, each of the plurality of lift pin heads are capable of contacting a floor of the susceptor for restricting flow of a gas through the plurality of through holes.

2. The apparatus of claim 1, wherein the susceptor has a dished out center and a ledge is positioned within the dished out center for supporting the wafer.

3. The apparatus of claim 2, wherein the ledge is a continuous circular surface.

4. The apparatus of claim 2, wherein the ledge is discontinuous.

5. The apparatus of claim 1, wherein the susceptor has a roughened center surface area.

6. The apparatus of claim 2, further comprising a plurality of recesses within the susceptor each containing one of the plurality of through holes, wherein when retracted, each of the plurality of lift pin heads are not capable of contacting the wafer when contacting the floor.

7. The apparatus of claim 6, wherein the plurality of recesses are positioned such that a portion of each recess opens into the dished out center area.

8. The apparatus of claim 1, wherein the plurality of lift pins each has a surface that contacts the wafer outer diameter edge at an angle greater than zero from horizontal.

9. The apparatus of claim 8, wherein the angle is in the range of approximately between 0.1-7.0 degrees relative to horizontal.

10. The apparatus of claim 8, wherein the angle is approximately 2.5 degrees relative to horizontal.

11. The apparatus of claim 1, wherein the plurality of lift pins each has a stepped surface.

12. The apparatus of claim 1, wherein the plurality of lift pins are made of silicon carbide.

13. The apparatus of claim 8, wherein the plurality of lift pins each has a cone shaped surface to contact the wafer outer diameter edge.

14. The apparatus of claim 1, wherein a direction of travel for the plurality of lift pins is not parallel to a direction of travel for the susceptor.

15. The apparatus of claim 14, wherein the direction of travel for the plurality of lift pins is approximately between 0.1-7.0 degrees from the direction of travel for the susceptor.

16. The apparatus of claim 1, wherein the plurality of lift pins each are a hollow tube.

17. The apparatus of claim 1, wherein at least three of the lift pin heads can have a raised feature to restrain the wafer from shifting radially.

18. The apparatus of claim 1, wherein the plurality of lift pins are a solid tube.

19. The apparatus of claim 1 capable of positioning the wafer on the susceptor, and where the plurality of lift pin heads are not in contact with the wafer.

20. The apparatus of claim 1, wherein upon placing the wafer onto the susceptor, each of the plurality of lift pin heads are capable of contacting a floor for restricting radiant heat from reaching the wafer.

21. The apparatus of claim 2, wherein the ledge is angled.

22. The apparatus of claim 21, wherein the ledge angle is approximately between 0.1-7.0 degrees sloped down toward the susceptor center to place the wafer outer diameter edge in contact with the ledge surface.

23. The apparatus of claim 1, wherein the floor of the susceptor, capable of contact by the plurality of lift pins, is stepped.

24. An apparatus, comprising:

a susceptor having a plurality counterbore holes having a plurality of through holes positioned within;

the susceptor having a ledge positioned within a dished out center capable of supporting a wafer

a plurality of lift pins positioned within the through holes, each lift pin having a lift pin head capable of translating the wafer by contacting the wafer at an outer diameter edge,

the plurality of lift pins capable of extending to lift the wafer off the susceptor; and

the plurality of lift pins capable of retracting to place the wafer onto the susceptor, wherein upon placing the wafer onto the ledge, each of the plurality of lift pin heads are capable of contacting a floor of each of the plurality of couterbore holes for restricting flow of a gas through the plurality of counterbore holes.

25. The apparatus of claim 24, wherein the plurality of lift pins each has a surface that contacts the wafer outer diameter edge at an angle greater than zero from horizontal.

26. The apparatus of claim 25, wherein the plurality of lift pins each has a stepped surface.

27. An apparatus, comprising:

a plurality of lift pins capable of translating a wafer by contacting the wafer near the wafer outer diameter edge;

a pin lift capable of moving the plurality of lift pins; and

means for reducing the contact area between the wafer and each of the plurality of lift pins during wafer translation.

28. The apparatus of claim 27, further comprising:

means for contacting the wafer edge at an angle greater than zero with the horizontal.

29. The apparatus of claim 27, further comprising:

means for reducing exposure of a bottom side of the wafer to a purge gas.

30. The apparatus of claim 27, further comprising:

means for reducing the contact area between the wafer and the susceptor.

31. The apparatus of claim 27, further comprising:

means for restricting process gas from reaching a contact point between the lift pin head and a floor of a susceptor.

32. A method, comprising:

positioning the wafer on a plurality of pins extended in a direction, where the plurality of pins contact the wafer at the wafer outer diameter edge; and

translating the plurality of pins in an opposite direction until, each of the plurality of pins is positioned in a recess in a susceptor, and the plurality of pins are not in contact with the wafer.

33. The method of claim 32, further comprising:

contacting the wafer with lift pins having lift pin heads that are angled relative to horizontal; and

translating the wafer by the plurality of pins in a pin direction that is at an angle in the range of approximately 0.1-7.0 degrees from the direction of wafer travel.