Process liquid supply mechanism and process liquid supply method

• US 20030180471A1
• Filed: 03/14/2003
• Published: 09/25/2003
• Est. Priority Date: 03/19/2002
• Status: Active Grant

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Hara, Hiroyuki, Miyamoto, Hiroyuki, Yoshihara, Kousuke, Takekuma, Takashi, Furusho, Toshinobu, Hori, Shinya, Ohto, Takeshi
• Granted Patent: US 6,848,625 B2
• Time in Patent Office: Days
• US Class Current: 430/271.1
• CPC Class Codes: H01L 21/6715 Apparatus for applying a liquid, a resin, an ink or the like H01L21/67126 takes precedence
• CPC Class Codes: H01L 21/67253 Process monitoring, e.g. flow or thickness monitoring

Abstract

A process liquid supply mechanism for supplying a process liquid comprises a process liquid supply source for supplying a process liquid, a process liquid discharging nozzle for discharging the process liquid, a pipe connecting the process liquid supply source to the process liquid discharging nozzle, a pump mounted to the pipe for allowing the process liquid to be discharged from the process liquid discharging nozzle, a pressure sensor for detecting the pressure of the process liquid at a prescribed position intermediate between the pump and the process liquid discharging nozzle, and a controller for controlling the inner pressure of the pump based on the pressure value detected by the pressure sensor and the relationship obtained in advance between the pressure and the discharging rate of the process liquid such that the process liquid is discharged at a prescribed discharging rate.

Claims

1. A process liquid supply mechanism for supplying a process liquid, comprising:

a process liquid supply source for supplying a process liquid;

a process liquid discharging nozzle for discharging the process liquid;

a pipe connecting the process liquid supply source to the process liquid discharging nozzle;

a pump mounted to the pipe for allowing the process liquid to be discharged from the process liquid discharging nozzle;

a pressure sensor for detecting the pressure of the process liquid at a prescribed position intermediate between the pump and the process liquid discharging nozzle; and

a controller for controlling the inner pressure of the pump based on the pressure value detected by the pressure sensor and the relationship obtained in advance between the pressure and the discharging rate of the process liquid such that the process liquid is discharged at a prescribed discharging rate.

2. The process liquid supply mechanism according to claim 1, wherein the pressure sensor is mounted to the pump.

3. The process liquid supply mechanism according to claim 1, wherein the pressure sensor is mounted in the vicinity of the nozzle.

4. The process liquid supply mechanism according to claim 1, wherein arranged are a plurality of process liquid discharging nozzles.

5. The process liquid supply mechanism according to claim 1, further comprising a valve for selectively allowing the process liquid discharging nozzle to discharge the process liquid and to cease to discharge the process liquid.

6. The process liquid supply mechanism according to claim 1, wherein the pump includes a pressurizing body that is moved by the pressure of a pressurizing medium such that the pressure of the pressurizing medium is exerted on the process liquid so as to permit the process liquid to be discharged from the process liquid discharging nozzle.

7. The process liquid supply mechanism according to claim 6, wherein the pump is a tubephragm pump.

8. The process liquid supply mechanism according to claim 1, further comprising a buffer tank mounted to the pipe for temporarily storing the process liquid.

9. The process liquid supply mechanism according to claim 8, further comprising a bubble removing section mounted to the pump and a recovery pipe for recovering the process liquid discharged from the bubble removing section of the pump in the buffer tank.

10. The process liquid supply mechanism according to claim 1, further comprising a filter mounted to the pipe.

11. The process liquid supply mechanism according to claim 10, wherein the controller controls the inner pressure of the pump based on the data on the pressure loss of the filter.

12. The process liquid supply mechanism according to claim 1, further comprising a filter mounted to the pipe on the upstream side of the pump and a reservoir tank mounted in the inlet portion of the process liquid of the pump.

13. The process liquid supply mechanism according to claim 12, further comprising a bubble removing section mounted to the filter and a recovery pipe for recovering the process liquid discharged from the bubble removing section of the filter in the reservoir tank.

14. The process liquid supply mechanism according to claim 1, wherein the process liquid is a resist solution.

15. The process liquid supply mechanism according to claim 14, wherein the controller controls the inner pressure of the pump such that the discharging rate of the resist solution is increased in the initial stage of the discharging.

16. The process liquid supply mechanism according to claim 1, wherein the controller automatically gives pulses to the pump thereby obtaining the relationship between the number of pulses and the pressure detected by the pressure sensor, compares the relationship thus obtained with the relationship stored in advance between the number of pulses and the pressure in the normal case where bubbles are not contained in the process liquid, and generates an instruction to perform the bubble removing operation in the case where it is judged that bubbles are contained in the process liquid.

17. A process liquid supply mechanism for supplying a process liquid, comprising:

a process liquid supply source for supplying a process liquid;

a plurality of process liquid discharging nozzles which are selectively allowed to discharge the process liquid;

piping including a main pipe extending from the process liquid supply source and a plurality of subsidiary pipes branched from the main pipe so as to reach the plural process liquid supply nozzles;

a pump mounted to the main pipe for allowing the process liquid to be discharged from the process liquid discharging nozzles;

a plurality of pressure sensors for detecting respectively the pressures of the process liquid in the vicinity of the plural process liquid discharging nozzles; and

a controller for controlling the inner pressure of the pump in allowing the process liquid to be discharged from each of the process liquid discharging nozzles such that the pressure values detected by the plural pressure sensors mounted in the vicinity of the plural process liquid discharging nozzles are rendered substantially equal to each other.

18. The process liquid supply mechanism according to claim 17, further comprising a valve for selectively allowing the process liquid discharging nozzle to discharge the process liquid and to cease to discharge the process liquid.

19. The process liquid supply mechanism according to claim 17, wherein the pump includes a pressurizing body that is moved by the pressure of a pressurizing medium such that the pressure of the pressurizing medium is exerted on the process liquid so as to permit the process liquid to be discharged from the process liquid discharging nozzle.

20. The process liquid supply mechanism according to claim 19, wherein the pump is a tubephragm pump.

21. The process liquid supply mechanism according to claim 17, further comprising a buffer tank mounted to the pipe for temporarily storing the process liquid.

22. The process liquid supply mechanism according to claim 21, further comprising a bubble removing section mounted to the pump and a recovery pipe for recovering the process liquid discharged from the bubble removing section of the pump in the buffer tank.

23. The process liquid supply mechanism according to claim 17, further comprising a filter mounted to the pipe.

24. The process liquid supply mechanism according to claim 23, wherein the controller controls the inner pressure of the pump based on the data on the pressure loss of the filter.

25. The process liquid supply mechanism according to claim 17, further comprising a filter mounted to the pipe on the upstream side of the pump and a reservoir tank mounted in the inlet portion of the process liquid of the pump.

26. The process liquid supply mechanism according to claim 25, further comprising a bubble removing section mounted to the filter and a recovery pipe for recovering the process liquid discharged from the bubble removing section of the filter in the reservoir tank.

27. The process liquid supply mechanism according to claim 17, wherein the process liquid is a resist solution.

28. The process liquid supply mechanism according to claim 27, wherein the controller controls the inner pressure of the pump such that the discharging rate of the resist solution is increased in the initial stage of the discharging.

29. The process liquid supply mechanism according to claim 17, wherein the controller automatically gives pulses to the pump thereby obtaining the relationship between the number of pulses and the pressure detected by the pressure sensor, compares the relationship thus obtained with the relationship stored in advance between the number of pulses and the pressure in the normal case where bubbles are not contained in the process liquid, and generates an instruction to perform the bubble removing operation in the case where it is judged that bubbles are contained in the process liquid.

30. A process liquid supply method, in which a pump is driven so as to permit a process liquid in a process liquid supply source to be supplied into a process liquid discharging nozzle through a pipe for allowing the process liquid to be discharged from the process liquid discharging nozzle, comprising the steps of:

driving the pump so as to supply the process liquid from the process liquid supply source into the pipe;

detecting the pressure of the process liquid at a prescribed position intermediate between the pump and the process liquid discharging nozzle; and

controlling the inner pressure of the pump based on the detected value of the pressure of the process liquid and the relationship obtained in advance between the pressure and the discharging rate of the process liquid such that the process liquid is discharged from the process liquid discharging nozzle at a prescribed discharging rate.

31. A process liquid supply method, in which a pump is driven so as to permit a process liquid in a process liquid supply source to be supplied through piping into a plurality of process liquid discharging nozzles for selectively allowing the plural process liquid discharging nozzles to discharge the process liquid, comprising the steps of:

driving the pump for supplying the process liquid from the process liquid supply source into the piping; and

detecting the pressures of the process liquid in the vicinity of the plural process liquid discharging nozzles, and controlling the inner pressure of the pump such that the detected values of pressures of the process liquid are rendered substantially equal to each other.