Optical device substrate film-formation apparatus, optical disk substrate film-formation method, substrate holder manufacture method, substrate holder, optical disk and a phase-change recording type of optical disk
First Claim
Patent Images
1. An optical disk substrate film-formation apparatus which manufactures an optical disk by forming a thin film on the surface of a substrate, said apparatus comprising:
- a substrate holder which fixes said substrate during the formation of said film, wherein said substrate holder has a contact holding surface contacting at least a portion of a rear surface of a film-formed area of said substrate on which said film is formed.
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Abstract
In an optical disk substrate film-formation apparatus which prepared an optical disk by forming a thin film on a substrate, the optical disk substrate is held by a holder section. A contact support surface is provided to the holder section which closely contacts at least a portion of the surface of the optical disk substrate rear to the surface where the think film is formed.
69 Citations
80 Claims
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1. An optical disk substrate film-formation apparatus which manufactures an optical disk by forming a thin film on the surface of a substrate, said apparatus comprising:
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a substrate holder which fixes said substrate during the formation of said film, wherein said substrate holder has a contact holding surface contacting at least a portion of a rear surface of a film-formed area of said substrate on which said film is formed. - View Dependent Claims (2, 3, 4, 5)
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6. An optical disk substrate film-formation apparatus which manufactures an optical disk by forming a thin film on the surface of a substrate, said apparatus comprising:
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a substrate holder which fixes said substrate during the formation of said film, wherein said substrate has a thickness of 0.6 mm or less, and said substrate holder has a contact holding surf ace contacting at least a portion of a rear surface of a film-formed area of said substrate on which said film is formed. - View Dependent Claims (7, 8, 9, 10)
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11. An optical disk substrate film-formation apparatus comprising:
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a substrate holder which holds a substrate at its rear surface so that sputter film formation can be carried out on the front surface of said substrate, said substrate holder having a substrate holding surface which comes in contact with said rear surface of said substrate, wherein said substrate holding surface is rough at at least a portion. - View Dependent Claims (12, 13, 14)
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15. An optical disk substrate film-formation apparatus comprising:
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a substrate holder which holds thereon a substrate as an object for film formation, said substrate holder having, a groove section which extends from a portion where said substrate holder contacts said substrate when said substrate holder is holding said substrate to a portion where said substrate holder does not contact said substrate when said substrate holder is holding said substrate; and
a porous member which can allow air to pass through is provided in said groove section. - View Dependent Claims (16, 17, 18)
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19. An optical disk substrate film-formation apparatus comprising:
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a substrate holder which holds thereon a substrate as an object for film formation, said substrate holder having, a groove section in a portion where said substrate holder contacts said substrate when said substrate holder is holding said substrate, a porous member which can allow air to pass through is provided in said groove section; and
a through-hole which connects said groove section to the portion where said substrate holder does not contact said substrate when said substrate holder is holding said substrate. - View Dependent Claims (20, 21, 22)
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23. An optical disk substrate film-formation apparatus comprising:
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a substrate holder which holds thereon an optical disk substrate as an object for film formation;
an inner mask which masks a specified area on the inner side of said optical disk; and
an outer mask which masks a specified area on the outer side of said optical disk;
wherein said inner mask and said outer mask being used for forming a thin-film on a surface of said optical disk substrate, said substrate holder having, a substrate holding section which contacts said optical disk substrate on the rear surface of said optical disk substrate but in the portion where the thin-film has been formed on the front surface, wherein and said substrate holding section contacts said optical disk substrate in the portion extending between a line which is 2 to 10 mm on the outer side of the outer edge of said inner mask and a line which is 0.5 to 5 mm on the inner side of the inner edge of said outer mask. - View Dependent Claims (24, 25, 26, 27, 28, 29)
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30. An optical disk substrate film-formation apparatus used for sputter film formation in which a laminated film is formed by combining any one or two or more of a reflection layer, a recording layer, a protection layer, or a dielectric body layer on a disk substrate in an optical disk manufacture step comprising:
a gas supply section for introduction of gas in the substrate holder side in a limited portion between a substrate setting surface of the substrate holder and a film-formed substrate, and at least a closed space section in the area formed in the substrate holder side because of contact between the substrate and substrate holder. - View Dependent Claims (31, 32, 33, 34, 35, 36, 37, 38, 39, 40, 41, 42)
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43. An optical disk substrate film-formation apparatus used for sputter film formation in which a laminated film is formed by combining any one or two or more of a reflection layer, a recording layer, a protection layer, or a dielectric body layer on a disk substrate, wherein at least one groove section extending once around a center of a section where a disk is placed and having a construction in which an angle between “
- a tangent to a rim of said groove at any position” and
“
a tangent to a circle around a center of a section where said disk substrate is placed at the same position”
is not more than 30 degrees is provided in an area of a surface of a substrate holder opposing to a firm-formed area of the disk substrate, and a portion other than said groove section closely contact and supports a rear surface of the film-formed area of said disk substrate. - View Dependent Claims (44, 45, 46, 47, 48, 49, 50)
- a tangent to a rim of said groove at any position” and
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51. An optical disk substrate film-formation method of manufacturing an optical disk by forming a thin-film on a substrate fixed on a substrate holder, wherein said substrate holder holds said substrate, when fixing the substrate, by closely contacting at least a portion of a surface where the substrate is placed thereon to a portion of a rear surface of a film-formed area of the substrate in which a thin-film is formed.
- 52. An optical disk substrate film-formation method of manufacturing an optical disk by forming a thin-film on a substrate fixed on a substrate holder, wherein said substrate holder holds, when a substrate having a thickness of 0.6 mm or less is fixed, the substrate by closely contacting at least a portion of a surface on which the substrate is fixed to at least a portion of a rear surface of a film-formed area of the substrate where a film is formed therein.
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57. An optical disk film-formation method carried out in an optical disk substrate film-formation apparatus having a film-formation chamber in which a film is formed on a substrate, a substrate carriage chamber from which a substrate is carried to said film-formation chamber, and a substrate holder having a through-hole provided between said substrate carriage chamber and film-formation chamber and connected to said substrate carriage chamber and film-formation chamber, said optical disk film-formation method comprising:
a film-formation step in which a substrate is fixed on said substrate holder and a film is formed on the substrate by maintaining a pressure in said film-formation chamber higher than that in said film carriage chamber. - View Dependent Claims (58, 59, 60, 61, 62)
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63. An optical disk film-formation method carried out in an optical disk substrate film-formation apparatus having a film-formation chamber in which a film is formed on a substrate, a substrate carriage chamber from which a substrate is carried to said film-formation chamber, and a substrate holder having a through-hole provided between said substrate carriage chamber and film-formation chamber and communicating to said substrate carriage chamber and film-formation chamber, said optical disk film-formation method comprising:
a film-formation step in which, when a substrate having a thickness of 0.6 mm or less is fixed, the substrate is fixed by said substrate holder and a film is formed thereon by maintaining a pressure in said film-formation chamber higher than that in said substrate carriage chamber. - View Dependent Claims (64, 65, 66, 67, 68)
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69. An optical disk substrate film-formation method of forming a film by sputtering on a surface of a substrate by closely contacting a rear surface of a substrate to a substrate holder to hold an optical disk substrate with said substrate holder,
said method using an optical disk substrate film-formation apparatus comprising: -
a substrate holder which holds a substrate at its rear surface so that sputter film formation can be carried out on the front surface of said substrate, said substrate holder having a substrate holding surface which comes in contact with said rear surface of said substrate, wherein said substrate holding surface is rough at at least a portion.
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70. A substrate manufacture method comprising:
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a step of forming a substrate holder which holds a substrate at its rear surface so that sputter film formation can be carried out on the front surface of said substrate, said substrate holder having a substrate holding surface which comes in contact with said rear surface of said substrate;
a step of making at least a portion of said substrate holding surface contacting a rear surface of said substrate rough; and
a step of lubricating said rough surface by means of complex plating with fine powder of carbon fluoride (CF)n or fluororesin to make the surface roughness Rmax of the lubricated section to 10 μ
m or more and 500 μ
m or less.
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71. A substrate manufacture method comprising:
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a step of forming a substrate holder which holds a substrate at its rear surface so that sputter film formation can be carried out on the front surface of said substrate, said substrate holder having a substrate holding surface which comes in contact with said rear surface of said substrate;
a step of making at least a portion of said substrate holding surface contacting a rear surface of said substrate rough; and
a step of lubricating said rough surface with a chlorosilane-based chemical adsorbent to make the surface roughness Rmax of the lubricated section to 10 μ
m or more and 500 μ
m or less.
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72. A substrate holder manufacture method comprising:
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a step of forming a substrate holder which holds a substrate at its rear surface so that sputter film formation can be carried out on the front surface of said substrate, said substrate holder having a substrate holding surface which comes in contact with said rear surface of said substrate;
a step of making at least a portion of said substrate holding surface contacting a rear surface of said substrate rough; and
a step of lubricating said rough surface by means of organic plating with triazinethiol to make the surface roughness Rmax of the lubricated section to 10 μ
m or more and 500 μ
m or less.
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73. A substrate holder which holds thereon a substrate as an object for film formation in an optical disk substrate film-formation apparatus, said substrate holder comprising:
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a groove section which extends from a portion where said substrate holder contacts said substrate when said substrate holder is holding said substrate to a portion where said substrate holder does not contact said substrate when said substrate holder is holding said substrate; and
a porous member which can allow air to pass through is provided in said groove section.
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74. The optical disk manufactured with an optical disk substrate film-formation apparatus;
- said optical disk substrate film-formation apparatus used for sputter film formation in which a laminated film is formed by combining any one or two or more of a reflection layer, a recording layer, a protection layer, or a dielectric body layer on a disk substrate, wherein at least one groove section extending once around a center of a section where a disk is placed and having a construction in which an angle between “
a tangent to a rim of said groove at any position” and
“
a tangent to a circle around a center of a section where said disk substrate is placed at the same position”
is not more than 30 degrees is provided in an area of a surface of a substrate holder opposing to a firm-formed area of the disk substrate, and a portion other than said groove section closely contact and supports a rear surface of the film-formed area of said disk substrate.
- said optical disk substrate film-formation apparatus used for sputter film formation in which a laminated film is formed by combining any one or two or more of a reflection layer, a recording layer, a protection layer, or a dielectric body layer on a disk substrate, wherein at least one groove section extending once around a center of a section where a disk is placed and having a construction in which an angle between “
- 75. A phase-change type of optical disk comprising a lower dielectric body protection layer made from a mixture of zinc sulfide and silicon oxide provided on a substrate, a phase-change recording layer, an upper dielectric body protection layer made from a mixture of zinc sulfide and silicon oxide, and a reflection/heat-emission layer as constituent layers, wherein a main component of the reflection/heat-emission layer is Ag and a sulfidization-preventing conductive layer is provided between the upper dielectric body protection layer and the reflection/heat-emission layer.
Specification