Implantation for current confinement in nitride-based vertical optoelectronics
First Claim
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1. A method for confining current in a semiconductor structure, the method comprising:
- selectively disordering a doped nitride based material in a semiconductor structure;
wherein the selective disordering substantially increases the resistance of the material, adjacent a contact, to a current thereby confining the current to a region of substantially low resistance in the doped nitride based material.
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Abstract
Ion implantation is used to increase the resistivity of semiconductor device layers for channeling the current through a low resistivity, unimplanted region such that carrier recombination takes place away from regions underneath the contacts. This eliminates absorption of light by the contact thereby providing higher light output power and better current-voltage characteristics to the semiconductor device. The incorporation of a regrown contact layer allows for an undamaged lateral conduction path, and the fabrication of ohmic contacts.
42 Citations
55 Claims
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1. A method for confining current in a semiconductor structure, the method comprising:
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selectively disordering a doped nitride based material in a semiconductor structure;
wherein the selective disordering substantially increases the resistance of the material, adjacent a contact, to a current thereby confining the current to a region of substantially low resistance in the doped nitride based material. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8)
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9. A method for confining current in an vertical opto-electronic device, the method comprising:
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selectively disordering a doped nitride based material in the vertical opto-electronic device;
wherein the selective disordering substantially increases the resistance of the material, below a contact, to a current thereby confining the current to a region of substantially low resistance in the doped nitride based material. - View Dependent Claims (10, 11, 12, 13, 15, 16)
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14. The method according to claim 14, wherein the species of ions include aluminum ions.
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17. A method for reducing the emission of light adjacent a contact of a semiconductor structure, the method comprising:
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selectively disordering a doped nitride based material in a semiconductor structure;
wherein the selective disordering substantially increases the resistance of the material, adjacent a contact, to a current thereby reducing the emission of light at the contact. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30)
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31. A method of using ion implantation for providing index wave-guiding of emitted light in a semiconductor structure, the method comprising:
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selectively disordering a doped nitride based material in a semiconductor structure using ion implantation;
wherein the ion implantation reduces the refractive index of the disordered and doped nitride based material thereby providing index wave-guiding of emitted light in the semiconductor structure. - View Dependent Claims (32, 33, 34, 35, 36, 37)
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38. A method for improving the light output in a vertical cavity surface emitting laser (VCSEL), the method comprising:
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removing a portion of a substrate in the VCSEL using etching; and
selectively disordering a doped nitride based material in the VCSEL;
wherein the selective disordering substantially increases the resistance of the material, adjacent at least one contact of the VCSEL, to a current thereby improving the light output in the VCSEL. - View Dependent Claims (39, 40, 41, 42, 43, 44, 45, 46)
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47. A method for improving the light output in a vertical cavity surface emitting laser (VCSEL), the method comprising:
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growing a nitride based material on a substrate through lateral epitaxial overgrowth (LEO) process in the VCSEL; and
selectively disordering a p-doped nitride based material in the VCSEL;
wherein the selective disordering substantially increases the resistance of the p-doped material, adjacent at least one contact of the VCSEL, to a current thereby improving the light output in the VCSEL.
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48. A semiconductor structure for confining a current, the structure comprising:
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a selectively disordered and doped nitride based material;
wherein the selectively disordered material has a substantially higher resistance, adjacent a contact, to a current thereby confining the current to a region of substantially low resistance in the doped nitride based material. - View Dependent Claims (49, 50, 51, 52, 53, 54, 55)
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Specification