Apparatus and method for use of optical diagnostic system with a plasma processing system

• US 20030183337A1
• Filed: 03/17/2003
• Published: 10/02/2003
• Est. Priority Date: 03/28/2002
• Status: Abandoned Application

• Current Assignee: Tokyo Electron Limited
• Original Assignee: Tokyo Electron Limited
• Inventors: Fordemwalt, James, Mitrovic, Andrej, Ludviksson, Audunn, Wodecki, Norman
• Application Number:
  US10/388,540
• Publication Number:
  US 20030183337A1
• Time in Patent Office: Days
• US Class Current: 156/345.24
• CPC Class Codes: H01J 37/32935 Monitoring and controlling tubes by information coming from the object and/or discharge
• CPC Class Codes: H01J 37/32963 End-point detection

Abstract

A plasma processing system and method for operating a windowless optical diagnostic system in conjunction with a plasma processing system. The plasma processing system comprises a windowless optical diagnostic system that is constructed and arranged to detect a plasma process condition. The method includes providing a first pressure within a chamber of the plasma processing system and providing a second pressure within a windowless optical diagnostic chamber in which the windowless optical diagnostic system is positioned. The method further includes controlling the second pressure within the windowless optical diagnostic chamber relative to the first pressure within the chamber and optically detecting a plasma process condition.

Claims

1. A plasma processing device comprising:

a chamber having an opening and containing a plasma processing region;

a chuck, constructed and arranged to support a substrate within the chamber in the processing region;

a plasma generator in communication with the chamber, the plasma generator being constructed and arranged to generate a plasma during a plasma process in the plasma processing region; and

a windowless optical diagnostic system in communication with the chamber through the opening, the windowless optical diagnostic system being constructed and arranged to detect a plasma process condition.

2. The plasma processing device of claim 1, wherein the plasma generator comprises an upper electrode and a lower electrode spaced from the upper electrode, the upper and lower electrodes being constructed and arranged to generate the plasma therebetween.

3. The plasma processing device of claim 1, wherein the plasma generator is an antenna.

4. The plasma processing device of claim 1, wherein the windowless optical diagnostic system comprises a monochromator constructed and arranged to receive optical transmission from the plasma.

5. The plasma processing device of claim 4, wherein the optical transmission is light.

6. The plasma processing device of claim 1, further comprising an optical diagnostic system chamber in communication with the chamber, wherein the optical diagnostic system chamber is positioned in the chamber.

7. The plasma processing device of claim 6, further comprising a gate valve positioned between the chamber and the optical diagnostic system chamber and being constructed and arranged to substantially isolate the optical diagnostic system chamber from the chamber.

8. The plasma processing device of claim 6, further comprising a first vacuum pump in communication with the chamber and constructed and arranged to control a pressure within the chamber.

9. The plasma processing device of claim 8, further comprising a second vacuum pump in communication with the optical diagnostic system chamber to control a pressure within the optical diagnostic system chamber.

10. The plasma processing device of claim 9, wherein the second vacuum pump is constructed and arranged to maintain a pressure in the optical diagnostic system chamber to be substantially equal or greater than the pressure in the chamber.

11. The plasma processing device of claim 6, further comprising a vacuum pump in communication with the chamber and the optical diagnostic system chamber, the vacuum pump being constructed and arranged to control a pressure within the chamber independent of and relative to a pressure within the optical diagnostic system chamber.

12. The plasma processing device of claim 11, further comprising a vacuum manifold constructed and arranged between the vacuum pump and the chamber and the optical diagnostic chamber to at least partially control a pressure within the optical diagnostic system chamber.

13. The plasma processing device of claim 12, further comprising at least one valve in communication with the vacuum pump and constructed and arranged to at least partially control the pressure within the chamber and the pressure within the optical diagnostic system chamber.

14. The plasma processing device of claim 13, wherein the vacuum pump and the at least one valve are constructed and arranged to at least partially control the pressure in the optical diagnostic system chamber to be substantially equal or greater than the pressure in the chamber.

15. The plasma processing device of claim 6, further comprising a passage interconnecting the chamber and the optical diagnostic chamber, at least one vacuum line coupled to the passage and at least one valve positioned in communication with the vacuum line.

16. The plasma processing device of claim 15, wherein the at least one valve is constructed and arranged to at least partially control a pressure within the optical diagnostic system chamber.

17. The plasma processing device of claim 6, further comprising a differential pump manifold in communication with the chamber opening and the windowless optical diagnostic system.

18. The plasma processing device of claim 17, wherein the differential pump manifold comprises a plurality of apertures, at least one vacuum line between the apertures and at least one valve in communication with the at least one vacuum line.

19. The plasma processing device of claim 17, further comprising a first vacuum pump constructed and arranged to control a pressure within the chamber.

20. The plasma processing device of claim 19, further comprising at least one vacuum line in communication between the differential pump manifold and the first vacuum pump and at least one valve in the at least one vacuum line.

21. The plasma processing device of claim 19, wherein the differential pump manifold is constructed and arranged to at least partially control a pressure in the optical diagnostic system chamber.

22. The plasma processing device of claim 21, wherein the differential pump manifold is constructed and arranged to at least partially control the pressure in the optical diagnostic system chamber such that byproducts of the plasma process that diffuse through the chamber opening into the windowless optical diagnostic system are reduced.

23. The method of claim 22, wherein the controlling reduces byproducts of a plasma process that diffuse through the chamber into the windowless optical diagnostic system.

24. The method of claim 22, wherein the controlling comprises:

monitoring the first and second pressures; and

adjusting the second pressure in response to the monitoring.

25. The method of claim 24, further comprising:

monitoring the first and second pressures; and

adjusting an amount of supplied purge gas to at least partially adjust the second pressure in response to the monitoring.

26. The method of claim 22, further comprising:

supplying a purge gas to the windowless optical diagnostic chamber;

monitoring the second pressure; and

adjusting the amount of supplied purge gas to at least partially control the second pressure.

22-1. A method for operating a windowless optical diagnostic system in conjunction with a plasma processing system having a chamber containing a plasma processing region in which a plasma can be generated during a plasma process, the windowless optical diagnostic system being positioned in a windowless optical diagnostic chamber, the method comprising:

providing a first pressure within the chamber;

providing a second pressure within the windowless optical diagnostic chamber;

controlling the second pressure within the windowless optical diagnostic chamber relative to the first pressure within the chamber; and

optically detecting a plasma process condition.