Transparent laminate having low emissivity

• US 20030186064A1
• Filed: 05/28/2003
• Published: 10/02/2003
• Est. Priority Date: 09/29/2000
• Status: Abandoned Application

• Current Assignee: Cardinal CG Company (Cardinal Glass Industries Incorporated), Nippon Sheet Glass Company Limited (Nippon Telegraph and Telephone Corporation)
• Original Assignee: Cardinal CG Company (Cardinal Glass Industries Incorporated), Nippon Sheet Glass Company Limited (Nippon Telegraph and Telephone Corporation)
• Inventors: Nakai, Hidemi, Doshita, Kazuhiro, Murata, Kenji
• Application Number:
  US10/381,661
• Publication Number:
  US 20030186064A1
• Time in Patent Office: Days
• US Class Current: 428/432
• CPC Class Codes: B32B 17/10174 Coatings of a metallic or dielectric material on a constituent layer of glass or polymer
• CPC Class Codes: C03C 17/36 at least one coating being a metal
• CPC Class Codes: C03C 17/3618 Coatings of type glass/inorganic compound/other inorganic layers, at least one layer being metallic
• CPC Class Codes: C03C 17/3626 one layer at least containing a nitride, oxynitride, boronitride or carbonitride
• CPC Class Codes: C03C 17/3639 Multilayers containing at least two functional metal layers
• CPC Class Codes: C03C 17/3644 the metal being silver
• CPC Class Codes: C03C 17/3652 the coating stack containing at least one sacrificial layer to protect the metal from oxidation
• CPC Class Codes: C03C 17/366 Low-emissivity or solar control coatings
• CPC Class Codes: C03C 17/3681 the multilayer coating being used in glazing, e.g. windows or windscreens
• CPC Class Codes: C03C 2217/216 ZnO
• CPC Class Codes: C03C 2217/281 Nitrides
• CPC Class Codes: C03C 2217/78 Coatings specially designed to be durable, e.g. scratch-resistant
• CPC Class Codes: Y10T 428/265 1 mil or less

Abstract

When a ZnO layer is formed as a dielectric layer on an amorphous layer, a columnar crystal structure of ZnO is put into disorder whereby not only the amorphous layer but also the dielectric layer function as a barrier for preventing the invasion of moisture and gas from outside whereupon durability of a metal layer (Ag) is improved.

Claims

1. In a transparent layered product with low emissivity coating where a dielectric layer and a metal layer are formed alternatingly on a substrate, a transparent layered product with low emissivity coating which is characterized in that at least one dielectric layer is divided in a direction of film thickness by at least one amorphous layer.

2. In the transparent layered product with low emissivity coating according to claim 1, the transparent layered product with low emissivity coating which is characterized in that the dielectric layer divided by the above-mentioned amorphous layer is an oxide layer containing at least one metal selected from a group consisting of Zn, Sn, Ti, In and Bi.

3. In the transparent layered product with low emissivity coating according to claim 2, the transparent layered product with low emissivity coating which is characterized in that the dielectric layer divided by the above-mentioned amorphous layer is a layer which mainly comprises zinc oxide.

4. In the transparent layered product with low emissivity coating according to any of claims 1 to 3, the transparent layered product with low emissivity coating which is characterized in that at least one layer of the dielectric layers divided by the above-mentioned amorphous layer is located at the opposite side of a substrate when a metal layer being nearest the substrate is taken as a standard.

5. In the transparent layered product with low emissivity coating according to any of claims 1 to 3, the transparent layered product with low emissivity coating which is characterized in that the above-mentioned metal layer is one layer and the dielectric layer divided by the above-mentioned amorphous layer is located at the opposite side of a substrate when the said metal layer is taken as a standard.

6. In the transparent layered product with low emissivity coating according to any of claims 1 to 3, the transparent layered product with low emissivity coating which is characterized in that there are two or more above-mentioned metal layers and at least one of the dielectric layers divided by the above-mentioned amorphous layers is located at the side of a substrate when a metal layer which is farthest from the substrate is taken as a standard.

7. In the transparent layered product with low emissivity coating according to any of claims 1 to 6, the transparent layered product with low emissivity coating which is characterized in that the above-mentioned amorphous layer comprises at least one layer selected from a group consisting of a nitride layer, an oxynitride layer and an amorphous oxide layer.

8. In the transparent layered product with low emissivity coating according to claim 7, the transparent layered product with low emissivity coating which is characterized in that the above-mentioned nitride layer comprises a nitride containing at least one metal selected from a group consisting of Si, Al, Ti and Sn.

9. In the transparent layered product with low emissivity coating according to claim 7, the transparent layered product with low emissivity coating which is characterized in that the above-mentioned oxynitride layer comprises an oxynitride layer containing at least one metal selected from a group consisting of Si, Al, Ti and Sn.

10. In the transparent layered product with low emissivity coating according to claim 7, the transparent layered product with low emissivity coating which is characterized in that the above-mentioned amorphous oxide layer comprises an amorphous oxide containing at least one metal selected from a group consisting of Si, Al, Ti and Sn.

11. In the transparent layered product with low emissivity coating according to any of claims 1 to 10, the transparent layered product with low emissivity coating which is characterized in that the outermost layer of the transparent layered product with low emissivity coating is a protective layer comprising a nitride, an oxynitride or an amorphous oxide containing at least one metal selected from a group consisting of Si, Al, Ti and Sn.

12. In the transparent layered product with low emissivity coating according to any of claims 1 to 11, the transparent layered product with low emissivity coating which is characterized in that the film thickness of the above-mentioned amorphous layer is from 3 nm to 30 nm.

13. In the transparent layered product with low emissivity coating according to any of claims 1 to 11, the transparent layered product with low emissivity coating which is characterized in that the film thickness of the above-mentioned amorphous layer is from 5 nm to 20 nm.

14. In the transparent layered product with low emissivity coating according to any of claims 1 to 13, the transparent layered product with low emissivity coating which is characterized in that at least one of the above-mention amorphous layers comprises a silicon nitride layer.

15. In the transparent layered product with low emissivity coating according to claims 1 to 14, the transparent layered product with low emissivity coating which is characterized in that all of the above-mentioned dielectric layers are the layers mainly comprising zinc oxide.

16. In the transparent layered product with low emissivity coating according to any of claims 1 to 15, the transparent layered product with low emissivity coating which is characterized in that a sacrificial layer for preventing the deterioration of a metal layer during the film formation is inserted into an interface which is distal from a substrate among the interfaces between the above-mentioned metal layer and metal oxide layer.

17. In the transparent layered product with low emissivity coating according to any of claims 1 to 16, the transparent layered product with low emissivity coating which is characterized in that the above-mentioned metal layer mainly comprises Ag.

18. In the transparent layered product with low emissivity coating according to any of claims 1 to 17, the transparent layered product with low emissivity coating which is characterized in that an integral width β

i of a peak having a maximum at 32°

≦

2θ

(angle of diffraction)≦

35°

in X-ray diffraction peaks using CuKα

line of the above-mentioned transparent layered product of low emissivity is from 0.43 to 1.20.

19. In the transparent layered product with low emissivity coating according to claim 18, the transparent layered product with low emissivity coating which is characterized in that the above-mentioned integral width β

i is from 0.50 to 1.20.

20. In the transparent layered product with low emissivity coating according to any of claim 18 or claim 19, the transparent layered product with low emissivity coating which is characterized in that the above-mentioned peak having a maximum at 32°

≦

2θ

(angle of diffraction)≦

35°

is a peak depending upon a (002) diffraction line of zinc oxide.