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Thermal interface pad utilizing low melting metal with retention matrix

  • US 20030187116A1
  • Filed: 10/24/2002
  • Published: 10/02/2003
  • Est. Priority Date: 04/05/2000
  • Status: Active Grant
First Claim
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1. In a stabilized thermally conductive mechanically compliant laminate pad for interposing between opposed surfaces of a heat generating semiconductor device and a heat sink wherein the stabilized thermally conductive mechanically compliant laminate comprises upper and lower laminae on opposed surfaces of a central stabilizing apertured grid and with portions of said laminae extending through apertures in said mesh grid to form a continuum, said stabilized thermally conductive laminate being characterized in that:

  • (a) said upper and lower laminae comprise a mixture of;

    (1) a polymer matrix;

    (2) a quantity of low melting indium or gallium containing alloy having a melt point at about 120°

    C. disbursed within said polymer matrix;

    (3) a thermally conductive particulate solid disbursed within said polymer matrix;

    (b) said stabilizing open mesh grid comprising a grid body with an array of generally reticulated apertures formed therein, and with the structure and said grid forming between about 10% and 90% of the area of said mesh grid, balance apertures;

    (c) each of said reticulated apertures having a cross-sectional dimension greater than about 0.5 mil;

    d) said polymer matrix selected from the group consisting of hot melt waxes of paraffin and silicone, elastomers of acrylic, silicone, urethane, and flexible epoxy'"'"'s, and rigid resins consisting of silicone, urethane, epoxy and phenolic polymers with each polymer matrix having a melting point ranging from between about 40°

    C. and 120°

    C.;

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