Method of inspecting photo-mask

• US 20030194618A1
• Filed: 04/10/2003
• Published: 10/16/2003
• Est. Priority Date: 04/12/2002
• Status: Active Grant

• Current Assignee: Dai Nippon Printing Company Limited
• Original Assignee: Dai Nippon Printing Company Limited
• Inventors: Inomata, Hiroyuki, Hoga, Morihisa
• Granted Patent: US 7,289,657 B2
• Time in Patent Office: Days
• US Class Current: 430/5
• CPC Class Codes: G03F 1/84 Inspecting

Abstract

Provided is a method of inspecting a photo-mask, which enables performing destruction inspection such as contact-type inspection and cross section inspection. The method of inspecting a photo-mask comprises performing destruction inspection with respect to the photo-mask for inspection, by using one of two photo-masks that have been successively manufactured under the same conditions that are set, as a photo-mask for inspection, and using the other of them as a product.

Claims

1. A method of inspecting a photo-mask comprising performing destruction inspection with respect to the photo-mask for inspection, by using one of two photo-masks that have been successively manufactured under the same conditions that are set, as a photo-mask for inspection, and using the other of them as a product.

2. The method of inspecting a photo-mask according to claim 1, wherein the destruction inspection is contact-type inspection.

3. The method of inspecting a photo-mask according to claim 1, wherein the destruction inspection is inspection that is performed with respect to a cross section of the photo-mask.

4. A method of manufacturing a photo-mask comprising a process of inspection that is executed in the method of inspecting according to claim 1.

5. A method of manufacturing a photo-mask comprising a process of inspection that is executed in the method of inspecting according to claim 2.

6. A method of manufacturing a photo-mask comprising a process of inspection that is executed in the method of inspecting according to claim 3.