Ion sources for ion implantation apparatus

• US 20030197129A1
• Filed: 12/31/2002
• Published: 10/23/2003
• Est. Priority Date: 12/31/2001
• Status: Active Grant

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Goldberg, Richard David, Armour, David George, Murrell, Adrian John, Collart, Erik J.H., Burgess, Christopher J. S.
• Granted Patent: US 6,847,043 B2
• Time in Patent Office: Days
• US Class Current: 250/423.00R
• CPC Class Codes: H01J 27/08 using arc discharge
• CPC Class Codes: H01J 37/08 Ion sources; Ion guns

Abstract

The invention relates to improving the efficiency of ion flow from an ion source, by reducing heat loss from the source both in the ion chamber of the ion source and its constituent parts (e.g. the electron source). This is achieved by lining the interior of the ion chamber and/or the exterior with heat reflective and/or heat insulating material and by formation of an indirectly heated cathode tube such that heat transfer along the tube and away from the ion chamber is restricted by the formation of slits in the tube. Efficiency of the ion source is further enhanced by impregnating and/or coating the front plate of the ion chamber with a material which comprises an element or compound thereof, the ions of which element are the same specie as those to be implanted into the substrate from the source thereof.

Claims

1. An ion source comprising an ionisation chamber within which a plasma can be generated, the chamber having an outlet through which ions can exit from the ionisation chamber, electrodes in the ionisation chamber for establishing and maintaining a plasma within the chamber when a power supply is provided thereto, and a heat shield enclosing at least a part of the ionisation chamber to retain heat within the chamber when the ion source is functioning.

2. An ion source according to claim 1 wherein the heat shield comprises a plurality of heat shield members which extend around the ionisation chamber in spaced relationship thereto, a plurality of coupling members for connecting the heat shield members to form the heat shield around the ionisation chamber.

3. An ion source according to claim 2 wherein each heat shield member comprises a reflective plate mounted between adjacent coupling members, the heat shield members being positioned to provide for access to said electrodes.

4. An ion source according to claim 3 wherein each coupling member is provided with slots to accommodate edge portions of adjacent plates to create said heat shield around said chamber.

5. An ion source according to claim 2 wherein each heat shield member comprises a plurality of spaced parallel plates which are held in relative spaced parallel relationship by said coupling members.

6. An ion source according to claim 5 wherein each coupling member is formed to define first and second pluralities of slots, the slots of each plurality being arranged in spaced apart parallel relationship, and the first and second pluralities of slots being orthogonal to one another to mount at least two plates between adjacent coupling members so that the plates are in spaced relationship to one another and to the chamber.

7. An ion source according to claim 5 wherein each plate is formed of stainless steel.

8. An ion source according to claim 2 wherein the ionisation chamber is of cuboid shape and has side and end walls and the heat shield members are arranged in spaced relationship to said side and end walls.

9. An ion source according to claim 8 wherein the coupling members are mounted adjacent intersections of side and end walls of the ionisation chamber and each coupling member comprises a pillar portion extending parallel to and spaced from its adjacent intersection and wing portions extending in the general direction of the adjacent wall, the wing portions providing said slots to accommodate therebetween the spaced parallel plates of the associated heat shield member.

10. An ion source according to claim 8 wherein two electrodes are provided in the ionisation chamber, a first electrode extending through one end wall of the ionisation chamber and the second electrode extending through the other end wall thereof, and each heat shield member provided adjacent an end wall being formed in at least two parts so as to extend from its coupling member adjacent the intersection of that end wall with its associated side wall to a location adjacent but spaced from the adjacent electrode.

11. An ion source according to claim 9 wherein fastenings are provided for securing the plates in situ once the end portions thereof have been located between the wall portions of the wing portions of the associated coupling members.

12. An ion source according to claim 5 wherein a base heat shield is provided in spaced relationship to the base of the ionisation chamber, the base heat shield being secured to base portions of the coupling members.

13. An ion source according to claim 1 wherein the heat shield of the ionisation chamber is provided by an external coating of a material selected from the group consisting of heat-reflective material and heat-insulating material.

14. An ion source according to claim 5 wherein each plate is of laminated construction.

15. An ion source according to claim 1 wherein the heat shield is provided in the form of a hollow multipart body into which the ionisation chamber can be fitted.

16. An ion source according to claim 1 and further comprising a screen provided at an interior wall surface of the ionisation chamber in opposed relationship to the outlet of the ionisation chamber through which ions can be directed, the screen being biased with respect to the chamber to assist at least one of ejection of ions therefrom and the breakdown of molecular species within the chamber

17. An ion source according to claim 1 wherein one of the electrodes comprises a cathode unit having a cathode tube extending into the ionisation chamber, a cathode button mounted at the end of the cathode tube and a heating element positioned in the cathode for connection with a power supply for negatively biasing the heating element relative to the cathode button to effect emission of electrons into the ionisation chamber, the tube having a length and having at least one slit with a direction transverse to the length such as to restrict heat conduction along the cathode tube.

18. An ion source according to claim 1 and further comprising a front face plate for the ionisation chamber for use in extracting ions from the ionisation chamber for supply to said ion implantation apparatus for implantation into a substrate, the front face plate providing the outlet of the ionisation chamber, through which ions can exit the ionisation chamber, the face plate being formed of a material which will not contaminate the flow of ions, and bearing a material selected from an element, and a compound thereof, the ions of which element are the same specie as those to be implanted into the substrate from the source thereof.

32. An ion source according to claim 17 and further comprising a front face plate for the ionisation chamber and providing a chamber outlet, the plate being formed of a material which will not contaminate the flow of ions, so that ions from the chamber may pass therethrough, and bearing a material selected from an element, and a compound thereof, the ions of which element are the same specie as those to be implanted into the substrate from the source thereof.

19. An ion source comprising an ionisation chamber within which a plasma can be generated, an outlet through which ions can exit the chamber, electrodes in the ionisation chamber for establishing and maintaining a plasma within the chamber when a power supply is provided to the electrodes, and a screen provided at an interior wall of the ionisation chamber, electrically insulated therefrom, the screen being heated during operation of the ion source to assist at least one of ejection of ions therefrom through said outlet and the break down of molecular species within the arc chamber.

20. An ion source according to claim 19 wherein said screen is mounted in spaced relationship to said interior wall.

21. An ion source according to claim 19 wherein said screen is mounted on said interior wall.

22. An ion source according to claim 19 wherein said screen is formed of low thermal conductivity material.

23. An ion source according to claim 22 wherein said material is metallic.

24. An ion source according to claim 23 wherein said material is selected from the group consisting of tungsten, molybdenum and compounds and alloys thereof.

25. An ion source according to claim 23 wherein said material is selected from the group consisting of an element, compound thereof and alloy thereof which is capable of ionisation when the ion source is in operation.

26. An ion source according to claim 19 wherein said screen is provided by a rectangular plate.

27. An ion source according to claim 26 wherein the plate is mounted on support pins which extend through the wall of the ionisation chamber.

28. An ion source according to claim 27 wherein the plate is supported on said support pins in spaced relationship to the wall of the ionisation chamber.

29. An ion source according to claim 28, wherein at least one of said support pins is electrically conductive for coupling the screen to a bias supply for biasing the screen with respect to the chamber.

30. An ion source according to claim 19 wherein an inlet port is provided in said chamber through which reactant gas can be introduced into the ionisation chamber, and the screen overlies said inlet port to cause reactant gas to disperse around it when flowing into the ionisation chamber.

31. An ion source according to claim 19 wherein the cathode unit comprising a cathode tube extending into the ionisation chamber, a cathode button mounted at the end of the cathode tube and a heating element positioned in the cathode tube for connection with a power supply negatively biasing the filament relative to the cathode button to emit electrons, thereby to heat the cathode button to cause the cathode button to emit electrons into the ionisation chamber, the tube being having a length and having at least one slit with a component of which is transverse to the length such as to restrict heat conduction along the cathode tube.

33. A cathode unit providing a cathode for use in an ion source of an ion implanter, wherein the ion source comprises an ionisation chamber incorporating said cathode unit and an outlet through which ions can exit from the chamber, the cathode unit comprising a cathode tube arranged to extend through one of said opposed wall portions, a cathode button mounted at the end of the cathode tube within the chamber and a heater element positioned in the cathode tube for connection with a power supply negatively biasing the element relative to the cathode button to emit electrons thereby to heat the cathode button to cause the cathode button to emit electrons into the ionisation chamber, the tube having a length and having at least one slit with a component transverse to the length such as to restrict heat conduction along the cathode tube.

34. A cathode unit according to claim 33 and comprising at least two slits spaced along the length of the cathode tube.

35. A cathode unit according to claim 33 and comprising at least two slits spaced around the cathode tube.

36. A cathode unit according to claim 35 wherein the slits are uniformly spaced around the tube.

37. A cathode unit according to claim 35 wherein each slit lies in a respective plane which is normal to the direction of the length of the cathode tube.

38. A cathode unit according to claim 33 wherein a plurality of said slits is arranged in a discontinuous ring around the tube.

39. A cathode unit according to claim 38 wherein the ring is formed by between two and eight evenly-spaced slits.

40. A cathode unit according to claim 36 wherein the slits are of at least substantially equal length.

41. A cathode unit according to claim 38 wherein a neck portion of the cathode tube is retained between adjacent slits of a ring of slits.

42. A cathode unit according to claim 39 wherein the slits are formed in the cathode tube sufficiently closely and in such spaced relationship to one another that the cathode tube defines a tubular mesh.

43. A cathode unit according to claim 33 wherein the cathode tube and the cathode button are formed of a material selected from the group consisting of tungsten and molybdenum.

44. A cathode unit according to claim 33 wherein the cathode button is shaped to provide a press fit with and at the end of the cathode tube.

45. A cathode unit according to claim 33 wherein the cathode tube and the cathode button are integrally formed as a single one piece unit.

46. A cathode unit according to claim 33 wherein the cathode tube is of circular cross-section.

47. A cathode unit according to claim 33 wherein an aperture is formed in the body of the cathode tube for locating a heating element within the cathode tube adjacent the cathode button and for withdrawing a spent cathode button.

48. An ion source according to claim 33 and further comprising a face plate for an ionisation chamber for supply to the ion implantation apparatus for implantation into a substrate, the face plate providing an outlet of the ionisation chamber through which ions can exit from the ionisation chamber, the plate being formed of a material which will not contaminate the flow of ions, and bearing a material selected from an element, and a compound thereof, the ions of which element are the same specie as those to be implanted into the substrate from the source thereof.

49. A front plate for an ionisation chamber for use in supply of ions to an ion implantation apparatus for implantation into a substrate the electrode having an outlet so that ions from the chamber may pass therethrough, and being impregnated with a material which is selected from an element, and a compound thereof, the ions of which element are the same specie as those to be implanted into the substrate from the source thereof.

50. A front plate for an ion source arc chamber, the front plate having an aperture through which ions can be extracted from the ion chamber containing atoms of a predetermined species, and the plate having an exposed surface containing other atoms of said predetermined species.

51. A front plate for an ionisation chamber for use in extracting boron ions from a boron ion source within the ionisation chamber for supply to an ion implantation apparatus, the front plate having an outlet and being formed of a material comprising graphite impregnated with a material selected from the group consisting of boron and boron nitride.

52. A front plate according to claim 51 of generally planar form and being impregnated with said material more densely at that face than on its opposed face.

53. A front plate according to claim 51 of generally planar form and uniformly impregnated with said material.

57. An front plate according to claim 51 wherein the plate is contoured around the outlet therein to assist with directing of ions therethrough.

54. A front plate for an ionisation chamber for supply of boron ions from a boron ion source in the ionisation chamber to an ion implantation apparatus, the plate having an outlet so that ions from the chamber may pass therethrough, and being formed of a material comprising graphite coated with a material selected from the group consisting of boron and boron nitride.

55. A front plate according to claim 54 and having a face which is intended to face the interior of the ionisation chamber, the face being coated with said material.

56. A front plate according to claim 55 wherein both faces of the plate are coated with said material whereby the plate can be reversed when the coating on said one face is exhausted.

58. An extraction electrode for use in extracting ions of a selected specie from a source thereof in an ionisation chamber for supply to a substrate placed in an ion implantation apparatus, the extraction electrode being mountable in front of an outlet of the ionisation chamber through which said ions are directed from the ionisation chamber, the electrode having an aperture for alignment with said outlet and being formed of a material bearing itself bearing a material selected from an element, and a compound thereof, the ions of which element are the same specie as those to be implanted into the substrate from the source thereof.