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Method of monitoring and/or controlling a semiconductor manufacturing apparatus and a system therefor

  • US 20030199108A1
  • Filed: 05/16/2003
  • Published: 10/23/2003
  • Est. Priority Date: 09/06/2001
  • Status: Active Grant
First Claim
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1. A semiconductor processing apparatus for processing a semiconductor wafer, comprising:

  • a sensor for monitoring a processing state of said semiconductor processing apparatus;

    processing result input means for inputting measured values for processing results of a semiconductor wafer processed by said semiconductor processing apparatus;

    a model equation generation unit relying on sensed data acquired by said sensor and said measured values to generate a model equation for predicting a processing result using said sensed data as an explanatory variable;

    a processing result prediction unit for predicting a processing result based on said model equation and said sensed data; and

    a process recipe control unit for comparing said predicted processing result with a previously set value to control a processing condition of said semiconductor processing apparatus such that a deviation between said predicted processing result and said previously set value is corrected, wherein said model equation generation unit generates a model equation using a PLS method (Partial Least Square method).

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