Tunable focus ring for plasma processing
First Claim
1. A focus ring assembly apparatus for a plasma reactor system for processing a workpiece having an outer edge and an upper surface, comprising:
- a) a ring electrode;
b) a focus ring made of nonconductive material arranged atop, and insulated from, said ring electrode;
c) a first RF power supply electrically connected to said focus ring electrode; and
d) a tuning network arranged between said first RF power supply and said ring electrode.
1 Assignment
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Accused Products
Abstract
A focus ring (200) and related assembly for a plasma reactor system (100, 400) for processing a workpiece (176) having an outer edge and an upper surface. The assembly has a focus ring support surface (173) arranged around the workpiece perimeter and a ring electrode (210) arranged atop the focus ring support surface. An insulating focus ring (200) is arranged atop the ring electrode. In one embodiment, a first RF power supply (180) is electrically connected to the focus ring electrode and a tuning network (220) is arranged between the first RF power supply and the ring electrode. Methods of forming a plasma (130) and processing a workpiece in an optimized way, as well as a plasma reactor system for accomplishing the same, are also disclosed.
131 Citations
21 Claims
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1. A focus ring assembly apparatus for a plasma reactor system for processing a workpiece having an outer edge and an upper surface, comprising:
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a) a ring electrode;
b) a focus ring made of nonconductive material arranged atop, and insulated from, said ring electrode;
c) a first RF power supply electrically connected to said focus ring electrode; and
d) a tuning network arranged between said first RF power supply and said ring electrode. - View Dependent Claims (2, 3, 4, 5, 6, 8, 9, 10, 11)
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7. A focus ring assembly apparatus for a plasma reactor system for processing a workpiece having an outer edge and an upper surface, comprising:
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a) a focus ring support surface arranged around the workpiece outer edge, wherein said focus ring support surface is part of a workpiece support member having a lower electrode capable of supporting the workpiece, a base surrounding said lower electrode, and an insulating region between said lower electrode and said base, wherein said focus ring support surface is part of said base;
b) a ring electrode arranged atop said focus ring support surface;
c) a focus ring made of nonconductive material arranged atop said ring electrode;
d) a first RF power supply electrically connected to said focus ring electrode; and
e) a second RF power supply electrically connected to said lower electrode. - View Dependent Claims (12, 13, 14, 15)
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16. A method of plasma processing a workpiece to a desired standard, the workpiece having an upper surface and an outer edge with a reactor system having a reactor chamber containing a focus ring arranged adjacent the workpiece outer edge and made of a material M and having a profile P, inner and outer radii (RI and RO), the ring being positioned a vertical distance D from the workpiece upper surface, wherein a ring electrode is arranged adjacent the focus ring, the system thus having a set A of variable process parameters {P, R, M, D}, the method comprising the steps of:
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a) setting parameters A={P, R, M, D} to initial values; and
b) processing one or more workpieces while varying one or more of said process parameters to determine an optimized set of process parameters A*={P*, R*, M*, D*} that provide the desired processing to within a predetermined standard. - View Dependent Claims (17, 18, 19, 20, 21)
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Specification