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Plasma etching apparatus

  • US 20030203640A1
  • Filed: 05/20/2003
  • Published: 10/30/2003
  • Est. Priority Date: 03/16/1995
  • Status: Abandoned Application
First Claim
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1. A plasma etching apparatus for processing a sample placed within a processing chamber comprising:

  • a sidewall member which is electrically grounded to earth and constitutes at least a portion of the processing chamber; and

    a removable member which constitutes an inner wall surface of the processing chamber, the removable member being thermally conductive and being held on the sidewall member and movable therefrom for removal from the processing chamber;

    wherein the sample is processed in the processing chamber while controlling a temperature of the removable member.

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