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Exposure apparatus for irradiating a sensitized substrate

  • US 20030206337A1
  • Filed: 05/06/2002
  • Published: 11/06/2003
  • Est. Priority Date: 05/06/2002
  • Status: Abandoned Application
First Claim
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1. An apparatus for uniform irradiation of a substrate, comprising:

  • (a) a light source for providing source radiation;

    (b) a uniformizing component for homogenizing said source radiation to provide a uniform exposure beam having uniform energy across the field;

    (c) a polarizer for conditioning said uniform exposure beam to provide a polarized uniform exposure beam; and

    (d) a telecentric projection system for projecting said polarized uniform exposure beam onto the substrate.

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