Methods for critical dimension and focus mapping using critical dimension test marks
First Claim
1. A method comprising:
- repeatedly exposing a wafer with a lithography tool to form a plurality of test marks on the surface of the wafer;
measuring a focus component of the test marks;
mapping the wafer from the measured focus component of the test marks;
characterizing the lithography tool based on the mapped wafer; and
adjusting the lithography tool to improve focusing based on the characterization.
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Abstract
Methods for using critical dimension test marks (test marks) for the rapid determination of the best focus position of lithographic processing equipment and critical dimension measurement analysis across a wafer'"'"'s surface are described. In a first embodiment, a plurality of test mark arrays are distributed across the surface of a wafer, a different plurality being created at a plurality of focus positions. Measurement of the length or area of the resultant test marks allows for the determination of the best focus position of the processing equipment. Critical dimension measurements at multiple points on a wafer with test marks allow for the determination of process accuracy and repeatability and further allows for the real-time detection of process degradation. Using test marks which require only a relatively simple optical scanner and sensor to measure their length or area, it is possible to measure hundreds of measurement values across a wafer in thirty minutes. Comparable measurements with a Scanning Electron Microscope (SEM) require at least five hours.
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Citations
38 Claims
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1. A method comprising:
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repeatedly exposing a wafer with a lithography tool to form a plurality of test marks on the surface of the wafer;
measuring a focus component of the test marks;
mapping the wafer from the measured focus component of the test marks;
characterizing the lithography tool based on the mapped wafer; and
adjusting the lithography tool to improve focusing based on the characterization. - View Dependent Claims (2, 3, 4, 5)
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6. A method for determining the performance of semiconductor wafer processing equipment, the method comprising:
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creating a plurality of test marks on the surface of the semiconductor wafer during a processing step, the test marks being made by an imaging pattern with known critical dimensions;
measuring the test marks after the processing step is complete; and
adjusting the equipment if the test marks are not measured to have at least a predefined value. - View Dependent Claims (7, 8, 9, 10, 11, 12, 13)
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14. A method for using test marks generated by a lithographic process, the method comprising the steps of:
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selecting areas of a semiconductor wafer, the wafer having a top surface upon which areas test marks will be generated;
generating the test marks on the selected areas by using a lithographic process;
measuring at least a first predefined parameter of the test marks; and
altering at least one parameter of the lithographic process depending on the results of the measuring step. - View Dependent Claims (15, 16, 17, 18, 19)
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20. A method for determining the best focus position of a lithographic production device, the method comprising the steps of:
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creating a plurality of test fields in a resist, wherein each test field has a multiplicity of test marks that are stepped through focus;
measuring each of the test marks, thereby generating test mark data;
using the test mark data to select a best focus profile for future operation of the lithographic production device that created test marks. - View Dependent Claims (21, 22, 23, 24)
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25. An apparatus for determining the best focus position of a lithographic production device, the apparatus comprising:
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the lithographic production device for creating a plurality of test fields in a resist formed on a wafer, wherein each test field has a multiplicity of test marks that are formed using incrementally different focuses of the lithographic device such that the marks within each field are stepped through focus, the test fields being distributed at different locations about the wafer with some test fields being located at the edge of a useful portion of the wafer and some of the test fields being located at interior positions on the wafer;
a measuring system for measuring each of the test marks at each of the plurality of focus steps; and
a data collection device coupled to the measuring system for storing the results of the measurement of the test marks and for calculating from the stored measurements the best focus position of the lithographic production device. - View Dependent Claims (26, 27, 28, 29, 30, 31)
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32. A method for determining the best focus position of a lithographic production device, the method comprising the steps of:
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creating a plurality of test marks across a surface of a wafer at a first focus position;
stepping the focus position to a successive focus position;
repeating the creating and stepping operations until a plurality of test marks has been created on the wafer at a predefined plurality of focus steps;
measuring each plurality of test marks at each f the plurality of focus steps;
selecting the focus step for future operation of the lithographic production device that created test marks having the largest measure value. - View Dependent Claims (33, 34, 35, 36, 37, 38)
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Specification