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Atmospheric pressure plasma processing reactor

  • US 20030213561A1
  • Filed: 07/29/2002
  • Published: 11/20/2003
  • Est. Priority Date: 03/12/2001
  • Status: Abandoned Application
First Claim
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1. An atmospheric pressure plasma processing reactor comprising:

  • an electrically conductive table for holding and moving a wafer to be processed along a defined track;

    at least one atmospheric pressure plasma processor, said at least one atmospheric pressure plasma processor having an electrically conductive electrode situated in close proximity to said electrically conductive table, and defining an entry for introduction of a gas mixture;

    wherein with a radio-frequency voltage connected between said electrically conductive table and said electrically conductive electrode of said least one atmospheric pressure plasma processor and said gas mixture introduced into said at least one atmospheric pressure plasma processor, a plasma is created between said wafer to be processed and said electrically conductive electrode of said at least one atmospheric pressure plasma processor for processing said wafer to be processed during relative movement of the wafer and electrically conductive electrode.

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