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MONOLITHICALLY INTEGRATED DIODES IN THIN-FILM PHOTOVOLTAIC DEVICES

  • US 20030213974A1
  • Filed: 05/14/2002
  • Published: 11/20/2003
  • Est. Priority Date: 05/14/2002
  • Status: Active Grant
First Claim
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1. A method for manufacturing diodes comprising the steps of providing a photoactive apparatus comprising an electrically insulating substrate layer, a conductive layer deposited on said substrate layer, a p-type absorber layer deposited on said conductive layer, and an n-type window layer deposited on said p-type absorber layer;

  • a first removing step comprising removing a portion of said conductive layer, said p-type absorber layer, and said n-type window layer;

    applying an electrical insulator to a portion of said substrate;

    a second removing step comprising removing a portion of said p-type absorber layer and said n-type window layer;

    applying a translucent conductor layer to said apparatus;

    a third removing step comprising removing a portion of said translucent conductor layer, of said p-type absorber layer, and of said n-type window layer; and

    applying an opaque layer to a portion of said translucent conductive layer.

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