Method and apparatus for VHF plasma processing with load mismatch reliability and stability
First Claim
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1. A radio frequency (RF) generator apparatus for a plasma processing system that is resistant to nonlinear load mismatch conditions, said apparatus comprising:
- an RF oscillator configured to generate an RF signal;
an RF amplifier responsive to said RF signal to produce a VHF RF signal having sufficient power to drive a plasma chamber load; and
a VHF-band circulator coupled to said amplifier and configured to isolate nonlinearities of the plasma chamber load from said RF amplifier.
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Abstract
A radio frequency (RF) generator apparatus for a plasma processing system that is resistant to nonlinear load mismatch conditions is provided. The apparatus includes an RF oscillator configured to generate an RF signal, an RF amplifier responsive to the RF signal to produce a VHF RF signal having sufficient power to drive a plasma chamber load, and a VHF-band circulatorcoupled to the amplifier and configured to isolate nonlinearities of the plasma chamber load from the amplifier.
80 Citations
24 Claims
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1. A radio frequency (RF) generator apparatus for a plasma processing system that is resistant to nonlinear load mismatch conditions, said apparatus comprising:
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an RF oscillator configured to generate an RF signal;
an RF amplifier responsive to said RF signal to produce a VHF RF signal having sufficient power to drive a plasma chamber load; and
a VHF-band circulator coupled to said amplifier and configured to isolate nonlinearities of the plasma chamber load from said RF amplifier. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A plasma processing system comprising:
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a plasma chamber; and
a radio frequency (RF) generator apparatus operatively coupled to said plasma chamber to supply RF power thereto at a VHF frequency, said RF generator apparatus comprising an RF amplifier configured to produce said RF power supplied to said RF generator apparatus and a VHF-band circulator having an output configured to supply said RF power to said plasma chamber and to isolate nonlinearities of said plasma chamber from said RF amplifier. - View Dependent Claims (16, 17, 18, 19, 20)
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21. A method for providing RF power at a VHF frequency to a non-linear plasma chamber load comprising:
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generating VHF RF power in an RF generator output stage;
passing said VHF RF power through a VHF-band circulator; and
applying the VHF RF power passed through the VHF band circulator to a plasma chamber load. - View Dependent Claims (22, 23, 24)
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Specification