Supporting apparatus having a plurality of magnets that generate a floating force and method, stage apparatus, and exposure apparatus

• US 20030217694A1
• Filed: 05/09/2003
• Published: 11/27/2003
• Est. Priority Date: 05/27/2002
• Status: Active Grant

• Current Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Original Assignee: Canon Ayutthaya Limited (Canon Inc.)
• Inventors: Korenaga, Nobushige
• Granted Patent: US 6,954,041 B2
• Time in Patent Office: Days
• US Class Current: 118/500
• CPC Class Codes: F16C 29/00 Bearings for parts moving only linearly F16C32/06 takes precedence; incorporated in flexible shafts F16C1/28 ; parts of bearings in general and special methods for making bearings or parts thereof in general F16C33/00
• CPC Class Codes: F16C 39/063 Permanent magnets
• CPC Class Codes: G03F 7/70816 Bearings

Abstract

Compatibility of a small spring constant and large supporting load is realized, so that a stable operation is assured even if a fine-movement linear motor fails. A supporting unit, having a plurality of magnets whose same poles are arranged facing each other, is adapted to support the self-weight of a top plate on which an object to be positioned is mounted, using a repulsive force in a direction orthogonal to the facing direction of the plurality of magnets. In a characteristic curve representing the relationship between the floating force and displacement in a floating direction, the tangent inclination when the object is at a first position in the floating direction is negative, and the relationship of floating force<the self-weight holds when the object is at a second position lower than the first position.

Claims

1. A supporting apparatus comprising:

a first movable member; and

a supporting unit having a plurality of magnets whose same poles are arranged to face each other, said supporting unit being configured to support said movable member using a floating force generated by said plurality of magnets as a repulsive force in a floating direction perpendicular to a facing direction of said plurality of magnets.

2. A supporting apparatus according to claim 1, wherein when said first movable member is set to a first position in the floating direction, an inclination of a tangent of a characteristic curve representing a relationship between the floating force and a displacement in the floating direction is negative.

3. A supporting apparatus according to claim 2, wherein when said first movable member is set to a second position different from the first position, the following condition is satisfied:

the floating force<

a self-weight of said first movable member.

4. A supporting apparatus according to claim 3, wherein the second position is lower than the first position with respect to the floating direction.

5. A supporting apparatus according to claim 4, wherein the first position is a position at which said first movable member is disposed when predetermined processing is performed for an object to be processed upon said movable member, and

wherein the second position is a position at which said first movable member is disposed when the object to be processed is delivered onto said first movable member.

6. A supporting apparatus according to claim 1, wherein said supporting unit comprises a repulsive movable member and a repulsive stator,

wherein said repulsive movable member, at a side of said repulsive movable member facing said first movable member, comprises only a magnet, and

wherein said repulsive stator comprises a yoke and a magnet disposed closer to said repulsive movable member than said yoke.

7. A supporting apparatus according to claim 1, wherein said supporting unit comprises (a) a second movable member including a magnet and (b) a stator including a magnet, and

wherein when the floating direction is defined as a z-axis direction, a direction of a normal of a surface where the same poles of the plurality of magnets face each other is defined as a y-axis direction, and a direction orthogonal to a zy plane is defined as an x-axis direction, the following condition is satisfied:

the size in the x-axis direction of said magnet of said movable member<

the size in the x-axis direction of said magnet of said stator.

8. A supporting apparatus according to claim 1, wherein a plurality of said supporting members are provided.

9. A supporting apparatus according to claim 8, wherein a direction of magnetization of the magnet differs among said plurality of supporting members.

10. A supporting apparatus according to claim 1, wherein each of said plurality of magnets is made of a plate-shaped material that is magnetized in a direction of a thickness of said magnet.

12. A stage apparatus comprising:

a top plate on which an object to be positioned is mountable;

a supporting apparatus according to claim 1, said supporting apparatus being configured to support said top plate; and

driving means for performing six-axes control of said top plate.

13. A stage apparatus according to claim 12, wherein said driving means comprises a fine-movement linear motor.

14. An exposure apparatus comprising a stage apparatus according to claim 13.

15. A semiconductor-device manufacturing method comprising the steps of:

installing, in a semiconductor manufacturing factory, a group of manufacturing apparatuses for performing semiconductor-device manufacturing processes, the group of manufacturing apparatuses including various processes including an exposure apparatus according to claim 14;

and

manufacturing semiconductor devices by performing a plurality of semiconductor-device manufacturing processes using the group of manufacturing apparatuses.

16. A semiconductor-device manufacturing method according to claim 15, further comprising the steps of:

interconnecting the group of manufacturing apparatuses by a local area network; and

performing data communication of information relating to at least one of the group of manufacturing apparatuses between the local area network and an external network outside of the semiconductor manufacturing factory.

17. A semiconductor-device manufacturing method according to claim 16, wherein production management is performed (a) by obtaining maintenance information for the group of manufacturing apparatuses, said step of obtaining of maintenance information comprising using data communication via the external network to access a database provided by a vendor or a user of the exposure apparatus, or (b) by performing data communication via the external network with another semiconductor manufacturing factory.

18. A semiconductor manufacturing factory comprising:

a group of manufacturing apparatuses for performing a plurality of semiconductor manufacturing processes, said group of manufacturing apparatuses including an exposure apparatus according to claim 14;

a local area network configured to interconnect said group of manufacturing apparatuses; and

a gateway configured to allow access from said local area network to an external network outside of said semiconductor manufacturing factory,

wherein data communication of information relating to at least one of said group of manufacturing apparatuses is allowed in between said local area network and the external network outside of said semiconductor manufacturing factory via said gateway.

19. A maintenance method comprising the steps of:

providing a maintenance database connected to an external network outside of a semiconductor manufacturing factory by a vendor or a user of an exposure apparatus according to claim 14 installed in the semiconductor manufacturing factory;

allowing access to the maintenance database from within the semiconductor manufacturing factory via the external network; and

transmitting maintenance information stored in the maintenance database to the semiconductor manufacturing factory via the external network.

20. An exposure apparatus according to claim 14, further comprising:

a display;

a network interface; and

a computer adapted to execute software for a network;

wherein data communication of maintenance information of said exposure apparatus via a computer network is allowed by using said computer and said network interface.

21. An exposure apparatus according to claim 20, wherein the software for the network (a) provides a user interface on said display, the user interface being connected to an external network outside of a factory where said exposure apparatus is installed, the user interface further being configured to access a maintenance database provided by a vendor or a user of said exposure apparatus, and (b) obtains information from the maintenance database via the external network.

11. A supporting method comprising the steps of:

providing a first movable member;

providing a plurality of magnets whose same poles are arranged to face each other; and

supporting the first movable member using a floating force generated by the plurality of magnets as a repulsive force in a floating direction perpendicular to a facing direction of the plurality of magnets.

22. An apparatus comprising:

a plate arranged to support a wafer, upon which wafer a semiconductor manufacturing process is to be performed;

a supporting device configured to support said plate, said supporting device comprising a movable magnet and a stator comprising a first stator magnet and a second stator magnet disposed on opposite sides of said movable magnet, each of said first stator magnet and said second stator magnet having a pole facing said movable magnet that is inverse to the respective facing pole of said movable magnet.

23. An apparatus according to claim 22, wherein said stator further comprises a first yoke and a second yoke which together with said first stator magnet and said second stator magnet form a magnetic circuit.

24. An apparatus according to claim 22, wherein a plurality of said supporting devices are included.

25. An apparatus according to claim 22, wherein three of said supporting devices are included.

26. An apparatus according to claim 22, wherein said plate is supported by said supporting device by resting upon a magnet holder disposed between said movable magnet and said plate.