Fabrication of a waveguide taper through ion implantation
First Claim
1. A method for fabricating a taper, comprising:
- forming a cladding layer over a substrate;
forming a core layer on the cladding layer; and
implanting ions in a portion of the core layer so that the implanted portion has a surface that is angled relative to a surface of the cladding layer, wherein the implanted ions cause the implanted portion to have a refractive index that is different from an unimplanted portion of the core layer.
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Abstract
A method to form a taper in a semiconductor layer. In one embodiment, the semiconductor layer is formed on a cladding layer. A mask layer is formed on the semiconductor layer. The mask layer is patterned and etched to form at least an angled region and a thick region. An ion implantation process is performed so that the portion under the angled region is implanted to have an interface or surface that is angled relative to the surface of the cladding layer. This angled surface forms part of the vertical taper. The implanted region does not contact the cladding layer, leaving an unimplanted portion to serve as a waveguide. The portion under the thick region is not implanted, forming a coupling end of the taper.
39 Citations
30 Claims
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1. A method for fabricating a taper, comprising:
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forming a cladding layer over a substrate;
forming a core layer on the cladding layer; and
implanting ions in a portion of the core layer so that the implanted portion has a surface that is angled relative to a surface of the cladding layer, wherein the implanted ions cause the implanted portion to have a refractive index that is different from an unimplanted portion of the core layer. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. An apparatus for propagating an optical signal, the apparatus comprising:
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a cladding layer; and
a core disposed on a surface of the cladding layer, the core layer having a first region and a second region, the first region having a refractive index different from that of the second region, the first region has a surface that is angled relative to a surface of the cladding layer. - View Dependent Claims (15, 16, 17, 18, 19, 20)
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21. An planar lightwave circuit (PLC) comprising:
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a semiconductor substrate;
a cladding layer disposed on the semiconductor substrate;
a core disposed on a surface of the cladding layer, the core layer having a first region and a second region, wherein the first region has a refractive index less from that of the second region and has a surface that is angled relative to a surface of the cladding layer, and wherein the second region is configured to be coupled to a waveguide; and
a protective layer formed to cover at least a portion of the core layer.
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- 23. The PLC of claim 23 wherein the first region and the second region are part of a semiconductor layer, the first region including implanted ions that reduce the first region'"'"'s refractive index relative to that of the second region.
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27. A system comprising:
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an optical signal source;
an optical fiber having one end coupled to the optical signal source; and
an integrated circuit that includes;
a semiconductor substrate, a cladding layer disposed on the semiconductor substrate, a core disposed on a surface of the cladding layer, the core layer having a first region and a second region, wherein the first region has a refractive index less from that of the second region and has a surface that is angled relative to a surface of the cladding layer, the second region being coupled to the optical fiber, and a protective layer formed to cover at least a portion of the core layer. - View Dependent Claims (26, 28, 29, 30)
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Specification