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Fabrication of a waveguide taper through ion implantation

  • US 20030223696A1
  • Filed: 05/31/2002
  • Published: 12/04/2003
  • Est. Priority Date: 05/31/2002
  • Status: Active Grant
First Claim
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1. A method for fabricating a taper, comprising:

  • forming a cladding layer over a substrate;

    forming a core layer on the cladding layer; and

    implanting ions in a portion of the core layer so that the implanted portion has a surface that is angled relative to a surface of the cladding layer, wherein the implanted ions cause the implanted portion to have a refractive index that is different from an unimplanted portion of the core layer.

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