System and method for lithography process monitoring and control
First Claim
1. An image sensor unit, for use with a highly precise moveable platform, the image sensor unit comprising:
- a substrate having a wafer-shaped profile;
a sensor array, disposed on the wafer-shaped substrate, the sensor array including;
a plurality of sensor cells wherein each sensor cell includes an active area to sense light of a predetermined wavelength that is incident thereon; and
a film, disposed over the active areas of the plurality of sensor cells and comprised of a material that impedes passage of light of the predetermined wavelength, wherein the film includes a plurality of apertures which are arranged such that an aperture of the plurality of apertures overlies an active area of a corresponding sensor cell to expose a portion of the active area and wherein light of the predetermined wavelength is capable of being sensed by the portion of the active area that is exposed by the corresponding aperture.
2 Assignments
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Accused Products
Abstract
In one aspect, the present invention is a technique of, and a system and sensor for measuring, inspecting, characterizing and/or evaluating optical lithographic equipment, methods, and/or materials used therewith, for example, photomasks. In one embodiment, the system, sensor and technique measures, collects and/or detects an aerial image produced or generated by the interaction between the photomask and lithographic equipment. An image sensor unit may measure, collect, sense and/or detect the aerial image in situ—that is, the aerial image at the wafer plane produced, in part, by a product-type photomask (i.e., a wafer having integrated circuits formed during the integrated circuit fabrication process) and/or by associated lithographic equipment used, or to be used, to manufacture of integrated circuits. In this way, the aerial image used, generated or produced to measure, inspect, characterize and/or evaluate the photomask is the same aerial image used, generated or produced during wafer exposure in integrated circuit manufacturing.
In another embodiment, the system, sensor and technique characterizes and/or evaluates the performance of the optical lithographic equipment, for example, the optical sub-system of such equipment. In this regard, in one embodiment, an image sensor unit measures, collects, senses and/or detects the aerial image produced or generated by the interaction between lithographic equipment and a photomask having a known, predetermined or fixed pattern (i.e., test mask). In this way, the system, sensor and technique collects, senses and/or detects the aerial image produced or generated by the test mask—lithographic equipment in order to inspect, evaluate and/or characterize the performance of the lithographic equipment.
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Citations
40 Claims
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1. An image sensor unit, for use with a highly precise moveable platform, the image sensor unit comprising:
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a substrate having a wafer-shaped profile;
a sensor array, disposed on the wafer-shaped substrate, the sensor array including;
a plurality of sensor cells wherein each sensor cell includes an active area to sense light of a predetermined wavelength that is incident thereon; and
a film, disposed over the active areas of the plurality of sensor cells and comprised of a material that impedes passage of light of the predetermined wavelength, wherein the film includes a plurality of apertures which are arranged such that an aperture of the plurality of apertures overlies an active area of a corresponding sensor cell to expose a portion of the active area and wherein light of the predetermined wavelength is capable of being sensed by the portion of the active area that is exposed by the corresponding aperture. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9)
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10. An image sensor unit, for use with a highly precise moveable platform, the image sensor unit comprising:
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a wafer-shaped substrate;
a sensor array, integrated into the substrate, the sensor array including;
a plurality of sensor cells wherein each sensor cell includes an active area to sense light of a predetermined wavelength that is incident thereon; and
a film, disposed over the active areas of the plurality of sensor cells and comprised of a material that impedes passage of light of the predetermined wavelength, wherein the film includes a plurality of apertures which are arranged such that an aperture of the plurality of apertures overlies an active area of a corresponding sensor cell to expose a portion of the active area and wherein light of the predetermined wavelength is capable of being sensed by the portion of the active area that is exposed by the corresponding aperture. - View Dependent Claims (11, 12, 13, 14, 15, 16, 17, 18, 19)
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20. A system to collect image data which is representative of an aerial image of a mask that is projected on a wafer plane, the system comprising:
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an optical system to produce the image of the mask on the wafer plane;
a moveable platform;
an image sensor unit, disposed on the moveable platform, to collect image data which is representative of the aerial image of the mask, the image sensor unit includes;
a wafer-shaped substrate;
a sensor array, disposed on or in the wafer-shaped substrate, wherein the sensor array is located in the wafer plane, the sensor array includes;
a plurality of sensor cells wherein each sensor cell includes an active area to sense light of a predetermined wavelength that is incident thereon; and
a film, disposed over the active areas of the plurality of sensor cells and comprised of a material that impedes passage of light of the predetermined wavelength, wherein the film includes a plurality of apertures which are arranged such that an aperture of the plurality of apertures overlies a corresponding active area of a corresponding sensor cell to expose a portion of the active area and wherein light of the predetermined wavelength is capable of being sensed by the portion of the active area that is exposed by the corresponding aperture. - View Dependent Claims (21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31)
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32. An image sensor unit which is capable of collecting image data which is representative of an aerial image of a mask that is projected on a wafer plane by a lithographic unit, the image sensor unit comprising:
a sensor array, disposed in the moveable platform of the lithographic unit wherein the sensor array is capable of being located in the wafer plane, the sensor array includes;
a plurality of sensor cells wherein each sensor cell includes an active area to sense light of a predetermined wavelength that is incident thereon; and
a film, disposed over the active areas of the plurality of sensor cells and comprised of a material that impedes passage of light of the predetermined wavelength, wherein the film includes a plurality of apertures which are arranged such that an aperture of the plurality of apertures overlies a corresponding active area of a corresponding sensor cell to expose a portion of the active area and wherein light of the predetermined wavelength is capable of being sensed by the portion of the active area that is exposed by the corresponding aperture. - View Dependent Claims (33, 34, 35, 36, 37, 38, 39, 40)
Specification