Device for generating reactive ions
First Claim
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1. A ion source gas delivery system comprising:
- a) A chemical analyzer for measuring residual gas levels;
b) A controller for receiving residual gas levels and sending control signals to c) A valve which controls the delivery of gas to an ion source.
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Abstract
The invention relates to devices and methods for generating reactive ions in thin layer chemistry vacuum or vapor chamber where the mixture and delivery of gas to an ion source controlled by a controller sensitive to the chemical make up in the vacuum or vapor chamber.
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20 Claims
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1. A ion source gas delivery system comprising:
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a) A chemical analyzer for measuring residual gas levels;
b) A controller for receiving residual gas levels and sending control signals to c) A valve which controls the delivery of gas to an ion source. - View Dependent Claims (2, 3, 4, 5, 6, 7)
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8. A method for delivering gas to an ion source including the following steps:
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a) measuring the level of residual gas;
b) providing a controller with the measurements of the level of the residual gas;
c) sending control signals from the controller to valve controlling the release of gas to the ion source that affect the level of the measured residual gas. - View Dependent Claims (9, 10, 11, 12, 13, 14, 15)
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- 16. A product which at some point in its manufacture at lease some surface of the product was subject to surface treatment by an ion source where the delivery of gas to the ion source is controlled by a controller that receives information from a chemical analyzer that measures the levels of residual gases that are affected by the amount of a particular gas delivered to the ion source.
Specification