×

Systems and methods for generating an artwork representation according to a circuit fabrication process

  • US 20030237072A1
  • Filed: 06/19/2002
  • Published: 12/25/2003
  • Est. Priority Date: 06/19/2002
  • Status: Active Grant
First Claim
Patent Images

1. A system for generating an artwork representation according to a circuit fabrication process, comprising:

  • a cell library that stores at least dimensional information associated with a plurality of circuit cells, wherein each of said plurality of circuit cells is defined by a sub-mask for a respective logical device according to said circuit fabrication process;

    an instance placement engine that generates a circuit layout that is defined by at least a specification file specifying an arrangement of logical devices and said cell library; and

    an artwork generator that generates an artwork representation that defines a mask for etching of said generated circuit layout according to said circuit fabrication process.

View all claims
  • 4 Assignments
Timeline View
Assignment View
    ×
    ×