Multiple system vibration isolator

• US 20040000215A1
• Filed: 06/28/2002
• Published: 01/01/2004
• Est. Priority Date: 03/27/2001
• Status: Active Grant

• Current Assignee: Alton H. Phillips, Andrew J. Hazelton, Douglas C. Watson
• Original Assignee: Nikon Corporation
• Inventors: Watson, Douglas C., Hazelton, Andrew J., Phillips, Alton H.
• Granted Patent: US 7,095,482 B2
• Time in Patent Office: Days
• US Class Current: 74/574
• CPC Class Codes: F16F 15/0232 with at least one gas spring F16F15/027 takes precedence
• CPC Class Codes: F16F 9/02 using gas only or vacuum F16F9/006 takes precedence

Abstract

A vibration isolator (200) for isolating a first assembly (206) from vibration from a second assembly (208) includes a first system (202) and a second system (204) coupled to the first system (202). In one embodiment, the first system (202) supports the majority of the first assembly (206) relative to the second assembly (208) and the second system (204) adjusts for a change in the location of the center of gravity of the first assembly (206). Further, the second system (204) can be used to compensate for fluctuations in the atmospheric pressure near the vibration isolator (200).

Claims

1. A vibration isolator for isolating a first assembly from vibration from a second assembly, the first assembly having a center of gravity, the vibration isolator comprising:

a first system that supports at least a portion of the first assembly relative to the second assembly; and

a second system that is coupled to the first system, the second system adjusting for a change in the location of the center of gravity of the first assembly.

2. The vibration isolator of claim 1 wherein the first system is different from the second system.

3. The vibration isolator of claim 1 wherein the second system compensates for fluctuations in the atmospheric pressure near the second system.

4. The vibration isolator of claim 1 wherein the first system includes a first cylinder and a first piston that moves within the first cylinder, the first piston cooperating with the first cylinder to define a first chamber, wherein the first chamber is maintained at a pressure that is less than the pressure outside the first chamber.

5. The vibration isolator of claim 1 wherein the first system includes a first cylinder and a first piston that moves within the first cylinder, the first piston cooperating with the first cylinder to define a first chamber, wherein the first chamber is maintained at a pressure that is less than the atmospheric pressure.

6. The vibration isolator of claim 5 wherein the second system includes a second cylinder and a second piston that moves within the second cylinder, the second piston cooperating with the second cylinder to define a second chamber, wherein the second chamber is maintained at a pressure that is greater than the atmospheric pressure.

7. The vibration isolator of claim 5 wherein the second system includes a mass controller that changes the mass that is supported by the first system.

8. The vibration isolator of claim 5 wherein the second system includes a mover that adjusts the position of the first assembly relative to the second assembly.

9. The vibration isolator of claim 5 further comprising a third system that includes a third cylinder and a third piston coupled to the first piston, the third piston moving within the third cylinder and cooperating with the third cylinder to define a third chamber, wherein the third chamber is maintained at a pressure that is less than the atmospheric pressure.

10. The vibration isolator of claim 1 wherein the second system includes a mass controller that changes the mass that is coupled to the first system.

11. The vibration isolator of claim 1 wherein the second system includes a mover.

12. The vibration isolator of claim 1 wherein the first system includes a first cylinder and a first piston that moves within the first cylinder, the first piston cooperating with the first cylinder to define a first chamber and wherein the second system includes a second cylinder and a second piston that moves relative to the second cylinder, the second piston cooperating with the second cylinder to define a second chamber.

13. The vibration isolator of claim 12 wherein the first chamber is maintained at a first chamber pressure that is less than the atmospheric pressure and the second chamber is maintained at a second chamber pressure that is greater than the atmospheric pressure.

14. The vibration isolator of claim 12 further comprising a third system that includes a third cylinder and a third piston coupled to the first piston, the third piston moving within the third cylinder and cooperating with the third cylinder to define a third chamber, wherein the third chamber is maintained at a pressure that is less than the atmospheric pressure.

15. The vibration isolator of claim 12 wherein the first chamber is maintained at a first chamber pressure that is less than a second chamber pressure in the second chamber.

16. The vibration isolator of claim 12 further comprising a first connector that couples the first piston to the second piston so that the first piston and the second piston move concurrently.

17. The vibration isolator of claim 16 wherein one of the pistons is positioned directly above the other piston.

18. The vibration isolator of claim 1 wherein the first system includes a magnet section, a spaced apart magnetically permeable section.

19. The vibration isolator of claim 18 wherein the second system includes a second cylinder and a second piston that moves relative to the second cylinder, the second piston cooperating with the second cylinder to define a second chamber.

20. The vibration isolator of claim 19 wherein the second chamber is maintained at a second chamber pressure that is greater than atmospheric pressure.

21. The vibration isolator of claim 1 wherein the first system includes a first magnet section and a spaced apart second magnet section.

22. The vibration isolator of claim 21 wherein the second system is a fluid type actuator.

23. The vibration isolator of claim 1 wherein one of the systems is positioned directly above the other system.

24. The vibration isolator of claim 23 wherein one of the systems is stacked directly on top of the other system.

25. The vibration isolator of claim 1 wherein at least a portion of one of the systems pivots relative to the other system to allow for lateral movement of the first assembly relative to the second assembly.

26. The vibration isolator of claim 25 including a plurality of first systems and a plurality of second systems that are coupled together.

27. The vibration isolator of claim 1 including a plurality of first systems and a plurality of second systems that are coupled together.

28. An isolation system including the vibration isolator of claim 1.

29. An exposure apparatus including a first assembly, a second assembly, and the vibration isolator of claim 1 securing the first assembly to the second assembly.

30. A device comprising a substrate having an image that was formed by the exposure apparatus of claim 29.

31. A wafer having an image that was formed by the exposure apparatus of claim 29.

32. A vibration isolator for isolating a first assembly from vibration from a second assembly, the vibration isolator comprising:

a first system that supports at least a portion of the first assembly relative to the second assembly; and

a second system that is coupled to the first system, the second system being functionally different from the first system.

33. The vibration isolator of claim 32 wherein the second system adjusts for a change in the location of a center of gravity of the first assembly.

34. The vibration isolator of claim 32 wherein the second system compensates for fluctuations in the atmospheric pressure near the second system.

35. The vibration isolator of claim 32 wherein the first system includes a first cylinder and a first piston that moves within the first cylinder, the first piston cooperating with the first cylinder to define a first chamber, wherein the first chamber is maintained at a pressure that is less than the pressure outside the first chamber.

36. The vibration isolator of claim 32 wherein the first system includes a first cylinder and a first piston that moves within the first cylinder, the first piston cooperating with the first cylinder to define a first chamber, wherein the first chamber is maintained at a pressure that is less than the atmospheric pressure.

37. The vibration isolator of claim 36 wherein the second system includes a second cylinder and a second piston that moves within the second cylinder, the second piston cooperating with the second cylinder to define a second chamber, wherein the second chamber is maintained at a pressure that is greater than the atmospheric pressure.

38. The vibration isolator of claim 36 wherein the second system includes a mass controller that changes the mass that is supported by the first system.

39. The vibration isolator of claim 36 wherein the second system includes a mover that adjusts the position of the first assembly to the second assembly.

40. The vibration isolator of claim 36 further comprising a third system that includes a third cylinder and a third piston coupled to the first piston, the third piston moving within the third cylinder and cooperating with the third cylinder to define a third chamber, wherein the third chamber is maintained at a pressure that is less than the atmospheric pressure.

41. The vibration isolator of claim 32 wherein the second system includes a mass controller that changes the mass of that is coupled to the first system.

42. The vibration isolator of claim 32 wherein the second system includes a mover.

43. The vibration isolator of claim 32 wherein the first system includes a first cylinder and a first piston that moves within the first cylinder, the first piston cooperating with the first cylinder to define a first chamber and wherein the second system includes a second cylinder and a second piston that moves relative to the second cylinder, the second piston cooperating with the second cylinder to define a second chamber.

44. The vibration isolator of claim 43 wherein the first chamber is maintained at a first chamber pressure that is less than the atmospheric pressure and the second chamber is maintained at a second chamber pressure that is greater than the atmospheric pressure.

45. The vibration isolator of claim 43 further comprising a third system that includes a third cylinder and a third piston coupled to the first piston, the third piston moving within the third cylinder and cooperating with the third cylinder to define a third chamber, wherein the third chamber is maintained at a pressure that is less than the atmospheric pressure.

46. The vibration isolator of claim 43 wherein the first chamber is maintained at a first chamber pressure that is less than a second chamber pressure in the second chamber.

47. The vibration isolator of claim 43 further comprising a first connector that couples the first piston to the second piston so that the first piston and the second piston move concurrently.

48. The vibration isolator of claim 47 wherein one of the pistons is positioned directly above the other piston.

49. The vibration isolator of claim 32 wherein the first system includes a magnet section and a spaced apart magnetically permeable section.

50. The vibration isolator of claim 49 wherein the second system includes a second cylinder and a second piston that moves relative to the second cylinder, the second piston cooperating with the second cylinder to define a second chamber.

51. The vibration isolator of claim 50 wherein the second chamber is maintained at a second chamber pressure that is greater than atmospheric pressure.

52. The vibration isolator of claim 32 wherein the first system includes a first magnet section and a spaced apart second magnet section.

53. The vibration isolator of claim 52 wherein the second system is a fluid type actuator.

54. The vibration isolator of claim 32 wherein one of the systems is positioned directly above the other system.

55. The vibration isolator of claim 32 wherein one of the systems is stacked directly on top of the other system.

56. The vibration isolator of claim 32 wherein at least a portion of one of the systems pivots relative to the other system to allow for lateral movement of the first assembly relative to the second assembly.

57. The vibration isolator of claim 56 including a plurality of first systems and a plurality of second systems that are coupled together.

58. The vibration isolator of claim 32 including a plurality of first systems and a plurality of second systems that are coupled together.

59. An isolation system including the vibration isolator of claim 32.

60. An exposure apparatus including a first assembly, a second assembly, and the vibration isolator of claim 32 securing the first assembly to the second assembly.

61. A device comprising a substrate having an image that was formed by the exposure apparatus of claim 60.

62. A wafer having an image that was formed by the exposure apparatus of claim 60.

63. A vibration isolator for isolating a first assembly from vibration from a second assembly, the vibration isolator comprising:

a first system that supports at least a portion of the first assembly relative to the second assembly, the first system including a first cylinder and a first piston that moves within the first cylinder, the first piston cooperating with the first cylinder to define a first chamber, wherein the first chamber is maintained at a pressure that is less than the atmospheric pressure; and

a third system that includes a third cylinder and a third piston that is coupled to the first piston, the third piston moving within the third cylinder and cooperating with the third cylinder to define a third chamber, wherein the third chamber is maintained at a pressure that is less than the atmospheric pressure.

64. The vibration isolator of claim 63 further comprising a second system that adjusts for a change in the location of a center of gravity of the first assembly, the second system being coupled to the first system.

65. The vibration isolator of claim 64 wherein the second system compensates for fluctuations in the atmospheric pressure near the second system.

66. The vibration isolator of claim 64 wherein the second system includes a second cylinder and a second piston that moves within the second cylinder, the second piston cooperating with the second cylinder to define a second chamber, wherein the second chamber is maintained at a pressure that is greater than the atmospheric pressure.

67. The vibration isolator of claim 64 wherein at least a portion of one of the systems pivots relative to the other system to allow for lateral movement of the first assembly relative to the second assembly.

68. The vibration isolator of claim 64 wherein the second system includes a mass controller that changes the mass that is supported by the first system.

69. The vibration isolator of claim 64 wherein the second system includes a mover that adjusts the position of the first piston.

70. The vibration isolator of claim 64 further comprising a connector that couples the first piston and to the second piston so that the first piston and the second piston move concurrently.

71. The vibration isolator of claim 63 wherein one of the pistons is positioned directly above the other piston.

72. An isolation system including the vibration isolator of claim 63.

73. An exposure apparatus including a first assembly, a second assembly, and the vibration isolator of claim 63 securing the first assembly to the second assembly.

74. A device comprising a substrate having an image that was formed by the exposure apparatus of claim 73.

75. A wafer having an image that was formed by the exposure apparatus of claim 73.

76. A method for making a vibration isolator for isolating a first assembly from vibration from a second assembly, the method comprising the steps of:

supporting the first assembly relative to the second assembly with a first system; and

coupling a second system to the first system, the second system adjusting for a change in the location of a center of gravity of the first assembly.

77. The method of claim 76 further comprising the step of compensating for fluctuations in the atmospheric pressure near the second system with the second system.

78. The method of claim 76 wherein the step of supporting the first assembly includes the step of providing a first system that includes a first cylinder and a first piston that moves within the first cylinder, the first piston cooperating with the first cylinder to define a first chamber, wherein the first chamber is maintained at a pressure that is less than the atmospheric, pressure.

79. The method of claim 78 wherein the step of coupling a second system includes the step of providing a second cylinder and a second piston that moves within the second cylinder, the second piston cooperating with the second cylinder to define a second chamber, wherein the second chamber is maintained at a pressure that is greater than the atmospheric pressure.

80. The method of claim 78 wherein the step of coupling a second system includes the step of providing a second system that includes a mass controller that changes the mass that is supported by the first system.

81. The method of claim 78 wherein the step of coupling a second system includes the step of providing a second system that includes a mover that adjusts the position of the first assembly relative to the second assembly.

82. The method of claim 76 further comprising the step of coupling a third system to the first system, the third system including a third cylinder and a third piston coupled to the first piston, the third piston moving within the third cylinder and cooperating with the third cylinder to define a third chamber, wherein the third chamber is maintained at a pressure that is less than the atmospheric pressure.

83. The method of claim 76 wherein the step of supporting the first assembly includes the step of providing a first system that includes a first cylinder and a first piston that moves within the first cylinder, the first piston cooperating with the first cylinder to define a first chamber and wherein the step of coupling a second system includes the step of providing a second system that includes a second cylinder and a second piston that moves relative to the second cylinder, the second piston cooperating with the second cylinder to define a second chamber.

84. The method of claim 83 further comprising the step of maintaining the first chamber at a first chamber pressure that is less than the atmospheric pressure and the step of maintaining the second chamber at a second chamber pressure that is greater than atmospheric pressure.

85. The method of claim 84 further comprising the step of coupling a third system to the first system, the third system including a third cylinder and a third piston coupled to the first piston, the third piston moving within the third cylinder and cooperating with the third cylinder to define a third chamber, wherein the third chamber is maintained at a pressure that is less than the atmospheric pressure.

86. The method of claim 83 further comprising the step of coupling the first piston and to the second piston so that the first piston and the second piston move concurrently.

87. The method of claim 86 further comprising the step of positioning one of the pistons directly above the other piston.

88. The method of claim 76 wherein the step of coupling a second system includes the step of providing a second cylinder and a second piston that moves within the second cylinder, the second piston cooperating with the second cylinder to define a second chamber, wherein the second chamber is maintained at a pressure that is greater than the atmospheric pressure.

89. The method of claim 76 wherein the step of coupling the second system includes the step of providing a second system that includes a mass controller that changes the mass that is supported by the first system.

90. The method of claim 76 wherein the step of coupling the second system includes the step of providing a second system that includes a mover that adjusts the position of the first assembly to the second assembly.

91. The method of claim 78 wherein the step of supporting the first assembly includes the step of providing a first system that includes a magnet section and a magnetically permeable section that is attracted to the magnet section.

92. The method of claim 91 wherein the step of coupling the second system includes the steps of providing a fluid type actuator.

93. The method of claim 76 wherein the step of supporting the first assembly includes the steps of providing a first magnetic section and a second magnetic section that is repulsed by the first magnetic section.

94. A method for making an isolation system including the step of providing a vibration isolator made in accordance with claim 76.

95. A method for providing an exposure apparatus including the step of providing a first assembly, providing a second assembly, and securing the first assembly to the second assembly with a vibration isolator made by the method of claim 76.

96. A method of making a wafer utilizing the exposure apparatus made by the method of claim 95.

97. A method of making a device including at least an exposure process, wherein the exposure process utilizes the exposure apparatus made by the method of claim 95.

98. A method for making a vibration isolator for isolating a first assembly from vibration from a second assembly, the method comprising the steps of:

supporting the first assembly relative to the second assembly with a first system and a second system that are coupled together, wherein the first system is functionally different from the second system.

99. The method of claim 98 further comprising the step of compensating for fluctuations in the atmospheric pressure near the second system with the second system.

100. The method of claim 98 wherein the step of supporting the first assembly includes the step of providing a first system that includes a first cylinder and a first piston that moves within the first cylinder, the first piston cooperating with the first cylinder to define a first chamber, wherein the first chamber is maintained at a pressure that is less than the atmospheric pressure.

101. The method of claim 100 wherein the step of supporting the first assembly includes the step of providing a second system that includes a second cylinder and a second piston that moves within the second cylinder, the second piston cooperating with the second cylinder to define a second chamber, wherein the second chamber is maintained at a pressure that is greater than the atmospheric pressure.

102. The method of claim 100 wherein the step of supporting the first assembly includes the step of providing a second system that includes a mass controller that changes the mass that is supported by the first system.

103. The method of claim 100 wherein the step of supporting the first assembly includes the step of providing a second system that includes a mover that adjusts the position of the first assembly.

104. The method of claim 100 further comprising the step of coupling a third system to the first system, the third system including a third cylinder and a third piston coupled to the first piston, the third piston moving within the third cylinder and cooperating with the third cylinder to define a third chamber, wherein the third chamber is maintained at a pressure that is less than the atmospheric pressure.

105. The method of claim 100 wherein the step of supporting the first assembly includes the step of providing a first system that includes the steps of providing a magnet section and providing a magnetically permeable section that is attracted to the magnet section.

106. A method for making an isolation system including the step of providing a vibration isolator made in accordance with claim 98.

107. A method for providing an exposure apparatus including the step of providing a first assembly, providing a second assembly, and securing the first assembly to the second assembly with a vibration isolator made by the method of claim 98.

108. A method of making a wafer utilizing the exposure apparatus made by the method of claim 107.

109. A method of making a device including at least an exposure process, wherein the exposure process utilizes the exposure apparatus made by the method of claim 107.