Method and device for monitoring worker's exposure pattern at workplace

• US 20040002160A1
• Filed: 06/26/2002
• Published: 01/01/2004
• Est. Priority Date: 06/26/2002
• Status: Abandoned Application

• Current Assignee: Institute of Occupational Safety & Health Council of Labor Affairs
• Original Assignee: Institute of Occupational Safety & Health Council of Labor Affairs
• Inventors: Shih, Tung-Sheng, Wang, Peng-Yau
• Application Number:
  US10/179,252
• Publication Number:
  US 20040002160A1
• Time in Patent Office: Days
• US Class Current: 436/57
• CPC Class Codes: G01N 1/2202 involving separation of sample components during sampling
• CPC Class Codes: G01N 2001/2223 aerosol sampling devices
• CPC Class Codes: G01N 33/0027 concerning the detector
• CPC Class Codes: Y10T 436/25875 Gaseous sample or with change of physical state

Abstract

A device is used to monitor a worker'"'"'s exposure to a hazardous gas in a workplace. The device includes an infrared locating member, a chemical sensor, a controller, and a power source. The infrared locating member is used to monitor the worker'"'"'s exposure position. The chemical sensor is uses to monitor the worker'"'"'s exposure concentration. The controller serves as a central processing unit to receive an exposure position signal from the infrared locating member, and an exposure concentration signal from the chemical sensor. The controller is provided with a built-in or externally-connected timer.

Claims

1. A device for monitoring a worker'"'"'s exposure pattern in a workplace, said device comprising:

an infrared locating member capable of decoding and receiving infrared rays emitted by one or more infrared rays transmitting members which are located at one or more specified locations in the workplace whereby said infrared locating member serves as a sensor for monitoring an exposure position;

a chemical sensor for monitoring an exposure concentration of a hazardous gas existing in the workplace at the exposure position of the worker; and

a controller connected to said infrared locating member and said chemical sensor for receiving an exposure position signal from said infrared locating member and an exposure concentration signal from said chemical sensor;

wherein said controller is provided with a built-in timer or an external timer connected thereto, said controller os further provided with a built-in data storage unit or an external data storage unit connected thereto.

2. The device as defined in claim 1, wherein said controller is capable of timing and storing data.

3. The device as defined in claim 2, wherein said controller comprises a microprocessor.

4. The device as defined in claim 3, wherein said controller further comprises an analog-digital converter for receiving an analog signal transmitted by said infrared locating member and/or by said chemical sensor.

5. The device as defined in claim 1, wherein said data storage unit of said controller is ROM.

6. The device as defined in claim 1 further comprising a power source connected with said infrared locating member, said chemical sensor, and said controller.

7. A method for monitoring a worker'"'"'s exposure pattern in a workplace comprising continuously measuring a worker'"'"'s exposure position and an exposure concentration in connection with a hazardous gas existing in the workplace at the worker'"'"'s exposure position, wherein said exposure position is monitored by an infrared locating member capable of decoding and receiving infrared rays emitted by one or more infrared rays emitting members which are located at one or more specified locations of the workplace, and said exposure concentration is monitored by a chemical sensor, wherein said infrared locating member and said. chemical sensor are carried by said worker.

8. A method for monitoring a worker'"'"'s exposure pattern in a workplace comprising continuously measuring a worker'"'"'s exposure position by using an infrared locating member capable of decoding and receiving infrared rays emitted by one of more infrared rays emitting members which are located at one or more specified locations of the workplace, and obtaining an exposure concentration in connection with a hazardous gas existing in the workplace at the worker'"'"'s exposure position by using premeasured exposure concentrations of said hazardous gas at various worker'"'"'s exposure positions.