Chemical reactor templates: sacrificial layer fabrication and template use

• US 20040005258A1
• Filed: 12/12/2002
• Published: 01/08/2004
• Est. Priority Date: 12/12/2001
• Status: Abandoned Application

• Current Assignee: Penn State Research Foundation
• Original Assignee: Penn State Research Foundation
• Inventors: Gu, Bin, Peng, Chih-Yi, Chang, Kyuhwan, Sen, Ayusmen, Kim, Seong H., Fonash, Stephen J., Nam, Wook Jun, Foley, Henry C.
• Application Number:
  US10/317,153
• Publication Number:
  US 20040005258A1
• Time in Patent Office: Days
• US Class Current: 422/271
• CPC Class Codes: B01J 19/0093 Microreactors, e.g. miniaturised or microfabricated reactors laboratory containers with capillary fluid transport in microfabricated channels or chambers B01L3/5027
• CPC Class Codes: B01J 2219/00783 Laminate assemblies, i.e. the reactor comprising a stack of plates
• CPC Class Codes: B01J 2219/00788 Three-dimensional assemblies, i.e. the reactor comprising a form other than a stack of plates
• CPC Class Codes: B01J 2219/00828 Silicon wafers or plates
• CPC Class Codes: B01J 2219/00835 Comprising catalytically active material
• CPC Class Codes: B01J 2219/00853 Employing electrode arrangements
• CPC Class Codes: B01J 2219/0086 Dimensions of the flow channels
• CPC Class Codes: B01J 2219/00862 Dimensions of the reaction cavity itself
• CPC Class Codes: B01J 2219/00864 Channel sizes in the nanometer range, e.g. nanoreactors
• CPC Class Codes: B01J 2219/00873 Heat exchange
• CPC Class Codes: B01J 2219/00889 Mixing micromixers B01F33/30
• CPC Class Codes: B01J 2219/00891 Feeding or evacuation
• CPC Class Codes: B01J 2219/00936 UV-radiations
• CPC Class Codes: B82Y 10/00 Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
• CPC Class Codes: B82Y 30/00 Nanotechnology for materials or surface science, e.g. nanocomposites
• CPC Class Codes: B82Y 40/00 Manufacture or treatment of nanostructures
• CPC Class Codes: C01B 32/15 Nano-sized carbon materials
• CPC Class Codes: C23C 16/01 on temporary substrates, e.g. substrates subsequently removed by etching
• CPC Class Codes: C23C 16/045 Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
• CPC Class Codes: C30B 29/605 Products containing multiple oriented crystallites, e.g. columnar crystallites
• CPC Class Codes: C30B 7/00 : Single-crystal growth from solutions using solvents which are liquid at normal temperature, e.g. aqueous solutions from molten solvents C30B9/00; by normal or gradient freezing C30B11/00; under a protective fluid C30B27/00
• CPC Class Codes: D01D 5/00 : Formation of filaments, threads, or the like
• CPC Class Codes: D01F 9/1275 : Acetylene
• CPC Class Codes: D01F 9/21 : from macromolecular compounds obtained by reactions only involving carbon-to-carbon unsaturated bonds
• CPC Class Codes: H01L 21/76838 : characterised by the formation and the after-treatment of the conductors etching for patterning the conductors H01L21/3213
• CPC Class Codes: H01L 2221/1094 : Conducting structures comprising nanotubes or nanowires
• CPC Class Codes: H01L 29/66439 : with a one- or zero-dimensional channel, e.g. quantum wire FET, in-plane gate transistor [IPG], single electron transistor [SET], striped channel transistor, Coulomb blockade transistor with an active layer made of a group 13/15 material H01L29/66469
• CPC Class Codes: H10K 10/466 : Lateral bottom-gate IGFETs comprising only a single gate
• CPC Class Codes: H10K 10/701 : Organic molecular electronic devices
• CPC Class Codes: H10K 85/221 : Carbon nanotubes
• CPC Class Codes: H10K 85/615 : Polycyclic condensed aromatic hydrocarbons, e.g. anthracene

Abstract

The invention relates to chemical reactor templates having channel-like voids parallel to the template'"'"'s major axis. The channel-like voids may have either micro-scale or nano-scale cross sectional areas. The chemical reactor templates may be used to produce micro- and nano-scale filaments and particles which have a variety of uses. In some embodiments a chemical reactor template of the invention have at least two intersecting channel-like voids substantially parallel to the major axis of said template. The invention also relates to methods for manufacturing a chemical reactor template using sacrificial layers. The chemical reactor templates of the invention may be fabricated to have multiple arrays of channel-like structures as well as vertical elements to provide access to act as contacts for the channel-like voids and materials formed within the template. The invention relates to methods for producing filaments and particles using a chemical reactor template. The filaments or particles are formed within the channel-like void to produce a filament within the channel-like void and may be extruded from the chemical reactor template. Using the chemical reactor templates one can fabricate a wide variety of devices having at least one contact region between a first and second material system over a substrate. Another aspect of the invention is the filaments made using a chemical reactor template of the invention. Accordingly the invention relates to an oriented filament has a nano- or micro-scale cross-sectional area and is prepared within a channel having a nano- or micro-scale cross-section.

Claims

1. A chemical reactor template having at least two intersecting channel-like voids substantially parallel to the major axis of said template.

2. The chemical reactor template of claim 1, wherein the channel-like voids are micro-scale voids, nano-scale voids, or a combination thereof.

3. The chemical reactor template of claim 2, wherein at least two channel-like voids intersect to form a T-intersection, a Y-intersection, an X-intersection, or a +-intersection.

4. The chemical reactor template of claim 3, wherein the channel-like voids form a +-intersection wherein at least one channel-like void is a micro-scale void and at least one channel-like void is a nano-scale void.

5. The chemical reactor of claim 4, wherein the micro-scale channel-like void is opposite the nano-scale channel-like void.

6. The chemical reactor template of claim 5, wherein the micro-scale channel-like void contains a removable member which forms a check valve at the +-intersection.

7. The chemical reactor template of claim 6, wherein the removable member is a sphere, a rod, a pyramid, a triangle or a cone.

8. The chemical reactor template of claim 6, wherein the removable member comprises a catalyst material for a chemical reaction.

9. The chemical reactor template of claim 3, wherein the intersection defines a chemical reaction zone.

10. The chemical reactor template of claim 9, wherein a catalyst is present at the intersection.

17. The chemical reactor template of claim 1, 11, or 14 wherein at least one channel contains beads within at least a portion of one channel.

18. The chemical reactor template of claim 17, wherein the beads form a bead bed reactor within the channel.

11. A chemical reactor template having at least one nano-scale channel-like void substantially parallel to the major axis of said template.

12. The chemical reactor template of claim 11 having at least two nano-scale intersecting channel-like voids substantially parallel to the major axis of said template.

13. The chemical reactor template of claim 12, wherein at least two channel-like voids intersect to form a T-intersection, a Y-intersection, an X-intersection, or a +-intersection.

14. A chemical reactor template having at least one micro-scale channel-like void substantially parallel to the major axis of said template.

15. The chemical reactor template of claim 14 having at least two micro-scale intersecting channel-like voids substantially parallel to the major axis of said template.

16. The chemical reactor template of claim 15, wherein at least two channel-like voids intersect to form a T-intersection, a Y-intersection, an X-intersection, or a +-intersection.

19. A method for manufacturing a chemical reactor template comprising the steps of:

applying a sacrificial layer in a predetermined pattern on a substrate;

applying a capping layer such that the sacrificial layer is disposed between the capping layer and said substrate forming a chemical reactor template; and

removing said sacrificial layer to a create a channel-like void within the chemical reactor substrate, the channel-like void being substantially parallel to the substrate.

20. The method according to claim 19, wherein removing the sacrificial layer comprises etching, dissolving, gasifying, sublimating, or decomposing the sacrificial layer.

21. The method of claim 19, wherein the sacrificial layer comprises a void-rich material, a void-free material, a self-assembled molecule material, or beads.

22. The method of claim 21, wherein the sacrificial layer is a void-free material and the channel-like void has a nano-scale cross section.

23. The method of claim 19, further comprising, prior to applying the sacrificial layer, the step of applying a functional material to a region of the substrate, and wherein the sacrificial layer overlies at least a portion of the functional material.

24. The method of claim 19, further comprising, prior to applying the capping layer, the step of applying a functional material to a region of the substrate such that at least a portion of the functional material overlies the sacrificial material.

25. The method of claim 23 or 24, wherein the functional material is a catalyst, a catalyst precursor, or an electrical contact.

26. The method of claim 25, wherein the functional material is a catalyst precursor, further comprising, after removing the sacrificial layer, the step of converting the catalyst precursor to an active catalyst.

27. A method for manufacturing a chemical reactor template comprising the steps of:

a. applying a first sacrificial layer in a predetermined pattern on a substrate;

b. applying a first capping layer such that the first sacrificial layer is disposed between the capping layer and said substrate;

c. applying a subsequent sacrificial layer in a predetermined pattern on the previously applied capping layer;

d. applying a subsequent capping layer such that the subsequent sacrificial layer is disposed between the subsequent capping layer and the previously applied capping layer;

e. optionally repeating steps (c) and (d).

f. removing the first and subsequent sacrificial layers to create channel-like voids within the chemical reactor template, the channel-like voids being substantially parallel to the substrate.

28. The method of claim 27, wherein the first sacrificial layer is removed prior to applying the subsequent sacrificial layer.

29. The method of claim 27, wherein the first and subsequent sacrificial layers are removed in separate steps.

30. The method of claim 27, wherein the predetermined pattern used to apply the subsequent sacrificial layer is substantially the same as the predetermined pattern used to applying the first sacrificial layer.

31. The method of claim 27, further comprising the step of creating at least one via to vertically connect the channel-like voids.

32. The method of claim 31, wherein said via comprises an access hole or an interconnect.

33. A method for producing a filament using a chemical reactor template comprising the steps of:

introducing at least one monomer into a chemical reactor template having at least one channel-like void substantially parallel to the major axis of the template, and

polymerizing said monomer within the channel-like void to produce a filament within the channel-like void.

34. The method of claim 33, wherein the monomer is acetylene.

35. The method of claim 33, wherein the polymerization step is an electrochemical-assisted polymerization.

36. The method of claim 33, wherein the channel-like voids are micro-scale voids, nano-scale voids, or a combination thereof.

37. A method for producing a semiconductor, dielectric, metal or semi-metal filament using a chemical reactor template comprising the steps of:

introducing at least one precursor of a semiconductor, dielectric, metal or semi-metal into a chemical reactor template having at least one channel-like void substantially parallel to the major axis of the template, and

reacting the precursor within the channel-like void to produce a semiconductor, dielectric, metal or semi-metal filament within the channel-like void.

38. The method of claim 37, wherein the precursor is acetylene monomer.

39. The method of claim 37, wherein the reaction step comprises polymerizing the precursor.

40. The method of claim 39, wherein the reaction step is an electrochemical-assisted polymerization.

41. The method of claim 37, wherein the channel-like voids are micro-scale voids, nano-scale voids, or a combination thereof.

42. A method for producing a filament using a chemical reactor template comprising the steps of:

introducing at least one monomer into a chemical reactor template having at least one channel-like void substantially parallel to the major axis of the template, and

polymerizing said monomer within the channel-like void to extrude a filament from the channel-like void.

43. The method of claim 42, wherein the channel-like voids are micro-scale voids, nano-scale voids, or a combination thereof.

44. A method for producing a filament using a chemical reactor template comprising the steps of:

introducing at least one monomer into a chemical reactor template having at least one channel-like void substantially parallel to the major axis of the template,

polymerizing said monomer within the channel-like void to produce a filament within the channel-like void, and

extruding the filament from the chemical reactor template.

45. The method of claim 44, where the filament is extruded using an electric field, a chemical reaction or an electrochemical reaction.

46. A method for producing a filament using a chemical reactor template comprising the steps of:

introducing at least one monomer into a chemical reactor template having at least one channel-like void substantially parallel to the major axis of the template,

polymerizing said monomer within the channel-like void to produce a filament within the channel-like void, and

removing a portion of the chemical reactor template to expose at least a portion of the filament within the channel-like void.

47. The method of claim 46, wherein the monomer is acetylene.

48. The method of claim 46, wherein the channel-like voids are micro-scale voids, nano-scale voids, or a combination thereof.

49. A method for producing at least one contact region between a first and second material system over a substrate comprising the steps of:

forming a first material system on a first region of the substrate;

forming a second material system on a second region of the substrate;

applying a sacrificial layer in a predetermined pattern on the substrate such that a portion of the sacrificial layer overlies at least a portion of the first material system and at least a portion of the second material system;

applying a capping layer such that the sacrificial layer is disposed between the capping layer and said substrate forming a chemical reactor template;

removing a sacrificial layer to a create a channel-like void within the chemical reactor template, the channel-like void being substantially parallel to the substrate;

introducing at least one monomer into said channel-like void; and

polymerizing said monomer within the channel-like void to produce a conductive or semi-conductive filament within the channel-like void, wherein said filament is in contact with the first and second material systems.

50. The method of claim 49, wherein the monomer is acetylene and the filament is polyacetylene.

51. The method of claim 49, further comprising, during or after the polymerizing step, the step of doping the conductive or semi-conductive filament.

52. The method of claim 49, wherein the production of at least one contact region between a first and a second material system provides for fabrication of a structure selected from the group consisting of a MEMS device, cantilever structure, micro-switch structure, micro-mirror structure, actuator, field-emission structure, bolometric structure, accelerometer, biomedical or medical device, sorting and affixing structure, and an electrical, chemical or electrochemical sensor.

65. A devise selected from the group consisting of a MEMS device, cantilever structure, micro-switch structure, micro-mirror structure, actuator, field-emission structure, bolometric structure, accelerometer, biomedical or medical device, sorting and affixing structure, and an electrical, chemical or electrochemical sensor prepared according to claim 49.

53. A method for producing a particle using a chemical reactor template comprising the steps of:

introducing at least one monomer into a chemical reactor template having at least one channel-like void substantially parallel to the major axis of the template, and

polymerizing said monomer within the channel-like void to form a particle within the channel-like void.

54. The method of claim 53, wherein the channel-like voids are micro-scale voids, nano-scale voids, or a combination thereof.

55. An oriented polymer filament having a nano-scale cross-sectional area prepared by polymerizing a monomer or comonomer within a channel having a nano-scale cross-section.

56. The oriented polymer filament of claim 55, wherein the polymerizing step comprises free radical polymerization, condensation polymerization, photo-initiated polymerization, or electrochemical-assisted polymerization.

57. The oriented polymer filament of claim 55, wherein the polymer is polyacetylene prepared by polymerizing acetylene monomers.

58. An oriented polymer filament having a micro-scale cross-sectional area prepared by polymerizing a monomer or comonomer within a channel having a nano-scale cross-section.

59. The oriented polymer filament of claim 58, wherein the polymerizing step comprises free radical polymerization, condensation polymerization, photo-initiated polymerization, or electrochemical assisted polymerization.

60. The oriented polymer filament of claim 58, wherein the polymer is polyacetylene prepared by polymerizing acetylene monomers.

61. An oriented filament having a nano-scale cross-sectional area prepared by polymerizing a monomer or comonomers with a channel having a nano-scale cross-section to form a polymer and decomposing the polymer within the channel to form a filament.

62. The oriented filament of claim 61, wherein the filament is a carbon nanotube.

63. A method for producing a filament using a chemical reactor template comprising the steps of:

introducing at least one monomer into a chemical reactor template having at least two channel-like voids substantially parallel to the major axis of the template, and

polymerizing said monomer within the channel-like voids to extrude a filament from the channel-like void to form a weave.

64. A method for producing a filament using a chemical reactor template comprising the steps of:

introducing at least one monomer into a chemical reactor template having at least two channel-like voids substantially parallel to the major axis of the template,

polymerizing said monomer within the channel-like voids to produce a filament within the channel-like void, and

extruding the filament from the chemical reactor template to form a weave.