Antireflection film and antireflection layer-affixed plastic substrate

• US 20040005482A1
• Filed: 07/21/2003
• Published: 01/08/2004
• Est. Priority Date: 04/17/2001
• Status: Abandoned Application

• Current Assignee: Sony Corporation (Sony Group Corp.)
• Original Assignee: Sony Corporation (Sony Group Corp.)
• Inventors: Ishizaki, Haruo, Watanabe, Shujiro, Watanabe, Takashi, Lee, Sung-Kil, Kagawa, Masaki, Kobayashi, Tomio
• Application Number:
  US10/311,290
• Publication Number:
  US 20040005482A1
• Time in Patent Office: Days
• US Class Current: 428/702
• CPC Class Codes: G02B 1/115 Multilayers
• CPC Class Codes: G02B 1/116 including electrically conducting layers
• CPC Class Codes: Y10T 428/31507 Of polycarbonate

Abstract

A colorless antireflection film excellent in productivity and high in transparency, and an antireflection layer-affixed plastic substrate. An antireflection film and an antireflection layer-affixed plastic substrate having moisture-proofing and gas-barrier properties and being excellent in optical characteristics. An antireflection film comprising a hard coat layer formed on a substrate, and a transparent, high-refractive-index oxide layer and a transparent, low-refractive-index oxide layer alternately laminated on the hard coat layer. The transparent, high-refractive-index oxide layer is compose of a Nb₂O₅ layer formed by a reactive sputtering method. An antireflection film using a substrate consisting of an organic material, wherein an inorganic, moisture-proofing layer having a refractive index approximate to that of the organic material is formed in contact with one surface of the substrate.

Claims

1. An anti-reflection film comprising a hard-coat layer formed on a substrate, and laminated layers of transparent, high index of refraction oxide layers and transparent, low index of refraction oxide layers laminated on top of each other on the hard-coat layer, characterized in that at least one of the transparent, high index of refraction oxide layers comprises an Nb₂O₅ layer formed by a reaction sputtering method.

2. The anti-reflection film of claim 1 characterized in that an oxide layer comprising at least one material ZrO_x (where x=1-2), TiO_x (where x=1-2), SiO_x (where x=1-2), SiO_xN_y (where x=1-2, y=0.2-0.6) and CrO_x (where x=0.2-1.5) is deposited by the reactive sputtering method on top of the hard-coat layer.

3. The anti-reflection film of claim 1 characterized in that at least one of the other transparent, high index of refraction oxide layers comprises at least one type of metallic oxide film selected from In₂O₃ and SnO₂, as well as a film comprising Nb₂O₅.

4. The anti-reflection film of claim 1 characterized in that at least one of the other transparent, high index of refraction oxide layers contains as a main component a metallic oxide material of at least one selected from In₂O₃ and SnO₂ and includes an oxide film that contains oxide components of at least one element selected from a group of Si, Mg, Al, Zn, Ti, and Nb having equivalent concentration levels of greater than or equal to 5 mol % and less than or equal to 40 mol % in a form of SiO₂, MgO, Al₂O₃, ZnO, TiO₂, and Nb₂O₅.

5. The anti-reflection film of claim 4 characterized in that said oxide film contains said oxide components having equivalent concentration level of greater than or equal to 10 mol % and less than or equal to 30 mol % in a form of SiO₂, MgO, Al₂O₃, ZnO, TiO₂, and Nb₂O₅.

6. The anti-reflection film of claim 1 characterized in that, out of the transparent, high index of refraction oxide layers, at least one layer, except for the Nb₂O₅ layer, is formed by a layer selected from a group of Ta₂O₅, TiO₂, ZrO₂, ThO₂, Si₃N₄, and Y₂O₃.

7. A plastic substrate with an anti-reflection layer comprising an anti-reflection layer which is formed by depositing one after another transparent, high index of refraction oxide layers and transparent, low index of refraction oxide layers on top of each other on a plastic substrate or on a plastic substrate with a hard-coat layer formed on a surface thereof, characterized in that at least one of the transparent, high index of refraction oxide layers comprises an Nb₂O₅ layer formed by a reactive sputtering method.

8. An anti-reflection film comprising an anti-reflection layer comprising transparent, high index of refraction oxide layers and transparent, low index of refraction oxide layers laminated on top of each other on a substrate comprising an organic material, and an inorganic moisture barrier layer, having an index of refraction close to the organic material, is formed in contact with at least one side of the substrate.

9. The anti-reflection film of claim 8 characterized in that said inorganic moisture barrier layer is formed between said substrate and said anti-reflection layer.

10. The anti-reflection film of claim 8 characterized in that a hard-coat layer is formed on said substrate, and said anti-reflection film is formed on top thereof.

11. The anti-reflection film of claim 8 characterized in that said substrate comprising said organic material has a structure in which a layer for changing surface quality is formed by a wet coating method on a surface of a base film comprising an organic material.

12. (Amended) The anti-reflection film of claim 8 characterized in that said inorganic moisture barrier layer has as a main component at least one selected from a group of SiO₂, SiO_x (where x=1-2), SiO_xN_y (where x=0-2, y=1.33-0), Si₃N₄, Si_xN_y (where x=1-1.33), Al₂O₃, Al_xO_y (where x=0-1.0, y=0-1.5), and AlO_xN_y (where x=0-1.5, y=0-1).

13. The anti-reflection film of claim 8 characterized in that said inorganic moisture barrier layer has an index of refraction of 1.4-2.1.

14. The anti-reflection film of claim 8 characterized in that at least one of the transparent, high index of refraction oxide layers in the anti-reflection layer comprises an Nb₂O₅ layer formed by a reactive sputtering method.

15. A plastic substrate with an anti-reflection layer comprising an anti-reflection layer formed by laminating on top of each other transparent, high index of refraction oxide layers and transparent, low index of refraction oxide layers on a plastic substrate or on a plastic substrate having a hard-coat layer formed on a surface thereof, characterized in that an inorganic layer, having an index of refraction similar to the plastic substrate, is formed in contact with at least one side of the plastic substrate.

16. The plastic substrate with the anti-reflection layer of claim 15 characterized in that at least one of the transparent, high index of refraction oxide layers in said anti-reflection layer comprises an Nb₂O₅ layer formed by a reactive sputtering method.