Low pressure vapor phase deposition of organic thin films
First Claim
Patent Images
1. An apparatus for the physical vapor deposition of a film comprising an organic small molecule material on a substrate, said apparatus comprising:
- (a) a deposition chamber;
(b) at least one flow path in fluid communication with said deposition chamber, said flow path comprising;
(i) a carrier gas source, (ii) an organic small molecule material source, and (iii) a flow controller;
(c) a substrate holder disposed within said deposition chamber; and
(d) a vacuum pump in fluid communication with said deposition chamber and adapted to provide a pressure ranging from 0.001 torr to 100 torr within said deposition chamber;
wherein the deposition chamber has walls that may be heated to a temperature sufficiently high to avoid recondensation of volatilized organic precursor, without decomposing the volatilized organic precursor.
0 Assignments
0 Petitions
Accused Products
Abstract
Methods for preparing organic thin films on substrates, the method comprising the steps of providing a plurality of organic precursors in the vapor phase, and reacting the plurality or organic precursors at a sub-atmospheric pressure. Also included are thin films made by such a method and apparatuses used to conduct such a method. The method is well-suited to the formation of organic light emitting devices and other display-related technologies.
-
Citations
14 Claims
-
1. An apparatus for the physical vapor deposition of a film comprising an organic small molecule material on a substrate, said apparatus comprising:
-
(a) a deposition chamber;
(b) at least one flow path in fluid communication with said deposition chamber, said flow path comprising;
(i) a carrier gas source, (ii) an organic small molecule material source, and (iii) a flow controller;
(c) a substrate holder disposed within said deposition chamber; and
(d) a vacuum pump in fluid communication with said deposition chamber and adapted to provide a pressure ranging from 0.001 torr to 100 torr within said deposition chamber;
wherein the deposition chamber has walls that may be heated to a temperature sufficiently high to avoid recondensation of volatilized organic precursor, without decomposing the volatilized organic precursor. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
-
-
14. An apparatus for physical vapor deposition of a film comprising an organic small molecule material on a substrate, said apparatus comprising:
-
a deposition chamber;
means for heating said deposition chamber;
means for introducing vapors of organic small molecule materials into said deposition chamber;
means for cooling a substrate within said deposition chamber; and
means for maintaining the pressure in said reaction chamber at a pressure ranging from 0.001 torr to 100 torr;
means for heating the deposition chamber walls to a temperature sufficiently high to avoid recondensation of vapors of the organic small molecule materials, without decomposing the organic small molecule materials.
-
Specification