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Low pressure vapor phase deposition of organic thin films

  • US 20040007178A1
  • Filed: 05/02/2003
  • Published: 01/15/2004
  • Est. Priority Date: 11/17/1997
  • Status: Abandoned Application
First Claim
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1. An apparatus for the physical vapor deposition of a film comprising an organic small molecule material on a substrate, said apparatus comprising:

  • (a) a deposition chamber;

    (b) at least one flow path in fluid communication with said deposition chamber, said flow path comprising;

    (i) a carrier gas source, (ii) an organic small molecule material source, and (iii) a flow controller;

    (c) a substrate holder disposed within said deposition chamber; and

    (d) a vacuum pump in fluid communication with said deposition chamber and adapted to provide a pressure ranging from 0.001 torr to 100 torr within said deposition chamber;

    wherein the deposition chamber has walls that may be heated to a temperature sufficiently high to avoid recondensation of volatilized organic precursor, without decomposing the volatilized organic precursor.

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