Method and system of determining chamber seasoning condition by optical emission
First Claim
1. A plasma processing system comprising:
- a plasma reactor;
a light detection device coupled to said plasma reactor to receive light emitted from a plasma formed within said plasma reactor; and
a controller coupled to said light detection device, said controller configured to measure a signal related to the received light detected by the light detection device and to correlate a change between the measured signal and a target signal corresponding to a seasoning state of said plasma reactor.
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Abstract
A plasma processing system that comprises a process chamber, a plasma source, a light detection device and a controller. The controller is useful for determining a seasoning state of the plasma processing system. The present invention further provides a method of determining the seasoning state of a plasma processing system comprising the steps of forming a first plasma in the process chamber utilizing the plasma source; measuring a first signal related to light emitted from the first plasma using the light detection device and storing the first signal using the controller; forming a second plasma in the process chamber utilizing the plasma source; measuring a second signal related to light emitted from the second plasma using the light detection device and storing the second signal using the controller; and correlating a change between the first signal and the second signal with a seasoning state of the plasma processing system.
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Citations
44 Claims
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1. A plasma processing system comprising:
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a plasma reactor;
a light detection device coupled to said plasma reactor to receive light emitted from a plasma formed within said plasma reactor; and
a controller coupled to said light detection device, said controller configured to measure a signal related to the received light detected by the light detection device and to correlate a change between the measured signal and a target signal corresponding to a seasoning state of said plasma reactor. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method of determining a seasoning state of a plasma processing system, wherein said plasma processing system comprises a process chamber, a plasma source, a light detection device and a controller, said method comprises:
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forming a first plasma in said process chamber utilizing said plasma source;
measuring a first signal related to light emitted from said first plasma using said light detection device and storing said first signal;
forming a second plasma in said process chamber utilizing said plasma source;
measuring a second signal related to light emitted from said second plasma using said light detection device and storing said second signal using said controller; and
correlating a change between said first signal and said second signal with a seasoning state of said plasma processing system. - View Dependent Claims (16, 17, 18, 19, 20)
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21. A method of determining a seasoning state of a plasma processing system, wherein said plasma processing system comprises a process chamber, a plasma source, a light detection device and a controller, said method comprises:
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forming a plasma in said process chamber utilizing said plasma source;
measuring a first signal related to light emitted from said plasma using said light detection device and storing said first signal;
measuring a second signal related to light emitted from said plasma using said light detection device and storing said second signal using said controller; and
correlating a change between said first signal and said second signal with a seasoning state of said plasma processing system.
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22. A method of determining a seasoning state of a plasma processing system, wherein said plasma processing system comprises a process chamber, a plasma source, a light detection device and a controller, said method comprises:
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loading a substrate into said plasma processing system;
forming a plasma to facilitate processing of said substrate;
measuring a signal related to light emitted from said plasma;
comparing the measured signal with a target signal determined for said plasma processing system; and
determining a seasoning state of said plasma processing system from a result of said comparing of the measured signal with said target signal. - View Dependent Claims (23, 24, 25, 26, 27, 28, 29, 30)
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31. A method of determining a seasoning state of a plasma processing system, wherein said plasma processing system comprises a process chamber, a plasma source, a light detection device and a controller, said method comprises:
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loading a first substrate into said plasma processing system;
forming a first plasma to facilitate processing of said first substrate;
measuring a first signal related to light emitted from said first plasma and storing said first signal using said controller;
unloading said first substrate;
loading a second substrate into said plasma processing system;
forming a second plasma to facilitate processing of said second substrate;
measuring a second signal related to light emitted from said second plasma and storing said second signal using said controller;
determining a difference signal from said second signal and said first signal;
comparing said difference signal with a target signal; and
determining a seasoning state of said plasma processing system from said comparing of said difference signal with said target signal. - View Dependent Claims (32, 33, 34, 35, 36, 37, 38, 39)
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40. A detection system comprising:
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a light detection device configured to be coupled to a plasma processing system to receive light emitted from a plasma; and
a controller coupled to said light detection device, said controller configured to measure a signal related to the received light and to correlate a change between said signal and a target signal with a seasoning state of said plasma processing system.
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41. A method for constructing a seasoning model for a plasma processing system, said method comprises:
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measuring a plurality of optical signals;
determining a first set of said plurality of optical signals corresponding to an unseasoned plasma processing system;
forming a second set of said plurality of optical signals by discarding said first set of said plurality of optical signals; and
performing principal components analysis on said second set of said plurality of said optical signals, wherein an output of said principal components analysis comprises said seasoning model. - View Dependent Claims (42, 43, 44)
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Specification