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Methods and apparatus for vacuum thin film deposition

  • US 20040011288A1
  • Filed: 02/25/2003
  • Published: 01/22/2004
  • Est. Priority Date: 02/26/2002
  • Status: Active Grant
First Claim
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1. A method of forming a polymer coating on a surface of a substrate in a vacuum chamber evacuated to a pressure of less than about 10

  • 2 Torr, wherein the method comprises;

    (a) heating a liquid monomer to form a vapor at a temperature below that at which thermal polymerization is initiated, wherein the monomer has two or more olefinic groups per molecule, and a vapor pressure in the range of 10

    6
    to 10

    1
    Torr at standard temperature and pressure;

    (b) allowing the vapor to flow to the surface of the substrate, the surface at a temperature below the temperature of the liquid monomer or vapor;

    (c) condensing the vapor on the surface of the substrate to deposit a monomer layer on the surface of the substrate; and

    (d) polymerizing the monomer layer formed in step (c) to form the polymer coating on the surface of the substrate.

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