×

System and method for resetting a reaction mass assembly of a stage assembly

  • US 20040012768A1
  • Filed: 06/11/2003
  • Published: 01/22/2004
  • Est. Priority Date: 11/16/2000
  • Status: Active Grant
First Claim
Patent Images

1. An exposure apparatus for transferring a pattern by irradiation of an exposure beam while moving an object along a moving plane, the exposure apparatus comprising:

  • a stage to hold the object;

    a driver to drive the stage along the moving plane, at least part of the driver is connected to the stage;

    a plurality of counter stagestages that movesmove in a direction opposite from a moving direction of the stage in response to by a reaction force caused by the movement of the stage; and

    a plurality of correction devicedevices to correct a position of the plurality of counter stagestages when the exposure beam is not applied to the object, at least part of the plurality of correction device is devices are connected to the plurality of counter stagestages.

View all claims
  • 1 Assignment
Timeline View
Assignment View
    ×
    ×