System and method for resetting a reaction mass assembly of a stage assembly
First Claim
1. An exposure apparatus for transferring a pattern by irradiation of an exposure beam while moving an object along a moving plane, the exposure apparatus comprising:
- a stage to hold the object;
a driver to drive the stage along the moving plane, at least part of the driver is connected to the stage;
a plurality of counter stagestages that movesmove in a direction opposite from a moving direction of the stage in response to by a reaction force caused by the movement of the stage; and
a plurality of correction devicedevices to correct a position of the plurality of counter stagestages when the exposure beam is not applied to the object, at least part of the plurality of correction device is devices are connected to the plurality of counter stagestages.
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Accused Products
Abstract
A stage assembly for moving and positioning a device is provided herein. The stage assembly includes a stage base, a stage, a stage mover assembly, a reaction mass assembly, a reaction mover assembly, and a control system. The stage mover assembly moves the stage relative to the stage base. The reaction mass assembly reduces the reaction forces created by the stage mover assembly that are transferred to the stage base. The reaction mover assembly adjusts the position of the reaction mass assembly relative to the stage base. Uniquely, the control system controls and directs current to the reaction mover assembly in a way that minimizes the influence of disturbances created by the reaction mover assembly on the stage assembly. More specifically, the timing and/or the amount of current from the control system directed to the reaction mover assembly is varied to minimize the influence of the disturbances created by the reaction mover assembly on the stage assembly. With this design, the reaction mover assembly has less influence upon the position of the stage base. This allows for more accurate positioning of the device by the stage assembly and better performance of the stage assembly.
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Citations
36 Claims
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1. An exposure apparatus for transferring a pattern by irradiation of an exposure beam while moving an object along a moving plane, the exposure apparatus comprising:
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a stage to hold the object;
a driver to drive the stage along the moving plane, at least part of the driver is connected to the stage;
a plurality of counter stagestages that movesmove in a direction opposite from a moving direction of the stage in response to by a reaction force caused by the movement of the stage; and
a plurality of correction devicedevices to correct a position of the plurality of counter stagestages when the exposure beam is not applied to the object, at least part of the plurality of correction device is devices are connected to the plurality of counter stagestages. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 31, 32)
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14. An exposure apparatus for transferring a pattern by irradiation of an exposure beam while moving an object along a moving plane, the exposure apparatus comprising:
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a stage to hold the object;
a first driver to drive the stage along the moving plane, at least part of the first driver is connected to the stage;
a plurality of counter stagestages that movesmove in a direction opposite from a moving direction of the stage in response to by a reaction force caused by the movement of the stage by the first driver; and
a plurality of second driverdrivers to correct a position of the plurality of counter stagestages by driving the plurality of counter stagestages in the moving direction when the exposure beam is not applied to the object, at least part of the plurality of second driver isdrivers are connected to the plurality of counter stagestages. - View Dependent Claims (15, 16, 17, 18, 19, 20, 21, 22)
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23. An exposure method for transferring a pattern by irradiation of an exposure beam while moving an object held on a stage along a moving plane, the exposure method comprising the steps of:
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driving the stage along the moving plane;
moving a countermassplurality of countermasses in a direction opposite to a moving direction of the stage in response to by a reaction force caused by the movement of the stage; and
correcting a position of the countermassplurality of countermasses with a plurality of actuators while the exposure beam is not applied to the object. - View Dependent Claims (24, 25, 26, 27, 28, 29, 30)
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33. An exposure apparatus that exposes a pattern by irradiation of an exposure beam comprising:
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a first stage to hold a first object;
a second stage to hold a second object;
a first driver to drive the first stage along a first moving plane, at least part of the first driver is connected to the first stage;
a second driver to drive the second stage along the first moving plane, at least part of the second driver is connected to the second stage;
a counter stage that is moved by a reaction force caused by the movement of at least one of the first and second stages; and
a correction device to correct a position of the counter stage when the exposure beam is not applied to the first and second objects, at least part of the correction device is connected to the counter stage. - View Dependent Claims (34, 35, 36)
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Specification