System and method for resetting a reaction mass assembly of a stage assembly

• US 20040012768A1
• Filed: 06/11/2003
• Published: 01/22/2004
• Est. Priority Date: 11/16/2000
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Tanaka, Keiichi, Hazelton, Andrew J., Binnard, Mike
• Granted Patent: US 6,885,430 B2
• Time in Patent Office: Days
• US Class Current: 355/72
• CPC Class Codes: G03B 27/62 Holders for the original G03B27/53 takes precedence ; for electrophotographic copiers G03G15/60
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/70708 being electrostatic; Electrostatically deformable vacuum chucks
• CPC Class Codes: G03F 7/70766 Reaction force control means, e.g. countermass
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

A stage assembly for moving and positioning a device is provided herein. The stage assembly includes a stage base, a stage, a stage mover assembly, a reaction mass assembly, a reaction mover assembly, and a control system. The stage mover assembly moves the stage relative to the stage base. The reaction mass assembly reduces the reaction forces created by the stage mover assembly that are transferred to the stage base. The reaction mover assembly adjusts the position of the reaction mass assembly relative to the stage base. Uniquely, the control system controls and directs current to the reaction mover assembly in a way that minimizes the influence of disturbances created by the reaction mover assembly on the stage assembly. More specifically, the timing and/or the amount of current from the control system directed to the reaction mover assembly is varied to minimize the influence of the disturbances created by the reaction mover assembly on the stage assembly. With this design, the reaction mover assembly has less influence upon the position of the stage base. This allows for more accurate positioning of the device by the stage assembly and better performance of the stage assembly.

Claims

1. An exposure apparatus for transferring a pattern by irradiation of an exposure beam while moving an object along a moving plane, the exposure apparatus comprising:

a stage to hold the object;

a driver to drive the stage along the moving plane, at least part of the driver is connected to the stage;

a plurality of counter stagestages that movesmove in a direction opposite from a moving direction of the stage in response to by a reaction force caused by the movement of the stage; and

a plurality of correction devicedevices to correct a position of the plurality of counter stagestages when the exposure beam is not applied to the object, at least part of the plurality of correction device is devices are connected to the plurality of counter stagestages.

2. An exposure apparatus according to claim 1, wherein the object is a substrate onto which the pattern is transferred, and the stage is a substrate stage.

3. An exposure apparatus according to claim 2, further comprising a plurality of the substrate stages.

4. An exposure apparatus according to claim 1, wherein the driver comprises:

a moving member connected to the stage; and

a pair of stationary membermembers cooperating with the moving member.

5. An exposure apparatus according to claim 4, wherein the plurality of counter stage comprisesstages hold the pair of stationary membermembers.

6. An exposure apparatus according to claim 4, wherein a point of action of a driving force acting on the moving member, a center of gravity of the moving member, and a center of gravity of the pair of stationary membermembers are identical to each other in position in a direction of the normal to the moving plane.

7. An exposure apparatus according to claim 1, wherein the driver comprises:

a first driver to drive the stage in a first direction; and

a second driver to drive the stage in a second direction orthogonal to the first direction.

8. An exposure apparatus according to claim 7, wherein the object is a substrate onto which the pattern is transferred, the substrate has a plurality of exposure areas arranged in a matrix, onto each of which the pattern is transferred, and the correction device corrects the position of the plurality of counter stagestages between completion of exposure of an n-th row (n is a natural number) extending in the second direction and a start of exposure of an (n+1)-th row.

9. An exposure apparatus according to claim 1, wherein the object is a mask with the pattern formed thereon, and the stage is a mask stage.

10. An exposure apparatus according to claim 9, wherein the mask stage comprises a holder to hold a plurality of the masks.

11. An exposure apparatus according to claim 1, wherein the plurality of correction devicedevices includes at least one linear motor.

12. An exposure apparatus according to claim 11, wherein each of the at least one linear motors includes a movable member attached to the plurality of counter stagestages, and a stationary member attached to a base.

13. An exposure apparatus according to claim 12, wherein the movable member and the stationary member interact with each other electromagnetically.

31. An exposure apparatus according to claim 1, wherein the plurality of counter stages comprise a first countermass and a second countermass, the stage being located between the first countermass and the second countermass.

32. An exposure apparatus according to claim 3, wherein the plurality of counter stages move in response to movement of the plurality of substrate stages.

14. An exposure apparatus for transferring a pattern by irradiation of an exposure beam while moving an object along a moving plane, the exposure apparatus comprising:

a stage to hold the object;

a first driver to drive the stage along the moving plane, at least part of the first driver is connected to the stage;

a plurality of counter stagestages that movesmove in a direction opposite from a moving direction of the stage in response to by a reaction force caused by the movement of the stage by the first driver; and

a plurality of second driverdrivers to correct a position of the plurality of counter stagestages by driving the plurality of counter stagestages in the moving direction when the exposure beam is not applied to the object, at least part of the plurality of second driver isdrivers are connected to the plurality of counter stagestages.

15. An exposure apparatus according to claim 14, wherein the object is a substrate onto which the pattern is transferred, and the stage is a substrate stage.

16. An exposure apparatus according to claim 15, further comprising a plurality of the substrate stages.

17. An exposure apparatus according to claim 14, wherein the first driver comprises:

a moving member connected to the stage; and

a pair of stationary membermembers cooperating with the moving member.

18. An exposure apparatus according to claim 17, wherein the plurality of counter stage comprisesstages hold the pair of stationary membermembers.

19. An exposure apparatus according to claim 17, wherein a point of action of a driving force acting on the moving member, a center of gravity of the moving member, and a center of gravity of the pair of stationary membermembers are identical to each other in position in a direction of the normal to the moving plane.

20. An exposure apparatus according to claim 14, wherein the object is a mask with the pattern formed thereon, and the stage is a mask stage.

21. An exposure apparatus according to claim 20, wherein the mask stage comprises a holder to hold a plurality of the masks.

22. An exposure apparatus according to claim 14, wherein the plurality of second driverdrivers includes at least one linear motor.

23. An exposure method for transferring a pattern by irradiation of an exposure beam while moving an object held on a stage along a moving plane, the exposure method comprising the steps of:

driving the stage along the moving plane;

moving a countermassplurality of countermasses in a direction opposite to a moving direction of the stage in response to by a reaction force caused by the movement of the stage; and

correcting a position of the countermassplurality of countermasses with a plurality of actuators while the exposure beam is not applied to the object.

24. An exposure method according to claim 23, wherein the object is a substrate onto which the pattern is transferred.

25. An exposure method according to claim 23, wherein the stage is driven by a driver including a moving member connected to the stage and a pair of stationary membermembers cooperating with the moving member.

26. An exposure method according to claim 25, wherein the countermassplurality of countermasses hold is the pair of stationary membermembers.

27. An exposure method according to claim 25, wherein a point of action of a driving force acting on the moving member, a center of gravity of the moving member, and a center of gravity of the pair of stationary membermembers are identical to each other in position in a direction of the normal to the moving plane.

28. An exposure method according to claim 23, wherein the stage is movable in a first direction and in a second direction orthogonal to the first direction.

29. An exposure method according to claim 28, wherein the object is a substrate onto which the pattern is transferred, the substrate has a plurality of exposure areas arranged in a matrix, onto each of which the pattern is transferred, and the position of the countermass isplurality of countermasses are corrected between completion of exposure of an n-th row (n is a natural number) extending in the second direction and a start of exposure of an (n+1)-th row.

30. An exposure method according to claim 23, wherein the object is a mask with the pattern formed thereon.

33. An exposure apparatus that exposes a pattern by irradiation of an exposure beam comprising:

a first stage to hold a first object;

a second stage to hold a second object;

a first driver to drive the first stage along a first moving plane, at least part of the first driver is connected to the first stage;

a second driver to drive the second stage along the first moving plane, at least part of the second driver is connected to the second stage;

a counter stage that is moved by a reaction force caused by the movement of at least one of the first and second stages; and

a correction device to correct a position of the counter stage when the exposure beam is not applied to the first and second objects, at least part of the correction device is connected to the counter stage.

34. An exposure apparatus according to claim 33, wherein the counter stage comprises a first countermass and a second countermass, the first and second stages being located between the first countermass and the second countermass.

35. An exposure apparatus according to claim 33, wherein the correction device comprises a linear motor.

36. An exposure apparatus according to claim 33, wherein the counter stage moves along a second moving plane that is different from the first moving plane.