Remote monitoring system for chemical liquid delivery

• US 20040015331A1
• Filed: 04/10/2003
• Published: 01/22/2004
• Est. Priority Date: 04/12/2002
• Status: Abandoned Application

• Current Assignee: Arch Specialty Chemicals, Inc.
• Original Assignee: Arch Specialty Chemicals, Inc.
• Inventors: Blatt, Chris, Wolfe, Dan, Van Cleemput, Marc, Teff, Daniel Joseph, Nayfah, Mustafa
• Application Number:
  US10/410,628
• Publication Number:
  US 20040015331A1
• Time in Patent Office: Days
• US Class Current: 702/188
• CPC Class Codes: C23C 16/448 characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
• CPC Class Codes: C23C 16/52 Controlling or regulating the coating process C23C16/45557, C23C16/279 take precedence
• CPC Class Codes: H01L 21/67253 Process monitoring, e.g. flow or thickness monitoring

Abstract

A system and method for remote monitoring one or more liquid chemical delivery systems and/or tools associated with the fabrication and/or manufacturing of electronic/semiconductor components. Such a system and method allows the operator to quickly and accurately verify the status of each delivery system and tool with respect to liquid condition, alarms, problem situations, and other indications from one convenient location.

Claims

1. A system for monitoring chemical delivery to at least one processing tool, the system comprising:

an interface;

at least one chemical delivery system in communication with said interface; and

at least one tool connected to said chemical delivery system.

2. The system of claim 1, wherein said system is a remote monitoring system.

3. The system of claim 1, wherein said at least one processing tool is at least one semiconductor processing tool.

4. The system of claim 1, further comprising a central processing unit connected to said interface.

5. The system of claim 4, wherein said central processing unit communicates with said interface by at least one cable.

6. The system of claim 4, wherein said central processing unit communicates with said interface via wireless communications.

7. The system of claim 1, further comprising at least one sensor for monitoring at least one parameter of said at least one chemical delivery system.

8. The system of claim 7, wherein said parameter is at least one selected from the group consisting of:

volume, pressure, exhaust, door status, spill, leakage, and temperature.

9. The system of claim 7, wherein said at least one sensor communicates a signal to said interface.

10. The system of claim 1, wherein said chemical delivery system comprises at least one container, which is capable of storing chemical.

11. The system of claim 1, further comprising at least one tool sensor in communication with said interface.

12. The system of claim 11, wherein said at least one tool sensor is capable of monitoring at least one tool parameter.

13. The system of claim 12, wherein said tool parameter is at least one selected from the group consisting of:

pressure, temperature, spills, leaks, volume, and flow rate.

14. The system of claim 4, wherein said central processing unit is located in a clean room.

15. A method for monitoring the chemical delivery to a tool, the method comprising the steps of:

sensing the status of at least one parameter of a chemical delivery system and/or at least one parameter of said tool;

communicating said status to a computer; and

analyzing said status to determine whether the parameters of said chemical delivery system and/or said tool are within a predetermined range.

16. The method of claim 15, wherein said status of said chemical delivery system and/or said tool is monitored with at least one sensor in communication with said computer.

17. The method of claim 15, wherein said computer is located remote to said tool.

18. The method of claim 15, wherein said tool is at least one semiconductor processing tool.

19. The method of claim 15, wherein said computer is located in a clean room.

20. The method of claim 15, wherein said parameter of said chemical delivery system is at least one selected from the group consisting of:

volume, pressure, exhaust, door status, spill, leakage, and temperature.

21. The method of claim 15, wherein said parameter of said tool is at least one selected from the group consisting of:

pressure, temperature, spills, leaks, volume, and flow rate.

22. The method of claim 15, wherein said status is communicated to said computer through an interface.

23. The method of claim 22, wherein said interface is in communication with at least one sensor on said chemical delivery system and/or said tool by a connecting means selected from the group consisting of:

cables, wireless means, and a combination thereof.