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Apparatus and a method for forming an alloy layer over a substrate

  • US 20040016403A1
  • Filed: 07/28/2003
  • Published: 01/29/2004
  • Est. Priority Date: 12/29/2000
  • Status: Active Grant
First Claim
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1. A system comprising:

  • a chamber configured to house a substrate for processing;

    an energy source coupled to the chamber;

    a system controller configured to control the introduction of at least two metal constituents to a focused ion beam and to control the introduction of the focused ion beam; and

    a memory coupled to the controller comprising a computer-readable medium having a computer-readable program embodied therein for directing operation of the system, the computer-readable program comprising;

    instructions for controlling the energy source and for introducing the metal constituents by one of;

    (1) mixing the at least two metal constituents and introducing the at least two metal constituents into a chamber in which a focused ion beam contacts the at least two metal constituents to form a first alloy layer over a substrate;

    (2) introducing at about the same time at least two precursor gas sources in which each precursor gas source contains a respective one of the at least two metal constituents and the focused ion beam contacts the at least two precursor gases to form a first alloy layer over a substrate, and (3) forming a first layer of a first of the at least two metal constituents and a second layer of a second of the at least two metal constituents to create a multi-metal layer and performing one of thermal treatment and introducing focused ion beam to at least a portion of the multi-metal layer to form a first alloy layer over a substrate.

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