Microwave plasma processing apparatus, microwave processing method and microwave feeding apparatus
First Claim
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1. A microwave plasma processing apparatus for applying plasma processing to a substrate, characterized by:
- a processing vessel accommodating therein a stage for supporting said substrate;
a microwave generator;
a waveguide connected to said microwave generator, said waveguide guiding a microwave generated by said microwave generator; and
a microwave emitting member emitting said microwave into a space in said processing vessel after wavelength compression by a retardation plate, said waveguide has a single microwave outlet opening in a location corresponding to a center of said microwave emitting member.
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Abstract
A microwave plasma processing apparatus includes a processing vessel, a microwave generator, a waveguide guiding a microwave formed by the microwave generator, and a microwave emitting member emitting the microwave with wavelength compression by a retardation plate, wherein the waveguide has a single microwave output opening in a location corresponding to a central par of the microwave emitting member.
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Citations
31 Claims
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1. A microwave plasma processing apparatus for applying plasma processing to a substrate, characterized by:
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a processing vessel accommodating therein a stage for supporting said substrate;
a microwave generator;
a waveguide connected to said microwave generator, said waveguide guiding a microwave generated by said microwave generator; and
a microwave emitting member emitting said microwave into a space in said processing vessel after wavelength compression by a retardation plate, said waveguide has a single microwave outlet opening in a location corresponding to a center of said microwave emitting member. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13)
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14. A plasma processing method for applying plasma processing on a substrate, characterized by the steps of:
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placing a substrate on a stage in a processing vessel;
generating a microwave by a microwave generator;
guiding said microwave generated by said microwave generator by a waveguide connected to said microwave generator;
outputting said microwave supplied from said waveguide connected to said microwave generator, via a single microwave outlet opening;
emitting said microwave outputted from said waveguide connected to said microwave generator into a space in said processing vessel by a microwave emitting member; and
applying a plasma processing on said substrate by forming plasma by said emitted microwave. - View Dependent Claims (15, 16, 17, 18)
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19. A microwave feeding apparatus for feeding a microwave into a processing chamber, characterized by:
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a waveguide connected to a microwave generator, said waveguide guiding a microwave generated by said microwave generator, said waveguide having a microwave outlet opening for outputting said microwave; and
a microwave emitting member causing to propagate said microwave supplied at a central part thereof in a direction perpendicular to a direction in which said microwave is supplied, said microwave emitting member further introducing said microwave into said processing chamber via a plurality of slots. - View Dependent Claims (20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30, 31)
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Specification