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Microwave plasma processing apparatus, microwave processing method and microwave feeding apparatus

  • US 20040026039A1
  • Filed: 06/11/2003
  • Published: 02/12/2004
  • Est. Priority Date: 10/19/2001
  • Status: Active Grant
First Claim
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1. A microwave plasma processing apparatus for applying plasma processing to a substrate, characterized by:

  • a processing vessel accommodating therein a stage for supporting said substrate;

    a microwave generator;

    a waveguide connected to said microwave generator, said waveguide guiding a microwave generated by said microwave generator; and

    a microwave emitting member emitting said microwave into a space in said processing vessel after wavelength compression by a retardation plate, said waveguide has a single microwave outlet opening in a location corresponding to a center of said microwave emitting member.

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