Waferless metrology recipe generator and generating method
First Claim
1. A waferless metrology recipe generator for creating a metrology recipe used to implement SEM-based dimensional metrology that evaluates a pattern transferred onto a wafer according to CAD data, the recipe generator comprising:
- alignment-specifying means for specifying alignment in CAD based on the CAD data;
coordinate-specifying means for specifying coordinates of positions on the wafer where metrology should be performed;
metrology type-specifying means for specifying a metrology type for each specified coordinate; and
recipe creation means for creating the metrology recipe in response, to the alignment specifying means, coordinate specifying means, and metrology type-specifying means.
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Abstract
A metrology recipe generator is offered which is capable of automatically creating a metrology recipe without halting the operation of the production line. The metrology recipe is used to carry out SEM-based dimensional metrology for evaluating patterns transferred onto wafers according to CAD data. The generator has a CAD alignment-specifying portion for specifying alignment in CAD according to CAD data and a CAD metrology position-specifying portion for specifying both the coordinates of positions on the wafers on which metrology measurements are made and a metrology type. The metrology recipe is created according to data from the CAD alignment-specifying portion and from the CAD metrology position-specifying portion.
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Citations
2 Claims
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1. A waferless metrology recipe generator for creating a metrology recipe used to implement SEM-based dimensional metrology that evaluates a pattern transferred onto a wafer according to CAD data, the recipe generator comprising:
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alignment-specifying means for specifying alignment in CAD based on the CAD data;
coordinate-specifying means for specifying coordinates of positions on the wafer where metrology should be performed;
metrology type-specifying means for specifying a metrology type for each specified coordinate; and
recipe creation means for creating the metrology recipe in response, to the alignment specifying means, coordinate specifying means, and metrology type-specifying means.
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2. A waferless metrology recipe generating method for creating a metrology recipe used to implement SEM-based dimensional metrology that evaluates a pattern transferred onto a wafer according to CAD data, the recipe generating method comprising the steps of:
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specifying alignment in CAD based on the CAD data;
specifying coordinates of positions on the wafer where metrology should be performed;
specifying a metrology type for each specified coordinate; and
creating the metrology recipe in response to the specified alignment, specified coordinate, and specified metrology type.
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Specification