Switched uniformity control
First Claim
1. A spatially controlled plasma reactor for processing a substrate, comprising:
- a process chamber within which a plasma is both ignited and sustained for the processing;
a power delivery mechanism comprising, a single power source for generating energy sufficiently strong to ignite and sustain the plasma;
an electrode coupled to the power source, the electrode having a first coil and a second coil, the first coil being arranged to produce an electric field inside a first power region of the process chamber and the second coil being arranged to produce an electric field inside a second power region of the process chamber;
a power distribution switch disposed between the power source and the inner and outer coils of the electrode, the power distribution switch being arranged for directing the energy of the power source between the inner and outer coils; and
a gas delivery mechanism comprising, a single gas source for generating a process gas which is used in part to form the plasma and to process the substrate;
a first gas injection port coupled to the gas source, the first gas injection port being arranged to release the process gas into a first gas region of the process chamber;
a second gas injection port coupled to the gas source, the second gas injection port being arranged to release the process gas into a second gas region of the process chamber; and
a gas distribution switch disposed between the gas source and the inner and outer gas injection ports, the gas distribution switch being arranged for directing the process gas of the gas source between the inner and outer gas injection ports.
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Accused Products
Abstract
A component delivery mechanism for distributing a component inside a process chamber is disclosed. The component is used to process a work piece within the process chamber. The component delivery mechanism includes a plurality of component outputs for outputting the component to a desired region of the process chamber. The component delivery mechanism further includes a spatial distribution switch coupled to the plurality of component outputs. The spatial distribution switch is arranged for directing the component to at least one of the plurality of component outputs. The component delivery mechanism also includes a single component source coupled to the spatial distribution switch. The single component source is arranged for supplying the component to the spatial distribution switch.
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Citations
20 Claims
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1. A spatially controlled plasma reactor for processing a substrate, comprising:
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a process chamber within which a plasma is both ignited and sustained for the processing;
a power delivery mechanism comprising, a single power source for generating energy sufficiently strong to ignite and sustain the plasma;
an electrode coupled to the power source, the electrode having a first coil and a second coil, the first coil being arranged to produce an electric field inside a first power region of the process chamber and the second coil being arranged to produce an electric field inside a second power region of the process chamber;
a power distribution switch disposed between the power source and the inner and outer coils of the electrode, the power distribution switch being arranged for directing the energy of the power source between the inner and outer coils; and
a gas delivery mechanism comprising, a single gas source for generating a process gas which is used in part to form the plasma and to process the substrate;
a first gas injection port coupled to the gas source, the first gas injection port being arranged to release the process gas into a first gas region of the process chamber;
a second gas injection port coupled to the gas source, the second gas injection port being arranged to release the process gas into a second gas region of the process chamber; and
a gas distribution switch disposed between the gas source and the inner and outer gas injection ports, the gas distribution switch being arranged for directing the process gas of the gas source between the inner and outer gas injection ports.
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2. A method for processing a work piece with a component of a process recipe, comprising:
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providing a process chamber within which the work piece is processed, and which includes at least a first processing zone and a second processing zone, each zone representing a portion of the work piece to be processed;
outputting the component into the first processing zone of the process chamber;
switching from the first processing zone to the second processing zone so as to effect the concentration of the component between the first and second processing zones; and
outputting the component into the second processing zone of the process chamber. - View Dependent Claims (3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14)
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15. A method of forming a plasma inside a process chamber, comprising:
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receiving a plasma forming component from a single component source;
alternately distributing the received plasma forming component between two different regions of the process chamber so as to effect the concentration of the plasma forming component in the different regions of the process chamber. - View Dependent Claims (16, 17, 18, 19, 20)
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Specification