Method and system for calibrating a laser processing system and laser marking system utilizing same
First Claim
1. A method of calibrating a laser marking system, the method comprising:
- calibrating a laser marking system in three dimensions, the step of calibrating including storing data corresponding to a plurality of heights;
obtaining a position measurement of a workpiece to be marked; and
associating stored calibration data with the position measurement.
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Accused Products
Abstract
A method of calibrating a laser marking system includes calibrating a laser marking system in three dimensions. The step of calibrating includes storing data corresponding to a plurality of heights. A position measurement of a workpiece is obtained to be marked. Stored calibration data is associated with the position measurement. A method and system for calibrating a laser processing or marking system is provided. The method includes: calibrating a laser marker over a marking field; obtaining a position measurement of a workpiece to be marked; associating stored calibration data with the position measurement; relatively positioning a marking beam and the workpiece based on at least the associated calibration data; and calibrating a laser marking system in at least three degrees of freedom. The step of calibrating includes storing data corresponding to a plurality of positions and controllably and relatively positioning a marking beam based on the stored data corresponding to the plurality of positions.
205 Citations
24 Claims
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1. A method of calibrating a laser marking system, the method comprising:
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calibrating a laser marking system in three dimensions, the step of calibrating including storing data corresponding to a plurality of heights;
obtaining a position measurement of a workpiece to be marked; and
associating stored calibration data with the position measurement. - View Dependent Claims (2, 3, 4, 5, 6)
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7. A system for laser marking of semiconductor wafers having a pattern on a first side of the wafers, and a second side of the wafers to be marked at predetermined locations relative to the pattern and within a marking field substantially smaller than the wafers, the system comprising:
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means for calibrating a marker means of the system; and
means for controllably positioning a marking beam relative to the wafers based on the calibration. - View Dependent Claims (8)
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9. A laser-based wafer marking system for marking a wafer having a topside containing a circuit, the circuit having circuit features, the wafer having a backside to be marked, the system comprising:
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a calibrated galvanometer marking head having a scan lens and a marking field substantially smaller than the wafer;
a calibrated positioning stage for carrying the wafer with a range of motion large enough to position any wafer location to be marked to within the marking field;
a calibrated alignment camera with a field of view substantially smaller than the wafer;
a frame which mounts the stage rigidly with respect to the camera and the marking head; and
a controller having a map for coordinating locations of the marking head, stage, and alignment camera for causing the stage and the marking head to be positioned relative to each other such that the wafer is accurately marked on its backside relative to the circuit features on the front side. - View Dependent Claims (10, 11, 12, 13, 14, 15, 16)
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17. In a laser based marking system for marking semiconductor substrates and the like, the system having a laser marker with a marking field which is substantially smaller than the substrate, a positioning subsystem having an X-Y stage for relatively positioning the marking field and the substrate, and an alignment vision subsystem separate from the marker for locating a feature on a substrate used to relatively position the substrate and marking field based on a location of the feature, a method for calibrating the system comprising:
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measuring a plurality of fiducials disposed on an alignment target with the alignment vision subsystem;
calibrating the alignment vision subsystem based on the measured fiducials, the fiducials having predetermined locations;
positioning the stage relative to the alignment target to calibrate the stage using data recording the movement of the stage and data obtained with the alignment vision subsystem, the calibration of the stage being performed subsequent to the step of calibrating the alignment vision system;
positioning a test substrate to be marked;
marking the substrate at a plurality of locations within the field to obtain marks; and
measuring mark locations with a calibrated optical measurement system to obtain measurements and using the measurements to calibrate the laser marker wherein the system is calibrated. - View Dependent Claims (18, 19, 20, 21, 22, 23, 24)
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Specification