Method for fabricating a transistor configuration including trench transistor cells having a field electrode, trench transistor, and trench configuration
First Claim
Patent Images
1. A method for fabricating a transistor configuration having a trench transistor cell, which comprises:
- introducing a trench into a process layer of a semiconductor substrate;
providing a field electrode and a gate electrode in the trench;
electrically insulating the field electrode and the gate electrode from one another and from the process layer; and
forming a drift zone, a channel zone, and a source zone in the process layer;
at least one of the source zone and the channel zone being formed after the introducing of the trench into the semiconductor substrate.
1 Assignment
0 Petitions
Accused Products
Abstract
A method for fabricating a transistor configuration including at least one trench transistor cell has a gate electrode and a field electrode disposed in a trench below the gate electrode. The trenches are formed in a semiconductor substrate. A drift zone, a channel zone, and a source zone are in each case provided in the semiconductor substrate. According to the invention, the source zone and/or the channel zone are formed at the earliest after the introduction of the trenches into the semiconductor substrate by implantation and diffusion.
182 Citations
28 Claims
-
1. A method for fabricating a transistor configuration having a trench transistor cell, which comprises:
-
introducing a trench into a process layer of a semiconductor substrate;
providing a field electrode and a gate electrode in the trench;
electrically insulating the field electrode and the gate electrode from one another and from the process layer; and
forming a drift zone, a channel zone, and a source zone in the process layer;
at least one of the source zone and the channel zone being formed after the introducing of the trench into the semiconductor substrate. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26)
-
-
27. A trench transistor cell in a substrate, comprising:
-
a semiconductor substrate having a substrate surface and a trench formed therein, said trench having a trench bottom;
a drain zone, a drift zone, a channel zone, and a source zone formed in said semiconductor substrate in each case successively and in essentially horizontally layered fashion;
a body height defined opposite said drift zone and channel zone and in said semiconductor substrate where said drift zone and said channel zone join;
a first dielectric layer having an upper edge and lining said trench as far as essentially said body height;
a gate oxide disposed between said body height and said substrate surface and having a thinnest point;
a field electrode disposed in said trench and extending essentially from said trench bottom as far as said upper edge of said first dielectric layer;
a gate electrode disposed in said trench between about said body height and said substrate surface;
a second oxide layer disposed in said trench between said gate electrode and said field electrode, said second oxide layer, at every point between said field electrode and said gate electrode, being at least as thick as said thinnest point of said gate oxide. - View Dependent Claims (28)
-
Specification