Microelectromechanical sensors having reduced signal bias errors and methods of manufacturing the same

• US 20040035206A1
• Filed: 03/26/2003
• Published: 02/26/2004
• Est. Priority Date: 03/26/2002
• Status: Abandoned Application

• Current Assignee: Christopher M. Lento, Jeffrey T. Borenstein, Paul A. Ward
• Original Assignee: Christopher M. Lento, Jeffrey T. Borenstein, Paul A. Ward
• Inventors: Lento, Christopher M., Borenstein, Jeffrey T., Ward, Paul A.
• Application Number:
  US10/397,577
• Publication Number:
  US 20040035206A1
• Time in Patent Office: Days
• US Class Current: 73/514.32
• CPC Class Codes: B81C 1/00357 involving bonding one or several substrates on a non-temporary support, e.g. another substrate
• CPC Class Codes: B81C 2201/019 Bonding or gluing multiple substrate layers
• CPC Class Codes: G01C 19/5719 using planar vibrating masses driven in a translation vibration along an axis
• CPC Class Codes: G01D 3/028 mitigating undesired influences, e.g. temperature, pressure
• CPC Class Codes: G01P 15/0802 Details
• CPC Class Codes: G01P 15/125 by capacitive pick-up
• CPC Class Codes: G01P 2015/0831 the mass being of the paddle type having the pivot axis between the longitudinal ends of the mass, e.g. see-saw configuration

Abstract

A capacitive sensor such as a tuning-fork gyroscope or accelerometer having a reduced bias error. The electrical connection of the first capacitive plate to, e.g., a signal measuring device or a voltage source, induces a first voltage difference at the junction. The materials of the second capacitive plate are selected such that its electrical connection to, e.g., a signal measuring device or a voltage source, induces a second voltage difference that substantially offsets the first voltage difference and reduces the bias error. One embodiment forms the capacitive plates, e.g., a proof mass and a sense plate, from substantially identical doped semiconductors.

Claims

1. A sensor comprising:

a first capacitor plate formed from a first material, electrically connectable to an energy source at a first junction, the first junction giving rise to a potential difference between the first capacitor plate and the energy source, and

a second capacitor plate, spaced from the first capacitor plate by a first sense gap, and being electrically connectable to a signal measuring device at a second junction for providing a signal indicative of changes in a size of the sense gap to the signal measuring device, the second junction giving rise to a potential difference between the second capacitor plate and the signal measuring device; and

the potential difference at the first junction substantially offsetting the potential difference at the second junction.

2. The sensor of claim 1 wherein the first material is a semiconductor and the second material is selected such that the potential difference between the first material and the energy source is substantially offset by the potential difference between the second material and the signal measuring device.

3. The sensor of claim 2 wherein the first material is a semiconductor and the second material is a semiconductor selected such that the potential difference between the first material and the energy source is substantially offset by the potential difference between the second material and the signal measuring device.

4. The sensor of claim 3 wherein the first material is doped at substantially the same level as the second material.

5. The sensor of claim 3 wherein the first material and second material are doped with substantially the same dopant.

6. The sensor of claim 3 wherein the first material and second material have substantially the same crystalline structure.

7. The sensor of claim 3 wherein the first material and the second material are both silicon based.

8. The sensor of claim 1 wherein the first capacitor plate and the second capacitor plate have substantially the same shapes.

9. The sensor of claim 1 wherein the first capacitor plate and the second capacitor plate have substantially the same mass.

10. The sensor of claim 1 wherein the first capacitor plate and the second capacitor plate have substantially the same volume.

11. The sensor of claim 1 wherein the first capacitor plate is a sense plate of a tuning fork gyroscope.

12. The sensor of claim 1 wherein the second capacitor plate is a proof mass of a tuning fork gyroscope.

13. The sensor of claim 1 wherein the first capacitor plate is a sense plate of an accelerometer.

14. The sensor of claim 1 wherein the second capacitor plate is a proof mass of an accelerometer.

15. A method of measuring a parameter of motion comprising the following steps:

providing first capacitor plate formed from a first material, electrically connected to an energy source at a first junction, the first junction giving rise to a potential difference between the first capacitor plate and the energy source

providing a second capacitor plate, spaced from the first capacitor plate by a first sense gap, and being electrically connected to a signal measuring device at a second junction for providing a signal indicative of changes in a size of the sense gap to the signal measuring device, the second junction giving rise to a potential difference between the second capacitor plate and the signal measuring device

providing for the potential difference at the first junction to be substantially equal to the potential difference at the second junction; and

measuring the signal indicative of changes in a size of the sense gap to measure a parameter of motion.

16. A tuning fork gyroscope comprising

at least one sense plate that is made from a first material, is electrically connectable to an energy source at a first junction, the first junction giving rise to a potential difference between the sense plate and the energy source;

at least one proof mass, made from a second material, spaced at a distance from the sense plate by a sense gap, for providing a signal indicative of changes in the size of the sense gap, and electrically connectable to a signal measuring device at a second junction, the second junction giving rise to a contact potential between the proof mass and the signal measuring device;

the potential difference at the first junction substantially offsets the potential difference at the second junction.

17. An accelerometer comprising

an elongated proof mass, made of a first material, supported by a fulcrum in an unbalanced fashion at a distance from at least one sense plate by a sense gap, providing an electrical signal indicative of changes to the size of the sense gap, the proof mass being electrically connectable to a signal measuring device at a first junction, the first junction giving rise to a potential difference between the elongated proof mass and the signal measuring device;

the sense plate, made from a second material, electrically connectable to an energy source at a second junction, the second junction gives rise to a potential difference between the sense plate and the energy source; and

the potential difference at the first junction is substantially offset by the potential difference at the second junction.

18. A sensor comprising:

a first proof mass formed from a first semiconductor material, configured for oscillation in a first drive plane, motion in a direction substantially orthogonal to the first drive plane, and including a first proof mass contact location for electrically connecting to the first proof mass; and

a first sense plate spaced from the first proof mass by a first sense gap, having a first sense plate contact location for electrically connecting to the first sense plate, and formed from a second semiconductor material.

19. The sensor of claim 18, wherein the first and second semiconductor materials have substantially the same doping levels.

20. The sensor of claim 18, wherein the first and second semiconductor materials are doped with substantially the same materials.

21. The sensor of claim 18, wherein the first and second semiconductor materials are the same material.

22. The sensor of claim 18, wherein the first proof mass and the first sense plate have substantially the same shape.

23. The sensor of claim 18, wherein the first proof mass and the first sense plate have substantially the same mass.

24. The sensor of claim 18, wherein the first and second semiconductor materials have substantially the same crystalline structure.

25. The sensor of claim 18, wherein the first and second semiconductor materials have substantially the same work function.

26. The sensor of claim 18, wherein the first and second semiconductor materials are silicon-based.

27. A device for sensing a parameter based at least in part on a change in capacitance of the device and for generating a signal indicative thereof, the device comprising,

a first electrical contact formed from a first material for electrically coupling the device to an energy source via an energy source contact formed from a second material;

a second electrical contact formed from a third material for electrically coupling the device to a signal measuring device via a signal measuring device contact formed from a fourth material,

wherein the first, second, third and fourth materials are selected to reduce contact bias.