×

Positioning system for use in lithographic apparatus

  • US 20040036035A1
  • Filed: 08/27/2003
  • Published: 02/26/2004
  • Est. Priority Date: 12/01/1999
  • Status: Active Grant
First Claim
Patent Images

1. A lithographic projection apparatus for imaging of a mask pattern in a mask onto a substrate provided with a radiation sensitive layer, the apparatus comprising:

  • an illumination system to supply a projection beam of radiation;

    a first object table to hold the mask;

    a second object table to hold the substrate;

    a projection optical system that images irradiated portions of the mask onto target portions of the substrate;

    an object table positioning system constructed and arranged to position at least one of said object tables in a plane, said object table positioning system including;

    first and second side-beams having respective first and second sliders mounted thereon;

    first and second motors that move said first and second sliders substantially longitudinally along each respective side beam;

    a cross-beam mounted proximate first and second ends thereof to said first and second sliders respectively and having a third slider mounted thereto, said cross-beam and said first and second sliders being mounted together;

    a third motor that moves said third slider longitudinally along said cross-beam, said third slider being adapted to support said one object table; and

    , a thrust bearing pivotally mounted to said first slider, said thrust bearing transmitting a force in said plane and substantially perpendicular to said first side beam between said cross-beam and said first side beam.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×