Positioning system for use in lithographic apparatus
First Claim
Patent Images
1. A lithographic projection apparatus for imaging of a mask pattern in a mask onto a substrate provided with a radiation sensitive layer, the apparatus comprising:
- an illumination system to supply a projection beam of radiation;
a first object table to hold the mask;
a second object table to hold the substrate;
a projection optical system that images irradiated portions of the mask onto target portions of the substrate;
an object table positioning system constructed and arranged to position at least one of said object tables in a plane, said object table positioning system including;
first and second side-beams having respective first and second sliders mounted thereon;
first and second motors that move said first and second sliders substantially longitudinally along each respective side beam;
a cross-beam mounted proximate first and second ends thereof to said first and second sliders respectively and having a third slider mounted thereto, said cross-beam and said first and second sliders being mounted together;
a third motor that moves said third slider longitudinally along said cross-beam, said third slider being adapted to support said one object table; and
, a thrust bearing pivotally mounted to said first slider, said thrust bearing transmitting a force in said plane and substantially perpendicular to said first side beam between said cross-beam and said first side beam.
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Abstract
A positioning system, such as may be used to position a moveable object table in three degrees of freedom. More particularly, the invention relates to the use of the positioning system in a lithographic projection apparatus including an illumination system for supplying a projection beam of radiation, a first object table for holding a mask, a second, movable object table for holding a substrate, and a projection system for imaging an irradiated portion of the mask onto a target portion of the substrate.
17 Citations
1 Claim
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1. A lithographic projection apparatus for imaging of a mask pattern in a mask onto a substrate provided with a radiation sensitive layer, the apparatus comprising:
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an illumination system to supply a projection beam of radiation;
a first object table to hold the mask;
a second object table to hold the substrate;
a projection optical system that images irradiated portions of the mask onto target portions of the substrate;
an object table positioning system constructed and arranged to position at least one of said object tables in a plane, said object table positioning system including;
first and second side-beams having respective first and second sliders mounted thereon;
first and second motors that move said first and second sliders substantially longitudinally along each respective side beam;
a cross-beam mounted proximate first and second ends thereof to said first and second sliders respectively and having a third slider mounted thereto, said cross-beam and said first and second sliders being mounted together;
a third motor that moves said third slider longitudinally along said cross-beam, said third slider being adapted to support said one object table; and
,a thrust bearing pivotally mounted to said first slider, said thrust bearing transmitting a force in said plane and substantially perpendicular to said first side beam between said cross-beam and said first side beam.
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Specification