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Apparatus for inspecting wafer surface, method for inspecting wafer surface, apparatus for judging defective wafer, method for judging defective wafer, and apparatus for processing information on wafer surface

  • US 20040036863A1
  • Filed: 08/25/2003
  • Published: 02/26/2004
  • Est. Priority Date: 09/05/2000
  • Status: Active Grant
First Claim
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1. A wafer surface inspection device which detects scratches on a wafer surface on the basis of two-dimensional defect distribution information (an LPD map) for the wafer surface supplied from a particle counter, comprising:

  • input means for inputting the LPD map supplied from the particle counter;

    memory means capable of accumulating the LPD map for each of a plurality of wafers; and

    information processing means for detecting the scratches on the wafer surface by detecting the cluster of LPD in the LPD maps accumulated in the memory means.

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