Method and device for system and/or process monitoring
First Claim
1. Method for system- and/or process monitoring in association with a measurement apparatus that determines at least one process parameter of a medium, characterized in that, the temperatures (T) of the medium (3) are directly or indirectly ascertained and a trend analysis regarding thermal loading of the measurement apparatus (1) or thermal loading of individual components of the measurement apparatus (1) is performed on the basis of the ascertained temperature values (T) of the medium (3) or on the basis of derivatives of the ascertained temperature values T(n/tm with m,n>
- 0) of the medium.
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Accused Products
Abstract
The invention relates to a method and to a device for system- and/or process-monitoring in connection with a measurement apparatus that determines/monitors at least one process parameter of a medium (12).
An object of the invention is to provide a method and a device which enable statements to be made regarding the present and future functionality of a measurement apparatus, or individual components of the measurement apparatus (1).
Regarding the method, the object is solved in the manner that the temperature values (T) of the medium (12) are ascertained directly or indirectly and that a trend analysis regarding the thermal loading of the measurement apparatus (1) or the thermal loading of individual components of the measurement apparatus (1) is carried out on the basis of the ascertained temperature values (T) of the medium (3) or on the basis of the derivatives of the ascertained temperature values of the medium (3).
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Citations
12 Claims
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1. Method for system- and/or process monitoring in association with a measurement apparatus that determines at least one process parameter of a medium, characterized in that,
the temperatures (T) of the medium (3) are directly or indirectly ascertained and a trend analysis regarding thermal loading of the measurement apparatus (1) or thermal loading of individual components of the measurement apparatus (1) is performed on the basis of the ascertained temperature values (T) of the medium (3) or on the basis of derivatives of the ascertained temperature values T(n/tm with m,n> - 0) of the medium.
- View Dependent Claims (10, 11, 12)
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2. Device for system- and/or process monitoring with a measurement apparatus that determines at least one process parameter of a medium, characterized in that,
a unit (10) for direct measurement of the temperature values or the derivatives of the temperature values (Tn/tm with m,n> - 0) is provided or the temperature values or the derivatives of the temperature values (Tn/tm with m,n>
0) are indirectly ascertained, andan evaluation-/control-unit (8) is provided, which performs a trend analysis regarding thermal loading of the measurement apparatus (1) or thermal loading of individual components of the measurement apparatus (1) on the basis of the established temperature values (T) of the medium (3) or on the basis of derivatives of the temperature values (Tn/tm with m,n>
0). - View Dependent Claims (3, 4, 5, 6, 7, 8, 9)
- 0) is provided or the temperature values or the derivatives of the temperature values (Tn/tm with m,n>
Specification