Process for producing integrated circuits
First Claim
1. A process for producing an integrated circuit comprising at least partially reducing a metal oxide layer to an elemental metal with a gaseous organic compound comprising one or more functional groups selected from the group consisting of alcohol (—
- OH), aldehyde (—
CHO) and carboxylic acid (—
COOH).
2 Assignments
0 Petitions
Accused Products
Abstract
This invention concerns a process for producing integrated circuits containing at least one layer of elemental metal which during the processing of the integrated circuit is at least partly in the form of metal oxide, and the use of an organic compound containing certain functional groups for the reduction of a metal oxide layer formed during the production of an integrated circuit. According to the present process the metal oxide layer is at least partly reduced to elemental metal with a reducing agent selected from organic compounds containing one or more of the following functional groups: alcohol (—OH), aldehyde (—CHO), and carboxylic acid (—COOH).
107 Citations
30 Claims
-
1. A process for producing an integrated circuit comprising at least partially reducing a metal oxide layer to an elemental metal with a gaseous organic compound comprising one or more functional groups selected from the group consisting of alcohol (—
- OH), aldehyde (—
CHO) and carboxylic acid (—
COOH). - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10, 11, 12, 13, 14, 15, 16, 17, 18, 19, 20, 21, 22, 23, 24, 25, 26, 27, 28, 29, 30)
- OH), aldehyde (—
Specification