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Semiconductor fabricating apparatus and method and apparatus for determining state of semiconductor fabricating process

  • US 20040040658A1
  • Filed: 08/29/2002
  • Published: 03/04/2004
  • Est. Priority Date: 08/29/2002
  • Status: Abandoned Application
First Claim
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1. A semiconductor device fabrication apparatus for performing an etching process for a semiconductor wafer having a plurality of films formed on a surface thereof and disposed in a chamber, by using plasma generated in the chamber, the apparatus comprising:

  • a display unit for displaying a change in light of multi-wavelength, the light coming from the surface of the semiconductor wafer during a predetermined period of the etching process; and

    a unit of judging a state of the etching process in accordance with a displayed change amount of light of multi-wavelength.

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