Asymmetrical focus ring
First Claim
Patent Images
1. In a focus ring for use in a plasma chamber, the improvement comprising:
- a minor side; and
a major side, wherein the minor side has a smaller width than the major side.
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Abstract
An asymmetrical focus ring varies the flow-field, which aids in normalizing pressure gradients across the wafer being processed, thereby improving the process. Embodiments of the present invention utilize a focus ring that either (1) contains a pattern of through holes that enhances pumping, or (2) does not contain any such pattern.
21 Citations
22 Claims
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1. In a focus ring for use in a plasma chamber, the improvement comprising:
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a minor side; and
a major side, wherein the minor side has a smaller width than the major side. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. A plasma processing system, comprising:
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a process chamber;
a chuck assembly for holding a substrate in the process chamber; and
an asymmetrical focus ring coupled to the chuck assembly, the asymmetrical focus ring having a minor side and a major side, wherein the minor side has a smaller width than the major side. - View Dependent Claims (12, 13, 14, 15, 16, 17, 18, 19, 20)
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21. In a focus ring for use in a plasma chamber, the improvement comprising:
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a first side;
a second side opposite said first side; and
a plurality of holes in the focus ring, wherein holes of the plurality of holes closer to the first side are larger than holes of the plurality of holes closer to the second side. - View Dependent Claims (22)
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Specification