Lithographic apparatus and device manufacturing method

• US 20040041104A1
• Filed: 06/10/2003
• Published: 03/04/2004
• Est. Priority Date: 06/12/2002
• Status: Active Grant

• Current Assignee: ASML Netherlands BV (ASML Holding NV)
• Original Assignee: ASML Netherlands BV (ASML Holding NV)
• Inventors: Bleeker, Arno Jan, Loopstra, Erik Roelof, Liebregts, Paulus Martinus Maria, Borggreve, Harry
• Granted Patent: US 6,870,601 B2
• Time in Patent Office: Days
• US Class Current: 250/492.22
• CPC Class Codes: G03F 7/70291 Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
• CPC Class Codes: G03F 7/70991 Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus; Shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate; Utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids or vacuum

Abstract

A lithographic apparatus uses the control signal from a computer to drive two spatial light modulators to pattern two separate projection beams for projection onto two substrates.

Claims

1. A lithographic projection apparatus comprising:

a radiation system to provide a first projection beam of radiation;

programmable patterning structure to pattern the first projection beam according to a desired pattern;

a first substrate table to hold a first substrate;

a first projection system to project the first patterned beam onto a target portion of the first substrate;

a control system to provide a control signal to set the first programmable patterning structure according to said desired pattern;

a second programmable patterning structure to pattern a second projection beam of radiation according to said desired pattern;

a second substrate table to hold a second substrate; and

a second projection system for projecting the second patterned beam onto a target portion of the second substrate;

wherein said control system also provides a control signal to set said second programmable patterning structure according to said desired pattern.

2. A lithographic projection apparatus according to claim 1, wherein said apparatus further comprises a calibration unit constructed and arranged to allow for adjustment of the control signal input to the first programmable patterning structure, and the control signal input to the second programmable patterning structure.

3. A lithographic projection apparatus according to claim 1, wherein said radiation system is constructed and arranged to provide said second projection beam.

4. A lithographic projection apparatus according to claim 1, wherein said apparatus further comprises a second radiation system to provide said second projection beam.

5. A lithographic projection apparatus according to any claim 1, wherein said first substrate table, said first programmable patterning structure, said first projection system, said second substrate table, said second programmable patterning structure and said second projection system are mounted on a common base frame.

6. A lithographic projection apparatus according to claim 1, wherein said first substrate table, said first programmable patterning structure and said first projection system are mounted on a first base frame and said second substrate table, said second programmable patterning structure and said second projection system are mounted on a second, separate, base frame.

7. A device manufacturing method comprising:

generating a control signal using a control system, said control signal used to generate a desired pattern in a first programmable patterning structure;

projecting a first patterned beam of radiation having the desired pattern from the first programmable patterning structure onto a target portion of a first substrate;

using said control signal to generate the desired pattern in a second programmable patterning structure; and

projecting a second patterned beam having the desired pattern from the second programmable patterning structure onto a target portion of a second substrate.

8. A machine readable medium including machine executable instructions for controlling a lithographic projection apparatus according to a method comprising:

generating a control signal used to generate a desired pattern in a first programmable patterning structure;

using said first programmable patterning structure to pattern a first projection beam;

projecting the first patterned beam onto target portion of a first substrate;

using said control signal to generate said desired pattern in a second programmable patterning structure;

using said second programmable patterning structure to pattern a second projection beam; and

projecting said second patterned beam onto a target portion of a second substrate.