×

Balanced positioning system for use in lithographic apparatus

  • US 20040041994A1
  • Filed: 08/28/2003
  • Published: 03/04/2004
  • Est. Priority Date: 12/21/1999
  • Status: Active Grant
First Claim
Patent Images

1. A lithographic projection apparatus comprising:

  • a radiation system which supplies a projection beam of radiation;

    a first object table constructed and arranged to hold a mask;

    a second object table constructed and arranged to hold a substrate;

    an imaging projection system configured to image irradiated portions of the mask onto target portions of the substrate;

    first and second balance masses disposed along opposite sides of the first object table; and

    first and second motors configured to move the first object table, each motor having two cooperating electromagnetic members, a first of the members being mounted to the first object table and a second of the members being mounted to at least one of the first and second balance masses, wherein said first and second balance masses are substantially free to move in at least a first direction to provide balancing to the first object table.

View all claims
  • 2 Assignments
Timeline View
Assignment View
    ×
    ×