Apparatus and method for delivering process gas to a substrate processing system

• US 20040050325A1
• Filed: 09/12/2002
• Published: 03/18/2004
• Est. Priority Date: 09/12/2002
• Status: Abandoned Application

• Current Assignee: Applied Materials Incorporated
• Original Assignee: Applied Materials Incorporated
• Inventors: Samoilov, Arkadii V., Comita, Paul B.
• Application Number:
  US10/243,377
• Publication Number:
  US 20040050325A1
• Time in Patent Office: Days
• US Class Current: 118/715
• CPC Class Codes: C23C 16/45561 Gas plumbing upstream of the reaction chamber
• CPC Class Codes: C23C 16/45565 Shower nozzles
• CPC Class Codes: C23C 16/45574 Nozzles for more than one gas
• CPC Class Codes: H01L 21/67017 Apparatus for fluid treatment H01L21/67126, H01L21/6715 take precedence

Abstract

A method and apparatus for delivering process fluids to a substrate processing system is described herein. In one embodiment, the fluid delivery system may include a first conduit for coupling a first fluid to the substrate processing system with a first flow controller for controlling the flow of the first fluid through the first conduit; a second conduit for coupling a second fluid to the substrate processing system with a second flow controller for controlling the flow of the second fluid through the second conduit; and a third conduit for coupling the second fluid to the substrate processing system with a third flow controller for controlling the flow of the second fluid through the third conduit. The fluid delivery system may be used to deliver processing fluids to a substrate processing system during semiconductor fabrication.

Claims

1. A fluid delivery system for providing processing fluids to a substrate processing system, the fluid delivery system comprising:

a first conduit for coupling a first fluid to the substrate processing system;

a first flow controller for controlling the flow of the first fluid through the first conduit;

a second conduit for coupling a second fluid to the substrate processing system;

a second flow controller for controlling the flow of the second fluid through the second conduit;

a third conduit for coupling the second fluid to the substrate processing system; and

a third flow controller for controlling the flow of the second fluid through the third conduit.

2. The fluid delivery system of claim 1, wherein the first fluid is a processing fluid and the second fluid is an inert fluid.

3. The fluid delivery system of claim 2, wherein the first fluid comprises one of monosilane, dichlorosilane, and trichlorosilane and the second fluid comprises hydrogen.

4. The fluid delivery system of claim 1, wherein the first fluid and the second fluid are each processing fluids.

5. The fluid delivery system of claim 1, wherein the first fluid comprises one of monosilane, dichlorosilane, and trichlorosilane and the second fluid comprises germane.

6. The fluid delivery system of claim 1, wherein the first flow controller, the second flow controller, and the third flow controller are computer controlled mass flow controllers controlled by input signals generated by a system controller.

7. A fluid delivery system for providing processing fluids to a substrate processing system, the fluid delivery system comprising:

a first manifold having a first inlet, a first outlet, and a second outlet, wherein the first outlet and the second outlet are coupled to the substrate processing system;

a first conduit for coupling a first fluid to the first inlet;

a first flow controller for controlling the flow of the first fluid through the first conduit;

a second conduit for coupling a second fluid to the first inlet;

a second flow controller for controlling the flow of the second fluid through the second conduit;

a second manifold having a second inlet, a third outlet, and a fourth outlet, wherein the second inlet is coupled to the second conduit, the third outlet is coupled to the first outlet, and the fourth outlet is coupled to the second outlet; and

a third flow controller for controlling the flow of the second fluid through the second manifold.

8. The fluid delivery system of claim 7, wherein the second inlet is coupled to the second conduit upstream of the second flow controller.

9. The fluid delivery system of claim 7, further comprising:

a first isolation valve for controlling the flow of processing fluids through the third outlet; and

a second isolation valve for controlling the flow of processing fluids through the fourth outlet.

10. The fluid delivery system of claim 9, wherein the first isolation valve and the second isolation valve are structured and arranged such that each valve may be opened and closed independently.

11. The fluid delivery system of claim 7, further comprising:

a third isolation valve coupled to the first conduit upstream of the first flow controller;

a fourth isolation valve coupled to the first conduit downstream of the first flow controller;

a fifth isolation valve coupled to the second conduit upstream of the second flow controller;

a sixth isolation valve coupled to the second conduit downstream of the second flow controller;

a seventh isolation valve coupled to the second inlet upstream of the third flow controller; and

an eighth isolation valve coupled to the second inlet downstream of the third flow controller.

12. The fluid delivery system of claim 11, wherein the first isolation valve, second isolation valve, third isolation valve, fourth isolation valve, fifth isolation valve, sixth isolation valve, seventh isolation valve, and eighth isolation valve are each controlled by input signals generated by a system controller.

13. The fluid delivery system of claim 7, wherein the first flow controller, the second flow controller, and the third flow controller are computer controlled mass flow controllers controlled by input signals generated by a system controller.

14. The fluid delivery system of claim 7, wherein the first fluid is a processing fluid and the second fluid is an inert fluid.

15. The fluid delivery system of claim 7, wherein the first fluid and the second fluid are each processing fluids.

16. The fluid delivery system of claim 15, wherein the first fluid comprises one of monosilane, dichlorosilane, and trichlorosilane and the second fluid comprises germane.

17. The fluid delivery system of claim 16, wherein the first fluid comprises a mixture of one of monosilane, dichlorosilane, and trichlorosilane with hydrogen.

18. The fluid delivery system of claim 16, wherein the second fluid comprises a mixture of germane and hydrogen.

19. The fluid delivery system of claim 7, further comprising a first metering valve coupled to the first outlet and a second metering valve coupled to the second outlet, wherein the first metering valve and the second metering valve may be adjusted to proportion the flow of fluids through the first outlet and the second outlet.

20. The fluid delivery system of claim 19 wherein the first metering valve and the second metering valve are needle valves.

21. A fluid delivery system for providing processing fluids to a substrate processing system, the fluid delivery system comprising:

a first manifold having a first inlet, a first outlet, and a second outlet, wherein the first outlet and the second outlet are coupled to the substrate processing system;

a first conduit for coupling a first fluid to the first inlet;

a first flow controller for controlling the flow of the first fluid through the first conduit;

a second conduit for coupling a second fluid to the first inlet;

a second flow controller for controlling the flow of the second fluid through the second conduit;

a third conduit for coupling a third fluid to the first inlet;

a third flow controller for controlling the flow of the third fluid through the third conduit;

a second manifold having a second inlet, a third outlet, and a fourth outlet, wherein the second inlet is coupled to the second conduit, the third outlet is coupled to the first outlet, and the fourth outlet is coupled to the second outlet;

a fourth flow controller for controlling the flow of the second fluid through the second manifold;

a third manifold having a third inlet, a fifth outlet, and a sixth outlet, wherein the third inlet is coupled to the third conduit, the fifth outlet is coupled to the first outlet, and the sixth outlet is coupled to the second outlet; and

a fifth flow controller for controlling the flow of the third fluid through the third manifold.

22. The fluid delivery system of claim 21, wherein the second inlet is coupled to the second conduit upstream of the second flow controller and the third inlet is coupled to the third conduit upstream of the third flow controller.

23. The fluid delivery system of claim 21, further comprising:

a first isolation valve for controlling the flow of processing fluids through the third outlet;

a second isolation valve for controlling the flow of processing fluids through the fourth outlet;

a third isolation valve for controlling the flow of processing fluids through the fifth outlet; and

a fourth isolation valve for controlling the flow of processing fluids through the sixth outlet.

24. The fluid delivery system of claim 21, wherein the first flow controller, the second flow controller, the third flow controller, the fourth flow controller, and the fifth flow controller are computer controlled mass flow controllers controlled by input signals generated by a system controller.

25. The fluid delivery system of claim 21, wherein the first fluid is a processing fluid, the second fluid is an inert fluid, and the third fluid is a processing fluid.

26. The fluid delivery system of claim 21, wherein the first fluid comprises one of monosilane, dichlorosilane, and trichlorosilane;

the second fluid comprises germane; and

the third fluid comprises diborane.

27. The fluid delivery system of claim 26, wherein the first fluid comprises a mixture of one of monosilane, dichlorosilane, and trichlorosilane with hydrogen.

28. The fluid delivery system of claim 26, wherein the second fluid comprises a mixture of germane and hydrogen.

29. The fluid delivery system of claim 21, further comprising a first metering valve coupled to the first outlet and a second metering valve coupled to the second outlet, wherein the first metering valve and the second metering valve may be adjusted to proportion the flow of fluids through the first outlet and the second outlet.

30. The fluid delivery system of claim 29 wherein the first metering valve and the second metering valve are needle valves.

31. The fluid delivery system of claim 23, wherein the first isolation valve, the second isolation valve, the third isolation valve, and the fourth isolation valve each may be opened and closed independently.

32. The fluid delivery system of claim 31, wherein the first isolation valve, second isolation valve, third isolation valve, and the fourth isolation valve are each controlled by input signals received from a system controller.

33. A method of delivering processing fluids to a substrate processing system, the method comprising:

providing a first conduit for coupling a first fluid to the substrate processing system and a first flow controller for controlling the flow of the first fluid through the first conduit;

providing a second conduit for coupling a second fluid to the substrate processing system and a second flow controller for controlling the flow of the second fluid through the second conduit;

providing a third conduit for coupling the second fluid to the substrate processing system and a third flow controller for controlling the flow of the second fluid through the third conduit;

controlling the flow of the first fluid through the first conduit;

controlling the flow of the second fluid through the second conduit; and

controlling the flow of the second fluid through the third conduit.

36. The method of claim 33 wherein the silicon source fluid comprises one of monosilane, dichlorosilane, and trichlorosilane.

37. The method of claim 33 wherein the germanium source fluid comprises germane.

34. A method of delivering processing fluids to a substrate processing system, the method comprising:

providing a first manifold having a first inlet, a first outlet, and a second outlet, wherein the first outlet and the second outlet are coupled to the substrate processing system;

providing a first conduit for coupling a first fluid to the first inlet and a first flow controller for controlling the flow of the first fluid through the first conduit;

providing a second conduit for coupling a second fluid to the first inlet and a second flow controller for controlling the flow of the second fluid through the second conduit;

providing a second manifold having a second inlet, a third outlet, and a fourth outlet, wherein the second inlet is coupled to the second conduit, the third outlet is coupled to the first outlet, and the fourth outlet is coupled to the second outlet;

providing a third flow controller for controlling the flow of the second fluid through the second manifold;

controlling the flow of the first fluid through the first conduit;

controlling the flow of the second fluid through the second conduit; and

controlling the flow of the second fluid through the second manifold.

35. A method of depositing a silicon-germanium film on a substrate, the method comprising:

flowing a silicon source fluid through a first manifold having a first inlet, a first outlet, and a second outlet, wherein the first outlet and the second outlet are coupled to a substrate processing chamber and wherein a first flow controller controls the flow of the silicon source fluid through the first inlet;

flowing a germanium source fluid through a conduit coupled to the first inlet, wherein a second flow controller controls the flow of the germanium source fluid through the conduit; and

flowing a germanium source fluid through a second manifold having a second inlet, a third outlet, and a fourth outlet, wherein the second inlet is coupled to the conduit, the third outlet is coupled to the first outlet, and the fourth outlet is coupled to the second outlet, and wherein a third flow controller controls the flow of the germanium source fluid through the second manifold.

38. A process recipe for directing a substrate processing system to deliver processing fluids to a substrate processing chamber, the process recipe comprising:

instructions for controlling a first computer controlled flow controller which regulates the, flow of a first fluid through a first conduit coupling a first fluid source to the substrate processing chamber;

instructions for controlling a second computer controlled flow controller which regulates the flow of a second fluid through a second conduit coupling a second fluid source to the substrate processing chamber; and

instructions for controlling a third computer controlled flow controller which regulates the flow of the second fluid through a third conduit coupling the second fluid to the substrate processing system.

39. A process recipe for directing a substrate processing system to deliver processing fluids to a substrate processing chamber, the process recipe comprising:

instructions for controlling a first computer controlled flow controller which regulates the flow of a first fluid through a first conduit, wherein the first conduit is coupled to a first inlet of a first manifold, the first manifold having a first outlet and a second outlet coupled to the substrate processing chamber;

instructions for controlling a second computer controlled flow controller which regulates the flow of a second fluid through a second conduit, wherein the second conduit is coupled to the first inlet of the first manifold; and

instructions for controlling a third computer controlled flow controller which regulates the flow of the second fluid through a second manifold, the second manifold having a second inlet, a third outlet, and a fourth outlet, wherein the second inlet is coupled to the second conduit, the third outlet is coupled to the first outlet, and the fourth outlet is coupled to the second outlet.