Heated gas distribution plate for a processing chamber
First Claim
Patent Images
1. An apparatus for distributing gas in a processing system, comprising:
- a gas distribution assembly having;
a gas distribution plate defining a plurality of holes through which gases are transmitted;
a gas box coupled to the gas distribution plate, the gas box being configured to supply the gases into the plurality of holes; and
a means for minimizing heat transfer from the gas distribution plate to the gas box.
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Abstract
An apparatus for distributing gas in a processing system. In one embodiment, the system includes a gas distribution assembly having a gas distribution plate. The gas distribution plate defines a plurality of holes through which gases are transmitted. The assembly further includes a gas box coupled to the gas distribution plate, in which the gas box is configured to supply the gases into the plurality of holes. The assembly further includes a means for reducing heat transfer from the gas box to the gas distribution plate.
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Citations
66 Claims
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1. An apparatus for distributing gas in a processing system, comprising:
a gas distribution assembly having;
a gas distribution plate defining a plurality of holes through which gases are transmitted;
a gas box coupled to the gas distribution plate, the gas box being configured to supply the gases into the plurality of holes; and
a means for minimizing heat transfer from the gas distribution plate to the gas box. - View Dependent Claims (2, 3, 4, 5, 6, 7, 8, 9, 10)
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11. An apparatus for distributing gas in a processing system, comprising:
a gas distribution assembly having;
a gas distribution plate defining a plurality of holes through which gases are transmitted;
a gas box coupled to the gas distribution plate, the gas box being configured to supply the gases into the plurality of holes; and
a hard radio frequency (RF) gasket disposed between the gas distribution plate and the gas box, the gasket being configured to reduce heat transfer from the gas distribution plate to the gas box. - View Dependent Claims (12, 13, 14, 15, 16, 17)
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18. An apparatus for distributing gas in a processing system, comprising:
a gas distribution assembly having;
a gas box configured to supply gases into a process chamber; and
a gas distribution plate comprising;
a plurality of holes through which the gases are distributed into the process chamber; and
a flange portion coupled to the gas box, the flange portion defining one or more recesses configured to reduce heat transfer from the gas distribution plate to the gas box. - View Dependent Claims (19, 20, 21, 22, 23, 24, 25)
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26. An apparatus for distributing gas in a processing system, comprising:
a gas distribution assembly having;
a gas box configured to supply gases into a process chamber;
a gas distribution plate comprising;
a plurality of holes through which the gases are distributed into the process chamber; and
a flange portion; and
a thermal isolator disposed between the gas box and the flange portion of the gas distribution plate to reduce heat transfer from the gas distribution plate to the gas box. - View Dependent Claims (27, 28, 29, 30, 31, 32, 33, 34)
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35. A gas distribution plate, comprising:
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a bottom plate having a plurality of holes through which gases are transmitted;
a channel disposed circumferentially around a perimeter of the bottom plate; and
a means for heating the gas distribution plate. - View Dependent Claims (36, 37, 38)
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39. A gas distribution plate, comprising:
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a bottom plate having a plurality of holes through which gases are transmitted; and
a heating element disposed circumferentially around a perimeter of the bottom plate. - View Dependent Claims (40, 41, 42)
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43. A gas distribution plate, comprising:
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a bottom plate having a plurality of holes through which gases are transmitted;
a channel disposed circumferentially around a perimeter of the bottom plate; and
a high temperature heat exchanger fluid contained inside the channel, the heat exchanger fluid being configured to heat the gas distribution plate. - View Dependent Claims (44, 45)
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46. A chemical vapor deposition reactor, comprising:
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a vacuum chamber defining a processing region;
a substrate support pedestal positioned within the vacuum chamber and proximate the processing region; and
a gas distribution assembly positioned within the vacuum chamber and proximate the processing region, wherein the gas distribution assembly comprises;
a gas distribution plate defining a plurality of holes through which gases are distributed into the processing region;
a gas box coupled to the gas distribution plate, the gas box being configured to supply the gases into the plurality of holes; and
a hard radio frequency (RF) gasket disposed between the gas distribution plate and the gas box, the gasket being configured to reduce heat transfer from the gas distribution plate to the gas box. - View Dependent Claims (47, 48, 49, 50)
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51. A chemical vapor deposition reactor, comprising:
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a vacuum chamber defining a processing region;
a substrate support pedestal positioned within the vacuum chamber and proximate the processing region; and
a gas distribution assembly positioned within the vacuum chamber and proximate the processing region, wherein the gas distribution assembly comprises;
a gas box configured to supply gases into the processing region; and
a gas distribution plate comprising;
a plurality of holes through which the gases are distributed into the processing region; and
a flange portion coupled to the gas box, the flange portion defining one or more recesses configured to reduce heat transfer from the gas distribution plate to the gas box. - View Dependent Claims (52, 53, 54, 55)
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56. A chemical vapor deposition reactor, comprising:
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a vacuum chamber defining a processing region;
a substrate support pedestal positioned within the vacuum chamber and proximate the processing region; and
a gas distribution assembly positioned within the vacuum chamber and proximate the processing region, wherein the gas distribution assembly comprises;
a gas box configured to supply gases into the processing region;
a gas distribution plate comprising;
a plurality of holes through which the gases are distributed into the processing region; and
a flange portion; and
a thermal isolator disposed between the gas box and the flange portion of the gas distribution plate to reduce heat transfer from the gas distribution plate to the gas box. - View Dependent Claims (57, 58, 59, 60, 61)
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62. A chemical vapor deposition reactor, comprising:
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a vacuum chamber defining a processing region;
a substrate support pedestal positioned within the vacuum chamber and proximate the processing region; and
a gas distribution assembly positioned within the vacuum chamber and proximate the processing region, wherein the gas distribution assembly comprises;
a gas distribution plate comprising;
a bottom plate having a plurality of holes through which gases are distributed into the processing region; and
a heating element disposed around a perimeter of the bottom plate. - View Dependent Claims (63, 64)
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65. A chemical vapor deposition reactor, comprising:
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a vacuum chamber defining a processing region;
a substrate support pedestal positioned within the vacuum chamber and proximate the processing region; and
a gas distribution assembly positioned within the vacuum chamber and proximate the processing region, wherein the gas distribution assembly comprises;
a gas distribution plate comprising;
a bottom plate having a plurality of holes through which gases are distributed into the processing region;
a channel disposed around a perimeter of the bottom plate; and
a high temperature heat exchanger fluid contained inside the channel, the heat exchanger fluid being configured to heat the gas distribution plate. - View Dependent Claims (66)
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Specification