Light- emitting device and its manufacturing method and visible-light-emitting device

• US 20040051109A1
• Filed: 05/28/2003
• Published: 03/18/2004
• Est. Priority Date: 11/30/2000
• Status: Abandoned Application

• Current Assignee: Shin-Etsu Handotai Co., Ltd. (Shin-Etsu Chemical Company Limited)
• Original Assignee: Shin-Etsu Handotai Co., Ltd. (Shin-Etsu Chemical Company Limited)
• Inventors: Yamada, Masato, Ishizaki, Jun-ya
• Application Number:
  US10/432,864
• Publication Number:
  US 20040051109A1
• Time in Patent Office: Days
• US Class Current: 257/89
• CPC Class Codes: H01L 33/26 Materials of the light emitting region
• CPC Class Codes: H01L 33/28 containing only elements of Group II and Group VI of the Periodic Table
• CPC Class Codes: H01L 33/32 containing nitrogen

Abstract

A light emitting device 1 has a light emitting layer portion in which a p-type cladding layer 2, an active layer 33 and an n-type cladding layer 34 are stacked in this order, and the p-type cladding layer 2 is composed of a p-type Mg_xZn_1-xO (where, 0<x≦1) layer. By forming these layers by the MOVPE process, oxygen deficiency during the film formation is effectively prevented from occurring, and a p-type Mg_xZn_1-xO layer having desirable characteristics can be obtained.

Claims

1. A light emitting device having a light emitting layer portion in which an n-type cladding layer, an active layer and a p-type cladding layer are stacked in this order, the p-type cladding layer being composed of a p-type Mg_xZn_1-xO (where, 0<

x≦

1) layer.

2. The light emitting device as claimed in claim 1, wherein the p-type Mg_xZn_1-xO layer contains N, and one or more selected from the group consisting of Ga, Al and In as the p-type dopant.

3. The light emitting device as claimed in claim 1 or 2, wherein the active layer is composed of a semiconductor capable of forming type-II band lineup with respect to the p-type Mg_xZn_1-xO layer.

4. The light emitting device as claimed in any one of claims 1 to 3, wherein the active layer is an InGaN layer.

5. The light emitting device as claimed in claim 1 or 2, wherein the active layer is composed of a semiconductor capable of forming type-I band lineup with respect to the p-type Mg_xZn_1-xO layer.

6. The light emitting device as claimed in any one of claims 1, 2 and 5, wherein the active layer is an Mg_yZn_1-yO layer (where, 0≦

y<

1 and x>

y).

7. The light emitting device as claimed in claim 6, wherein the n-type cladding layer is an n-type Mg_zZn_1-zO layer (where, 0≦

z<

1).

8. The light emitting device as claimed in any one of claims 1 to 7, wherein the surface of the p-type Mg_xZn_1-xO layer opposite to that in contact with the active layer is covered with a protective layer which comprises a conductive material or a semiconductor material.

9. The light emitting device as claimed in claim 8, wherein the p-type Mg_xZn_1-xO layer has a structure in which oxygen-ion-packed layers and metal-ion-packed layers are alternately stacked in the thicknesswise direction, and the protective layer is in contact with the oxygen-ion packed layer.

10. The light emitting device as claimed in claim 8 or 9, wherein the protective layer is a transparent conductive material layer.

11. The light emitting device as claimed in claim 10, wherein the transparent conductive material layer is used also as an electrode for supplying current for light emission.

12. The light emitting device as claimed in claim 8 or 9, wherein the protective layer is a p-type compound semiconductor layer.

13. The light emitting device as claimed in claim 12, wherein the p-type compound semiconductor layer is used also as a current spreading layer.

14. The light emitting device as claimed in claim 8 or 9, wherein the protective layer is a metal layer.

15. The light emitting device as claimed in claim 14, wherein the metal layer is used also as a light reflective layer for assisting light extraction from the n-type cladding layer side.

16. The light emitting device as claimed in claim 14 or 15, wherein the metal layer is used also as an electrode for supplying emission current.

17. The light emitting device as claimed in any one of claims 1 to 16, wherein the semiconductor composing the active layer is selected so as to have a band gap energy causative of light emission in the visible light wavelength from 400 to 570 nm.

18. The light emitting device as claimed in any one of claims 1 to 16, wherein the semiconductor composing the active layer is selected so as to have a band gap energy causative of light emission in the ultraviolet wavelength from 280 to 400 nm.

19. A method of fabricating the light emitting device of any one of claims 1 to 18, wherein the p-type Mg_xZn_1-xO layer is formed by the metal organic vapor-phase epitaxy process.

20. The method of fabricating the light emitting device as claimed in claim 19, wherein the metal organic vapor-phase epitaxy process is carried out in an atmosphere conditioned at a pressure of 1.33×

10³ Pa or above.

21. The method of fabricating the light emitting device as claimed in claim 19 or 20, wherein a metal element dopant is used as the p-type dopant, and the metal element dopant is supplied in a form of an organometallic compound containing at least one alkyl group, during the vapor-phase growth of the p-type Mg_xZn_1-xO layer.

22. The method of fabricating the light emitting device as claimed in claim 21, wherein the metal element dopant is any one or more selected from the group consisting of Ga, Al, In and Li.

23. The method of fabricating the light emitting device as claimed in claim 22, wherein any one or more selected from the group consisting of Ga, Al, In and Li are used together with N as the p-type dopant, and during the vapor-phase growth of the p-type Mg_xZn_1-xO layer, an N-source gas is supplied together with the organometallic compound used as a source for the metal element dopant.

24. The method of fabricating the light emitting device as claimed in any one of claims 19 to 23, wherein the n-type cladding layer, the active layer and the p-type Mg_xZn_1-xO layer are formed so as to be sequentially stacked on a substrate.

25. The method of fabricating the light emitting device as claimed in any one of claims 19 to 23, wherein the stacked structure of the n-type cladding layer, the active layer and the p-type Mg_xZn_1-xO layer is formed so that a primary portion and a secondary portion thereof, which are corresponded to the portions of the stacked structure divided in two on one side of the active layer, are separately formed on the substrate, and the primary portion and the secondary portion are then bonded.

26. The method of fabricating the light emitting device as claimed in claim 25, wherein the primary portion includes the p-type Mg_xZn_1-xO layer, and the secondary portion includes a stacked structure of the n-type cladding layer and the active layer.

27. The method of fabricating the light emitting device as claimed in any one of claims 19 to 26, wherein, during formation of the p-type Mg_xZn_1-xO layer on the main surface of the substrate placed in the inner space of a growth chamber according to the metal organic vapor-phase epitaxy process, an oxygen-source gas is supplied through an oxygen-source gas exhaust port, and the organometallic compound used as an Mg and/or Zn source is supplied through an organometallic compound exhaust port located more closer to the main surface of the substrate than the oxygen-source gas exhaust port.

28. A visible-light emitting apparatus having a light emitting layer portion in which an n-type cladding layer, an active layer and a p-type cladding layer are stacked in this order, the p-type cladding layer further comprising a semiconductor ultraviolet emitting device composed of a p-type Mg_xZn_1-xO (where, 0<

x≦

1) layer, and a fluorescent material which emits visible light as being irradiated by ultraviolet radiation from the semiconductor ultraviolet emitting device.

29. The visible-light emitting apparatus as claimed in claim 28, wherein the ultraviolet radiation from the semiconductor ultraviolet emitting device is irradiated on a fluorescent material layer formed on a base member.

30. The visible-light emitting apparatus as claimed in claim 29, wherein the semiconductor ultraviolet emitting device is disposed in a plural number, and the ultraviolet radiation from the individual semiconductor ultraviolet emitting devices are dedicated for light emission of the correspondent fluorescent material layers.

31. The visible-light emitting apparatus as claimed in claim 30, wherein the apparatus is composed as a lighting apparatus designed so that a plurality of the semiconductor ultraviolet emitting devices concomitantly allow the correspondent fluorescent material layer to emit light.

32. The visible-light emitting apparatus as claimed in claim 31, wherein the fluorescent material layers corresponded to the individual semiconductor ultraviolet emitting devices are laterally integrated in line.

33. The visible-light emitting apparatus as claimed in claim 30, wherein the apparatus is composed as a display apparatus in which a plurality of display units are arrayed along a display plane,

the display units respectively comprising a set of an independently-controllable semiconductor ultraviolet emitting device and a correspondent fluorescent material layer,

so as to make, using the fluorescent material layers of the individual display units as pixels, image display based on combination of light emission status of the pixels.

34. The visible-light emitting apparatus as claimed in any one of claims 29 to 33, wherein the base member and the fluorescent material layers are formed in a planar form.

35. The visible-light emitting apparatus as claimed in any one of claims 29 to 34, wherein the base member is composed as a transparent substrate, the fluorescent material layers are formed on one surface of the transparent substrate, light extraction plane of the semiconductor ultraviolet emitting devices are opposingly disposed on the opposite surface thereof, so as to allow the ultraviolet radiation from the semiconductor ultraviolet emitting devices to irradiate the fluorescent material layers through the transparent substrate.