System and method for resetting a reaction mass assembly of a stage assembly

• US 20040051854A1
• Filed: 06/11/2003
• Published: 03/18/2004
• Est. Priority Date: 11/16/2000
• Status: Active Grant

• Current Assignee: Nikon Corporation
• Original Assignee: Nikon Corporation
• Inventors: Tanaka, Keiichi, Hazelton, Andrew J., Binnard, Mike
• Granted Patent: US 6,958,808 B2
• Time in Patent Office: Days
• US Class Current: 355/53
• CPC Class Codes: G03B 27/62 Holders for the original G03B27/53 takes precedence ; for electrophotographic copiers G03G15/60
• CPC Class Codes: G03F 7/707 Chucks, e.g. chucking or un-chucking operations or structural details
• CPC Class Codes: G03F 7/70708 being electrostatic; Electrostatically deformable vacuum chucks
• CPC Class Codes: G03F 7/70766 Reaction force control means, e.g. countermass
• CPC Class Codes: G03F 7/709 Vibration, e.g. vibration detection, compensation, suppression or isolation

Abstract

A stage assembly for moving and positioning a device is provided herein. The stage assembly includes a stage base, a stage, a stage mover assembly, a reaction mass assembly, a reaction mover assembly, and a control system. The stage mover assembly moves the stage relative to the stage base. The reaction mass assembly reduces the reaction forces created by the stage mover assembly that are transferred to the stage base. The reaction mover assembly adjusts the position of the reaction mass assembly relative to the stage base. Uniquely, the control system controls and directs current to the reaction mover assembly in a way that minimizes the influence of disturbances created by the reaction mover assembly on the stage assembly. More specifically, the timing and/or the amount of current from the control system directed to the reaction mover assembly is varied to minimize the influence of the disturbances created by the reaction mover assembly on the stage assembly. With this design, the reaction mover assembly has less influence upon the position of the stage base. This allows for more accurate positioning of the device by the stage assembly and better performance of the stage assembly.

Claims

1. A stage assembly for use with an apparatus, the stage assembly moving a device relative to a stage base so that the device is properly positioned for one or more operations performed by the apparatus, the stage assembly comprising:

a stage that retains the device;

a stage mover assembly that moves the stage relative to the stage base, the stage mover assembly generating reaction forces;

a reaction mass assembly coupled to the stage mover assembly, the reaction mass assembly reducing the reaction forces that are transferred to the stage base;

a reaction mover assembly that moves the reaction mass assembly relative to the stage base; and

a control system connected to the reaction mover assembly, the control system controlling excitation of the reaction mover assembly based upon the status of the one or more operations.

2. The stage assembly of claim 1 wherein the control system does not direct current to the reaction mover assembly during at least one of the operations.

3. The stage assembly of claim 2 wherein the control system directs current to the reaction mover assembly between the operations.

4. The stage assembly of claim 1 wherein the control system directs more current to the reaction mover assembly between operations than during the operations.

5. The stage assembly of claim 1 wherein the stage mover assembly moves the stage with two degrees of freedom and the reaction mass assembly is adapted to reduce the reaction forces in the two degrees of freedom that are transferred to the stage base.

6. The stage assembly of claim 1 wherein the stage mover assembly moves the stage with three degrees of freedom and the reaction mass assembly is adapted to reduce the reaction forces in the three degrees of freedom that are transferred to the stage base.

7. The stage assembly of claim 1 wherein the reaction mover assembly adjusts the position of the reaction mass assembly relative to the stage base with one degree of freedom.

8. The stage assembly of claim 1 wherein the reaction mover assembly adjusts the position of the reaction mass assembly relative to the stage base with two degrees of freedom.

9. The stage assembly of claim 1 wherein the reaction mover assembly adjusts the position of the reaction mass assembly relative to the stage base with three degrees of freedom.

10. The stage assembly of claim 1 wherein the reaction mass assembly includes an X reaction component and a Y reaction component that are coupled to the stage mover assembly, the X reaction component moves relative to the Y reaction component along an X axis and the X reaction component and the Y reaction component move concurrently along a Y axis relative to the stage base.

11. The stage assembly of claim 10 wherein the reaction mover assembly adjusts the position of the X reaction component relative to the Y reaction component along the X axis.

12. The stage assembly of claim 11 wherein the reaction mover assembly adjusts the position of the Y reaction component and the X reaction component relative to the stage base along the Y axis.

13. The stage assembly of claim 12 wherein the reaction mover assembly adjusts the position of the Y reaction component and the X reaction component relative to the stage base about a Z axis.

14. The stage assembly of claim 10 wherein the X reaction component includes a first X reaction mass and a second X reaction mass that move independently along the X axis relative to the Y reaction component and the reaction mover assembly adjusts the position of the X reaction masses relative to the Y reaction component.

15. An exposure apparatus comprising the stage assembly of claim 1 and an illumination source having an on position and an off position, in the on position, the illumination source directs a beam of light energy towards the stage assembly, in the off position, the illumination source does not direct a beam of light energy towards the stage assembly.

16. The exposure apparatus of claim 15 wherein the control system controls current to the reaction mover assembly based upon the position of the illumination source.

17. The exposure apparatus of claim 15 wherein the control system does not direct current to the reaction mover assembly when the illumination source is in the on position.

18. The exposure apparatus of claim 17 wherein the control system directs current to the reaction mover assembly when the illumination source is in the off position.

19. The exposure apparatus of claim 15 wherein the control system directs more current to the reaction mover assembly when the illumination source is in off position than when the illumination source is in the on position.

20. A device manufactured by the exposure apparatus of claim 15.

21. A wafer on which an image has been formed by the exposure apparatus of claim 15.

22. An exposure apparatus comprising the stage assembly of claim 1, the exposure apparatus being adapted to form images on the device.

23. The exposure apparatus of claim 22 wherein the control system directs current to the reaction mover assembly between the forming of each image on the device and does not direct current to the reaction mover assembly during the forming of each image on the device.

24. The exposure apparatus of claim 22 wherein the control system directs current to the reaction mover assembly between the forming of each row of images on the device and does not direct current to the reaction mover assembly during the forming of each row of images on the device.

25. The exposure apparatus of claim 22 wherein the control system directs current to the reaction mover assembly between each scan of the device and does not direct current to the reaction mover assembly during each scan of the device.

26. The exposure apparatus of claim 22 wherein the control system directs current to the reaction mover assembly between each device manufactured by the exposure apparatus and does not direct current to the reaction mover assembly during the manufacture of each device.

27. The exposure apparatus of claim 22 wherein the control system directs more current to the reaction mover assembly between the forming of each image on the device and than during the forming of each image on the device.

28. The exposure apparatus of claim 22 wherein the control system directs more current to the reaction mover assembly between the transfer of each row of images onto the device than during the transfer of each row of images to the device.

29. The exposure apparatus of claim 22 wherein the control system directs more current to the reaction mover assembly between each scan of the device than during each scan of the device.

30. The exposure apparatus of claim 22 wherein the control system directs more current to the reaction mover assembly between each device manufactured by the exposure apparatus than during the manufacture of each device.

71. The stage assembly of claim 1, wherein the device is a mask with the pattern formed thereon, and the stage is a mask stage.

31. An exposure apparatus for forming images on a device, the exposure apparatus comprising:

an illumination source having an on position and an off position, in the on position, the illumination source directs a beam of light energy, in the off position, the illumination source does not direct a beam of light energy;

a stage base;

a stage assembly that moves the device relative to the stage base, the stage assembly including (i) a stage that retains the device, (ii) a stage mover assembly that moves the stage relative to the stage base, the stage mover assembly generating reaction forces, (iii) a reaction mass assembly coupled to the stage mover assembly, the reaction mass assembly reducing the reaction forces that are transferred to the stage base, (iv) a reaction mover assembly that moves the reaction mass assembly relative to the stage base, and (v) a control system connected to the reaction mover assembly, the control system controlling excitation of the reaction mover assembly based upon the position of the illumination source.

32. The exposure apparatus of claim 31 wherein the control system does not direct current to the reaction mover assembly when the illumination source is in the on position.

33. The exposure apparatus of claim 32 wherein the control system directs current to the reaction mover assembly when the illumination source is in the off position.

34. The exposure apparatus of claim 31 wherein the control system directs more current to the reaction mover assembly when the illumination source is in the off position than when the illumination source is in the on position.

35. The exposure apparatus of claim 31 wherein the control system directs current to the reaction mover assembly between the forming of each image on the device and does not direct current to the reaction mover assembly during the forming of each image on the device.

36. The exposure apparatus of claim 31 wherein the control system directs current to the reaction mover assembly between the forming of each row of images on the device and does not direct current to the reaction mover assembly during the forming of each row of images to the device.

37. The exposure apparatus of claim 31 wherein the control system directs current to the reaction mover assembly between each scan of the device and does not direct current to the reaction mover assembly during each scan of the device.

38. The exposure apparatus of claim 31 wherein the control system directs current to the reaction mover assembly between each device manufactured by the exposure apparatus and does not direct current to the reaction mover assembly during the manufacture of each device.

39. The exposure apparatus of claim 31 wherein the control system directs more current to the reaction mover assembly between the forming of each image on the device and than during the forming of each image on the device.

40. The exposure apparatus of claim 31 wherein the control system directs more current to the reaction mover assembly between the forming of each row of images on the device than during the forming of each row of images on the device.

41. The exposure apparatus of claim 31 wherein the control system directs more current to the reaction mover assembly between each scan of the device than during each scan of the device.

42. The exposure apparatus of claim 31 wherein the control system directs more current to the reaction mover assembly between each device manufactured by the exposure apparatus than during the manufacture of each device.

43. The exposure apparatus of claim 31 wherein the reaction mover assembly adjusts the position of the reaction mass assembly relative to the stage base with at least one degree of freedom.

44. The exposure apparatus of claim 31 wherein the reaction mover assembly adjusts the position of the reaction mass assembly relative to the stage base with two degrees of freedom.

45. The exposure apparatus of claim 31 wherein the reaction mover assembly adjusts the position of the reaction mass assembly relative to the stage base with three degrees of freedom.

46. A device manufactured by the exposure apparatus of claim 31.

47. A wafer on which an image has been formed by the exposure apparatus of claim 31.

48. A method for making a stage assembly for use with an apparatus, the stage assembly moving a device relative to a stage base so that the device is properly positioned for one or more operations performed by the apparatus, the method comprising the steps of:

providing a stage that retains the device;

providing a stage mover assembly that moves the stage relative to the stage base, the stage mover assembly generating reaction forces;

providing a reaction mass assembly that reduces the reaction forces transferred to the stage base;

providing a reaction mover assembly that moves the reaction mass assembly relative to the stage base; and

providing a control system that controls current to the reaction mover assembly based upon the status of the one or more operations.

49. The method of claim 48 wherein the step of providing a control system includes the step of providing a control system that does not direct current to the reaction mover assembly during at least one of the operations.

50. The method of claim 49 wherein the step of providing a control system includes the step of providing a control system that directs current to the reaction mover assembly between the operations.

51. The method of claim 48 wherein the step of providing a control system includes the step of providing a control system that directs more current to the reaction mover assembly between operations than during the operations.

52. A method for manufacturing an exposure apparatus for forming an image to a device, the method including the steps of providing a stage assembly made by the method of claim 48 and providing an illumination source having an on position and an off position, in the on position, the illumination source directs a beam of light energy towards the stage assembly, in the off position, the illumination source does not direct a beam of light energy towards the stage assembly.

53. The method of claim 52 wherein the step of providing a control system includes the step of providing a control system that controls current to the reaction mover assembly based upon the position of the illumination source.

54. The method of claim 52 wherein the step of providing a control system includes the step of providing a control system that does not direct current to the reaction mover assembly when the illumination source is in the on position.

55. The method of claim 54 wherein the step of providing a control system includes the step of providing a control system that directs current to the reaction mover assembly when the illumination source is in the off position.

56. The method of claim 52 wherein the step of providing a control system includes the step of providing a control system that directs more current to the reaction mover assembly when the illumination source is in the off position than when the illumination source is in the on position.

57. The method of claim 52 wherein the step of providing a control system includes the step of providing a control system that directs current to the reaction mover assembly between the forming of each image on the device and does not direct current to the reaction mover assembly during the forming of each image on the device.

58. The method of claim 52 wherein the step of providing a control system includes the step of providing a control system that directs current to the reaction mover assembly between the forming of each row of images on the device and does not direct current to the reaction mover assembly during the forming of each row of images on the device.

59. The method of claim 52 wherein the step of providing a control system includes the step of providing a control system that directs current to the reaction mover assembly between each scan of the device and does not direct current to the reaction mover assembly during each scan of the device.

60. The method of claim 52 wherein the step of providing a control system includes the step of providing a control system that directs current to the reaction mover assembly between each device manufactured by the exposure apparatus and does not direct current to the reaction mover assembly during the manufacture of each device.

61. The method of claim 52 wherein the step of providing a control system includes the step of providing a control system that directs more current to the reaction mover assembly between the forming of each image on the device and than during the forming of each image on the device.

62. The method of claim 52 wherein the step of providing a control system includes the step of providing a control system that directs more current to the reaction mover assembly between the transfer of each row of images onto the device than during the transfer of each row of images to the device.

63. The method of claim 52 wherein the step of providing a control system includes the step of providing a control system that directs more current to the reaction mover assembly between each scan of the device than during each scan of the device.

64. The method of claim 52 wherein the step of providing a control system includes the step of providing a control system that directs more current to the reaction mover assembly between each device manufactured by the exposure apparatus than during the manufacture of each device.

65. A method of making a wafer utilizing the exposure apparatus made by the method of claim 52.

66. A method of making a device utilizing the exposure apparatus made by the method of claim 52.

67. A method for controlling the position of a reaction mass assembly of a stage assembly, the stage assembly moving a device relative to a stage base so that the device is properly positioned for one or more operations performed an apparatus, the method comprising the steps of:

connecting a reaction mover assembly to the reaction mass assembly, the reaction mover assembly moving the reaction mass assembly relative to the stage base; and

controlling current to the reaction mover assembly based upon the status of the one or more operations.

68. The method of claim 67 wherein the step of controlling current includes the step of not directing current to the reaction mover assembly during at least one of the operations.

69. The method of claim 67 wherein the step of controlling current includes the step of directing current to the reaction mover assembly between the operations.

70. The method of claim 67 wherein the step of controlling current includes the step of directing more current to the reaction mover assembly between operations than during the operations.

72. An exposure apparatus comprising the stage assembly of 71, wherein the mask stage comprises a holder to hold a plurality of the masks.